Patents by Inventor Akinobu HORITA
Akinobu HORITA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20240132805Abstract: A cleaning composition for semiconductor substrates, containing an alkaline compound (A), a corrosion inhibitor (B), and water, wherein the alkaline compound (A) is at least one selected from the group consisting of a quaternary ammonium hydroxide (A1) and potassium hydroxide (A2), and the corrosion inhibitor (B) is at least one selected from the group consisting of 4-substituted pyrazoles, potassium tris(1-pyrazolyl)borohydride, 2-(4-thiazolyl)benzimidazole, and halogenated-8-hydroxyquinolines.Type: ApplicationFiled: March 4, 2022Publication date: April 25, 2024Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Hiroaki TAKAKUWA, Akinobu HORITA, Takahiro KIKUNAGA
-
Publication number: 20230365893Abstract: A cleaning composition for semiconductor substrates. The cleaning composition comprises hydrogen peroxide, a hydrogen peroxide stabilizing agent, an alkaline compound, and water. The hydrogen peroxide stabilizing agent is oxalic acid, diethylenetriaminepentaacetic acid, hydroxyethyliminodiacetic acid, potassium oxalate, 5-phenyl-1H-tetrazole, triethylenetetraminehexaacetic acid, trans-1,2-cyclohexanediaminetetraacetic acid, 8-quinolinol, L(+)-isoleucine, DL-valine, L(-)-proline, hydroxyethylethylenediaminetriacetic acid, N,N-di(2-hydroxyethyl)glycine, glycine, L-tryptophan, 2,6-pyridinedicarboxylic acid, benzothiazole, or DL-alanine. The alkaline compound is a quaternary ammonium hydroxide or potassium hydroxide.Type: ApplicationFiled: September 22, 2021Publication date: November 16, 2023Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Hiroaki HORIE, Akinobu HORITA, Makoto HAMANAKA, Kenji SHIMADA, Takahiro KIKUNAGA
-
Patent number: 11629315Abstract: An aqueous composition includes (A) from 0.0001 to 10 mass % of one or more kinds of compounds selected from a C4-13 alkylphosphonic acid, a C4-13 alkylphosphonate ester, a C4-13 alkyl phosphate and a salt thereof, with respect to the total amount of the aqueous composition; and (B) from 0.0001 to 50 mass % of an acid other than the C4-13 alkylphosphonic acid, the C4-13 alkylphosphonate ester and the C4-13 alkyl phosphate or a salt thereof, with respect to the total amount of the aqueous composition.Type: GrantFiled: April 25, 2019Date of Patent: April 18, 2023Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Toshiyuki Oie, Takahiro Kikunaga, Akinobu Horita, Kenji Yamada
-
Patent number: 11613720Abstract: An aqueous composition includes (A) from 0.001 to 20 mass % of one or more kinds of fluorine-containing compounds selected from tetrafluoroboric acid, hexafluorosilicic acid, hexafluoroaluminic acid, hexafluorotitanic acid and a salt thereof, with respect to the total amount of the aqueous composition; and (B) from 0.0001 to 10 mass % of one or more kinds of compounds selected from a C4-13 alkylphosphonic acid, a C4-13 alkylphosphonate ester, a C4-13 alkyl phosphate and a salt thereof, with respect to the total amount of the aqueous composition.Type: GrantFiled: April 25, 2019Date of Patent: March 28, 2023Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Toshiyuki Oie, Akinobu Horita, Takahiro Kikunaga, Kenji Yamada
-
Patent number: 11479744Abstract: The present invention pertains to: a composition capable of removing dry etching residue present on the surface of a semiconductor integrated circuit, while suppressing alumina damage in a production process for the semiconductor integrated circuit; a cleaning method for semiconductor substrates that use alumina; and a production method for a semiconductor substrate having an alumina layer. This composition is characterized by containing 0.00005%-1% by mass of a barium compound (A) and 0.01%-20% by mass of a fluorine compound (B) and having a pH of 2.5-8.0.Type: GrantFiled: February 27, 2019Date of Patent: October 25, 2022Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Toshiyuki Oie, Akinobu Horita, Kenji Yamada, Takahiro Kikunaga
-
