Patents by Inventor Akinori Ohkubo
Akinori Ohkubo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9182289Abstract: An apparatus for estimating a wavefront parameter includes a light source, a lenslet array, a detector for detecting light generated by the light source and passed through the lenslet array, a wavefront corrective element disposed between the lenslet array and the light source; and a data analyzer configured to estimate at least one wavefront parameter at a plane located on the light source side of the corrective element. The lenslet array and the sensor array are arranged to form a wavefront sensor, and the wavefront corrective element is configured to correct an aberration of the wavefront.Type: GrantFiled: March 12, 2012Date of Patent: November 10, 2015Assignees: Canon Kabushiki Kaisha, The Arizona Board of Regents on Behalf of the University of ArizonaInventors: Harrison Barrett, Luca Caucci, Lars Furenlid, Akinori Ohkubo
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Patent number: 9091614Abstract: An apparatus for measuring a wavefront of light traveling through test optics includes: a light source; a lenslet array where light from the light source travels through; a detector array configured to acquire a light intensity distribution through the lenslet array; and a processing unit, wherein the processing unit executes data processing with the acquired light intensity distribution, the data processing comprising an estimation process using a beamlet-based propagation model or a ray-based propagation model as a forward propagation model.Type: GrantFiled: May 20, 2011Date of Patent: July 28, 2015Assignee: Canon Kabushiki KaishaInventors: Akinori Ohkubo, Yasuyuki Unno
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Publication number: 20150073752Abstract: A wavefront measuring apparatus configured to measure a transmitted wavefront or reflected wavefront of an optical element includes a measuring unit configured to measure a light intensity distribution based on a light beam transmitted through or reflected by the optical element, a region determining unit configured to determine a first region and a second region based on a plurality of spot positions in the light intensity distribution, a first signal processor configured to calculate a first wavefront by using a linear model based on information of the light intensity distribution of the first region, and a second signal processor configured to estimate a second wavefront by repeating a light propagation calculation with the first wavefront as an initial value based on information of the light intensity distributions of the first region and the second region.Type: ApplicationFiled: August 21, 2014Publication date: March 12, 2015Inventors: Akinori OHKUBO, Yuki YONETANI
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Publication number: 20130092816Abstract: An apparatus for estimating a wavefront parameter includes a light source, a lenslet array, a detector for detecting light generated by the light source and passed through the lenslet array, a wavefront corrective element disposed between the lenslet array and the light source; and a data analyzer configured to estimate at least one wavefront parameter at a plane located on the light source side of the corrective element. The lenslet array and the sensor array are arranged to form a wavefront sensor, and the wavefront corrective element is configured to correct an aberration of the wavefront.Type: ApplicationFiled: March 12, 2012Publication date: April 18, 2013Applicants: CANON KABUSHIKI KAISHA, The Arizona Board of Regents on behalf of the University of ArizonaInventors: Harrison Barrett, Luca Caucci, Lars Furenlid, Akinori Ohkubo
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Publication number: 20120296591Abstract: An apparatus for measuring a wavefront of light traveling through test optics includes: a light source; a lenslet array where light from the light source travels through; a detector array configured to acquire a light intensity distribution through the lenslet array; and a processing unit, wherein the processing unit executes data processing with the acquired light intensity distribution, the data processing comprising an estimation process using a beamlet-based propagation model or a ray-based propagation model as a forward propagation model.Type: ApplicationFiled: May 20, 2011Publication date: November 22, 2012Applicant: CANON KABUSHIKI KAISHAInventors: Akinori Ohkubo, Yasuyuki Unno
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Patent number: 8314938Abstract: A method for measuring a surface profile of an object, the method includes, acquiring information about a first direction where a step of a surface of the object extends relative to a scanning direction, setting phase distribution applied to the irradiation beam according to the information, and scanning the object in the scanning direction with the irradiation beam.Type: GrantFiled: July 30, 2010Date of Patent: November 20, 2012Assignee: Canon Kabushiki KaishaInventors: Akinori Ohkubo, Yasuyuki Unno
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Patent number: 8223313Abstract: A measurement apparatus which illuminates a pattern inserted on the object plane of an optical system, and measures a light intensity distribution corresponding to the pattern formed on the image plane of the optical system includes a sensor. The sensor includes a light-shielding member having a slit and a plurality of light-receiving units, wherein the light-shielding member is inserted on the image plane of the optical system and rotates and scans, and the plurality of light-receiving units receive light transmitted through the slit. The measurement apparatus controls rotation of the light-shielding member, on the basis of the positional relationship between the plurality of light-receiving units, and the phase differences between the signals detected by the plurality of light-receiving units arising from the scan of the light-shielding member.Type: GrantFiled: January 14, 2009Date of Patent: July 17, 2012Assignee: Canon Kabushiki KaishaInventor: Akinori Ohkubo
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Patent number: 8139215Abstract: In a measurement method for measuring polarization characteristics in which an image of a mask pattern is projected onto an image plane, a first and second slit having a width less than or equal to the wavelength of a light source are displaced on the image plane and light passing through the first and second slit is detected to obtain a first and second light intensity distribution with respect to the direction of displacement of the first and second slit. The positions at which the first light intensity distribution takes a maximum and a minimum value are determined. An index value is calculated using the respective light intensities in the second light intensity distribution at positions corresponding to the determined maximum and minimum positions. Polarization characteristics corresponding to the calculated index value are obtained by using information expressing the relationship between the index value and the polarization characteristics.Type: GrantFiled: November 9, 2009Date of Patent: March 20, 2012Assignee: Canon Kabushiki KaishaInventor: Akinori Ohkubo
