Patents by Inventor Akinobu Oshima

Akinobu Oshima has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4863835
    Abstract: A developer composition for a lithographic printing plate provided with a coated layer composed of a photosensitive polymer having in the main chain thereof groups of formula (I) ##STR1## wherein X and Y independently represent hydrogen, halogen, cyano or nitro and n is an integer of 1 or 2, comprising:(A) benzyl alcohol,(B) tetrahydrofurfuryl alcohol and(C) at least one acid selected from the group consisting of a mineral acid, an organic carboxylic acid and an organic sulfonic acid.
    Type: Grant
    Filed: November 8, 1982
    Date of Patent: September 5, 1989
    Assignee: Mitsubishi Chemical Industries Limited
    Inventors: Shigeki Shimizu, Akinobu Oshima, Hiroshi Ide, Noriaki Takahashi
  • Patent number: 4421841
    Abstract: A photosensitive lithographic plate having, on a substrate, a photosensitive layer comprising a photosensitive polyester containing at least (A):(a) an aromatic dicarboxylic acid unit represented by the general formula: ##STR1## where m and n each represents an integer of 0 or 1, with at least one of them being 1,(b) a dicarboxylic acid unit having a sulfonate group, and(c) a diol unit represented by the general formula: ##STR2## represents a hydrogenated benzene ring, R.sup.1 and R.sup.2 each represents an alkylene group of 2-4 carbon atoms, R.sup.3 and R.sup.4 each represents a hydrogen atom or an alkyl group of 1-6 carbon atoms, r and s each represents an integer of from 0 to 3 and t represents an integer of 0 or 1.
    Type: Grant
    Filed: July 14, 1982
    Date of Patent: December 20, 1983
    Assignee: Mitsubishi Chemical Industries Limited
    Inventors: Shigeki Shimizu, Akinobu Oshima
  • Patent number: 4267260
    Abstract: A developer for use with a lithographic photo-sensitive medium of a polyether resin, comprising a compound of the formula:RO--CH.sub.2 --CH.sub.2 --O--.sub.k R.sup.1orROCH.sub.2 CH.sub.2 OR.sup.2(wherein R represents an alkyl group with carbon number of 1 to 4, R.sup.1 represents hydrogen or an acyl group, R.sup.2 represents an acyl group with a carbon number of 2 to 5, and k represents an integer of 2 to 3).
    Type: Grant
    Filed: July 19, 1976
    Date of Patent: May 12, 1981
    Assignee: Mitsubishi Chemical Industries, Ltd.
    Inventors: Konoe Miura, Chihiro Eguchi, Yoshihiro Takahashi, Akinobu Oshima, Kazuo Torige, Shinichi Bunya
  • Patent number: 4258124
    Abstract: A photosensitive composition comprising a polyester formed from dicarboxylic acid units of the formula: ##STR1## wherein 1, m, n, p and q are independently an integer of 0 or 1 with at least one of 1, m and n having a value of 1, X and Y are independently hydrogen or X and Y are combined to form an alkylene group containing 1-4 carbon atoms; and said polyester containing alkylene glycol units of the formula: --O--(RO--.sub.r wherein R is alkylene of 2-4 carbon atoms and r is an integer of 2-4 and said polyester also containing hydrogenated bisphenol units represented by the formula: ##STR2## wherein R.sup.1 and R.sup.2 independently are hydrogen or an alkyl group of 1-6 carbon atoms.
    Type: Grant
    Filed: September 7, 1979
    Date of Patent: March 24, 1981
    Assignee: Mitsubishi Chemical Industries Ltd.
    Inventors: Shigeki Shimizu, Akinobu Oshima