Patent number: 11352593Abstract: An aqueous composition may include: (A) a fluoride ion supply source in an amount that gives a fluoride ion concentration of 0.05 to 30 mmol/L in the composition; (B) a cation supply source in an amount that gives a mole ratio of cations of 0.3 to 20 to the fluoride ions in the composition; and (C) 0.0001 to 10 mass % of one or more compounds selected from a C4-13 alkylphosphonic acid, a C4-13 alkylphosphonate ester, a C4-13 alkyl phosphate and a salt thereof, with respect to the total amount of the composition, wherein pH is in a range of from 2 to 6.Type: GrantFiled: April 25, 2019Date of Patent: June 7, 2022Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Akinobu Horita, Toshiyuki Oie, Takahiro Kikunaga, Kenji Yamada
-
Patent number: 11193094Abstract: The present invention relates to: a liquid composition suitable for the washing of a semiconductor element provided with a low-dielectric-constant interlayer insulating film; and a method for washing a semiconductor element. The liquid composition according to the present invention is characterized by containing tetrafluoroboric acid (A) in an amount of 0.01 to 30% by mass, or boric acid (B1) and hydrogen fluoride (B2) at a (boric acid)/(hydrogen fluoride) ratio of (0.0001 to 5.0/by mass)/(0.005 to 5.0% by mass), and having a pH value of 0.0 to 4.0. The liquid composition according to the present invention can reduce the damage of a low-dielectric-constant interlayer insulating film, cobalt or a cobalt alloy, alumina, a zirconia-based hard mask and a silicon nitride during the process of producing a semiconductor integrated circuit, and accordingly can be used suitably for removing dry etching residues occurring on the surface of the semiconductor integrated circuit.Type: GrantFiled: July 24, 2018Date of Patent: December 7, 2021Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Toshiyuki Oie, Priangga Perdana Putra, Akinobu Horita
-
Publication number: 20210155881Abstract: An aqueous composition may include: (A) a fluoride ion supply source in an amount that gives a fluoride ion concentration of 0.05 to 30 mmol/L in the composition; (B) a cation supply source in an amount that gives a mole ratio of cations of 0.3 to 20 to the fluoride ions in the composition; and (C) 0.0001 to 10 mass % of one or more compounds selected from a C4-13 alkylphosphonic acid, a C4-13 alkylphosphonate ester, a C4-13 alkyl phosphate and a salt thereof, with respect to the total amount of the composition, wherein pH is in a range of from 2 to 6.Type: ApplicationFiled: April 25, 2019Publication date: May 27, 2021Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Akinobu HORITA, Toshiyuki OIE, Takahiro KIKUNAGA, Kenji YAMADA
-
Publication number: 20210147768Abstract: An aqueous composition includes (A) from 0.0001 to 10 mass % of one or more kinds of compounds selected from a C4-13 alkylphosphonic acid, a C4-13 alkylphosphonate ester, a C4-13 alkyl phosphate and a salt thereof, with respect to the total amount of the aqueous composition; and (B) from 0.0001 to 50 mass % of an acid other than the C4-13 alkylphosphonic acid, the C4-13 alkylphosphonate ester and the C4-13 alkyl phosphate or a salt thereof, with respect to the total amount of the aqueous composition.Type: ApplicationFiled: April 25, 2019Publication date: May 20, 2021Applicant: Mitsubishi gas chemical company, INC.Inventors: Toshiyuki OIE, Takahiro KIKUNAGA, Akinobu HORITA, Kenji YAMADA
-
Publication number: 20210087501Abstract: The present invention relates to: a liquid composition suitable for the washing of a semiconductor element provided with a low-dielectric-constant interlayer insulating film; and a method for washing a semiconductor element. The liquid composition according to the present invention is characterized by containing tetrafluoroboric acid (A) in an amount of 0.01 to 30% by mass, or boric acid (B1) and hydrogen fluoride (B2) at a (boric acid)/(hydrogen fluoride) ratio of (0.0001 to 5.0/by mass)/(0.005 to 5.0% by mass), and having a pH value of 0.0 to 4.0. The liquid composition according to the present invention can reduce the damage of a low-dielectric-constant interlayer insulating film, cobalt or a cobalt alloy, alumina, a zirconia-based hard mask and a silicon nitride during the process of producing a semiconductor integrated circuit, and accordingly can be used suitably for removing dry etching residues occurring on the surface of the semiconductor integrated circuit.Type: ApplicationFiled: July 24, 2018Publication date: March 25, 2021Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Toshiyuki OIE, Priangga Perdana PUTRA, Akinobu HORITA
-
Publication number: 20210047593Abstract: An aqueous composition includes (A) from 0.001 to 20 mass % of one or more kinds of fluorine-containing compounds selected from tetrafluoroboric acid, hexafluorosilicic acid, hexafluoroaluminic acid, hexafluorotitanic acid and a salt thereof, with respect to the total amount of the aqueous composition; and (B) from 0.0001 to 10 mass % of one or more kinds of compounds selected from a C4-13 alkylphosphonic acid, a C4-13 alkylphosphonate ester, a C4-13 alkyl phosphate and a salt thereof, with respect to the total amount of the aqueous composition.Type: ApplicationFiled: April 25, 2019Publication date: February 18, 2021Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Toshiyuki OIE, Akinobu HORITA, Takahiro KIKUNAGA, Kenji YAMADA
-
Publication number: 20210002551Abstract: The present invention pertains to a protective fluid for alumina, a protection method, and a production method for semiconductor substrate having an alumina layer using same. This alumina protective fluid is characterized by: containing 0.0001%-20% by mass of an alkali earth metal compound; and the alkali earth metal being at least one selected from the group consisting of beryllium, magnesium, strontium, and barium. As a result of the present invention, alumina corrosion can be suppressed during the production process for semiconductor circuits.Type: ApplicationFiled: February 27, 2019Publication date: January 7, 2021Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Toshiyuki OIE, Priangga PUTRA, Akinobu HORITA
-
Publication number: 20210002591Abstract: The present invention pertains to: a composition capable of removing dry etching residue present on the surface of a semiconductor integrated circuit, while suppressing alumina damage in a production process for the semiconductor integrated circuit; a cleaning method for semiconductor substrates that use alumina; and a production method for a semiconductor substrate having an alumina layer. This composition is characterized by containing 0.00005%-1% by mass of a barium compound (A) and 0.01%-20% by mass of a fluorine compound (B) and having a pH of 2.5-8.0.Type: ApplicationFiled: February 27, 2019Publication date: January 7, 2021Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Toshiyuki OIE, Akinobu HORITA, Kenji YAMADA, Takahiro KIKUNAGA
-
Patent number: 10689573Abstract: The present invention relates to a wet etching composition for a substrate having a SiN layer and a Si layer, comprising 0.1-50 mass % fluorine compound (A), 0.04-10 mass % oxidant (B) and water (D) and having pH in a range of 2.0-5.0. The present invention also relates to a wet etching process for a semiconductor substrate having a SiN layer and a Si layer, the process using the wet etching composition. The composition of the present invention can be used for a substrate having a SiN layer and a Si layer to enhance removal selectivity of Si over SiN while reducing corrosion of the device and the exhaust line and air pollution caused by a volatile component generated upon use and further a burden on the environment caused by the nitrogen content contained in the composition.Type: GrantFiled: September 22, 2017Date of Patent: June 23, 2020Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Akinobu Horita, Kenji Shimada, Kenichi Takahashi, Toshiyuki Oie, Aya Ito
-
Patent number: 10508173Abstract: The present invention provides a composition for an optical material containing a ring compound (a) represented by formula (1), an episulfide compound (b), and sulfur (c), wherein the content of the ring compound (a) in the composition for an optical material is in the range of 5-70 mass %, the content of the episulfide compound (b) is in the range of 20-90 mass %, and the content of the sulfur (c) is in the range of 1-39 mass %. (In the formula, X represents S, Se or Te. a to f=0 to 3, 8?(a+c+e)?1, 8?(b+d+f)?2, and (b+d+f)?(a+c+e).) This composition for an optical material has a high refractive index as an optical characteristic, and has sufficient heat resistance and good mold release characteristics.Type: GrantFiled: June 10, 2016Date of Patent: December 17, 2019Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Yousuke Imagawa, Akinobu Horita, Yoshiaki Yamamoto, Hiroshi Horikoshi
-
Publication number: 20190040317Abstract: The present invention relates to a wet etching composition for a substrate having a SiN layer and a Si layer, comprising 0.1-50 mass % fluorine compound (A), 0.04-10 mass % oxidant (B) and water (D) and having pH in a range of 2.0-5.0. The present invention also relates to a wet etching process for a semiconductor substrate having a SiN layer and a Si layer, the process using the wet etching composition. The composition of the present invention can be used for a substrate having a SiN layer and a Si layer to enhance removal selectivity of Si over SiN while reducing corrosion of the device and the exhaust line and air pollution caused by a volatile component generated upon use and further a burden on the environment caused by the nitrogen content contained in the composition.Type: ApplicationFiled: September 22, 2017Publication date: February 7, 2019Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Akinobu HORITA, Kenji SHIMADA, Kenichi TAKAHASHI, Toshiyuki OIE, Aya ITO
-
Publication number: 20180127549Abstract: The present invention provides a composition for an optical material containing a ring compound (a) represented by formula (1), an episulfide compound (b), and sulfur (c), wherein the content of the ring compound (a) in the composition for an optical material is in the range of 5-70 mass %, the content of the episulfide compound (b) is in the range of 20-90 mass %, and the content of the sulfur (c) is in the range of 1-39 mass %. (In the formula, X represents S, Se or Te. a to f=0 to 3, 8?(a+c+e)?1, 8?(b+d+f)?2, and (b+d+f)?(a+c+e).) This composition for an optical material has a high refractive index as an optical characteristic, and has sufficient heat resistance and good mold release characteristics.Type: ApplicationFiled: June 10, 2016Publication date: May 10, 2018Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Yousuke IMAGAWA, Akinobu HORITA, Yoshiaki YAMAMOTO, Hiroshi HORIKOSHI
-
Patent number: 9658365Abstract: Through an optical material composition containing a compound (a), a compound (b), a polythiol (c) and sulfur (d) according to the present invention, good mold release properties are obtained, and the occurrence of separation mark defects can be suppressed. Compound (a): a compound having the structure represented by formula (1): (In formula (1), m is an integer of 0 to 4 and n is an integer of 0 to 2.) Compound (b): a compound having the structure represented by formula (2): (In formula (2), m is an integer of 0 to 4 and n is an integer of 0 to 2.Type: GrantFiled: December 19, 2014Date of Patent: May 23, 2017Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Akinobu Horita, Yousuke Imagawa, Teruo Kamura, Hiroshi Horikoshi
-
Publication number: 20160259091Abstract: Through an optical material composition containing a compound (a), a compound (b), a polythiol (c) and sulfur (d) according to the present invention, good mold release properties are obtained, and the occurrence of separation mark defects can be suppressed. Compound (a): a compound having the structure represented by formula (1): (In formula (1), m is an integer of 0 to 4 and n is an integer of 0 to 2.) Compound (b): a compound having the structure represented by formula (2): (In formula (2), m is an integer of 0 to 4 and n is an integer of 0 to 2.Type: ApplicationFiled: December 19, 2014Publication date: September 8, 2016Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Akinobu HORITA, Yousuke IMAGAWA, Teruo KAMURA, Hiroshi HORIKOSHI
-
Publication number: 20160202391Abstract: The present invention is able to provide an optical material composition containing: a polythiol compound satisfying one of the below mentioned i) through iii); and a polyepoxy compound and/or a polyepisulfide compound of which i) the ammonium cation concentration is 0.1-150 ?mol/kg, ii) the thiocyanate anion concentration is 0.1-300 ?mol/kg, or iii) the ammonium cation concentration is 0.1-150 ?mol/kg, the thiocyanate anion concentration is 0.1-300 ?mol/kg, and furthermore the ion concentration product of the ammonium cations and the thiocyanate anions is 0.01-15000 (?mol/kg)2.Type: ApplicationFiled: October 14, 2014Publication date: July 14, 2016Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Naotsugu SHIMODA, Akinobu HORITA, Teruo KAMURA, Eiji KOSHIISHI