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Publication number: 20120026511Abstract: A method for measuring a surface profile of an object, the method includes, acquiring information about a first direction where a step of a surface of the object extends relative to a scanning direction, setting phase distribution applied to the irradiation beam according to the information, and scanning the object in the scanning direction with the irradiation beam.Type: ApplicationFiled: July 30, 2010Publication date: February 2, 2012Applicant: CANON KABUSHIKI KAISHAInventors: Akinori Ohkubo, Yasuyuki Unno
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Patent number: 8085384Abstract: An exposure apparatus that exposes a pattern of an original onto a substrate includes a condenser optical system configured to split light from a light source into plural rays, to condense the plural rays at different positions on the original, and to make a central part of each of the plural rays that illuminate the original darker than a periphery at the Fourier transform plane with respect to the original, and a projection optical system configured to project the pattern of the original onto the substrate.Type: GrantFiled: April 30, 2007Date of Patent: December 27, 2011Assignee: Canon Kabushiki KaishaInventors: Akinori Ohkubo, Akiyoshi Suzuki
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Patent number: 8009272Abstract: An image measurement method is provided for measuring an image of a pattern of a mask projected with a projection optical system. The method includes the steps of detecting light transmitted through an aperture while a substrate is arranged at an image plane of the projection optical system, the substrate having a slit and the aperture having a width larger than a width of the slit; adjusting an alignment angle of the slit on the basis of a signal related to the light detected in the detecting; and measuring the image by detecting light transmitted through the slit while moving the slit, the alignment angle of which has been adjusted in the adjusting, in the image plane of the projection optical system.Type: GrantFiled: May 12, 2008Date of Patent: August 30, 2011Assignee: Canon Kabushiki KaishaInventor: Akinori Ohkubo
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Patent number: 7929113Abstract: A measurement apparatus which illuminates a pattern positioned on an object plane to form an aerial image 40 on an image plane and measures a light intensity distribution of the aerial image 40 via a slit 54 on the image plane, the measurement apparatus including a stage 60 moving the slit, a light receiving element 53 mounted on the stage 60 and including at least two light receiving portions which receive the light transmitted through the slit, a storage unit which stores a relationship between an angle ? and a distance between a center position of the slit 54 and a position where a intensity of light that the light receiving element 53 receives is maximum, a calculation unit which obtains the angle ?, and a stage driving unit 80 which rotates the stage 60 so that the angle ? is equal to zero.Type: GrantFiled: April 30, 2009Date of Patent: April 19, 2011Assignee: Canon Kabushiki KaishaInventor: Akinori Ohkubo
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Patent number: 7911585Abstract: A measurement apparatus configured to measure a light intensity distribution in a plane to be measured includes a mask including an opening having a dimension smaller than a wavelength of light for forming the light intensity distribution, and a light-shielding portion being configured to substantially shield the light; a first photoelectric conversion element configured to receive the light passing through the opening and output a light intensity signal; and a second photoelectric conversion element arranged at a position apart from the first photoelectric conversion element, and configured to receive the light transmitted through the light-shielding portion and output a light intensity signal. The mask, and the first and second photoelectric conversion elements are moved along the plane to be measured. The light intensity distribution in the plane to be measured is calculated on the basis of the light intensity signals respectively output from the first and second photoelectric conversion elements.Type: GrantFiled: July 3, 2008Date of Patent: March 22, 2011Assignee: Canon Kabushiki KaishaInventor: Akinori Ohkubo
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Publication number: 20100118304Abstract: In a measurement method for measuring polarization characteristics in which an image of a mask pattern is projected onto an image plane, a first and second slit having a width less than or equal to the wavelength of a light source are displaced on the image plane and light passing through the first and second slit is detected to obtain a first and second light intensity distribution with respect to the direction of displacement of the first and second slit. The positions at which the first light intensity distribution takes a maximum and a minimum value are determined. An index value is calculated using the respective light intensities in the second light intensity distribution at positions corresponding to the determined maximum and minimum positions. Polarization characteristics corresponding to the calculated index value are obtained by using information expressing the relationship between the index value and the polarization characteristics.Type: ApplicationFiled: November 9, 2009Publication date: May 13, 2010Applicant: CANON KABUSHIKI KAISHAInventor: Akinori Ohkubo
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Publication number: 20090274963Abstract: A measurement apparatus which illuminates a pattern positioned on an object plane to form an aerial image 40 on an image plane and measures a light intensity distribution of the aerial image 40 via a slit 54 on the image plane, the measurement apparatus including a stage 60 moving the slit, a light receiving element 53 mounted on the stage 60 and including at least two light receiving portions which receive the light transmitted through the slit, a storage unit which stores a relationship between an angle ? and a distance between a center position of the slit 54 and a position where a intensity of light that the light receiving element 53 receives is maximum, a calculation unit which obtains the angle ?, and a stage driving unit 80 which rotates the stage 60 so that the angle ? is equal to zero.Type: ApplicationFiled: April 30, 2009Publication date: November 5, 2009Applicant: CANON KABUSHIKI KAISHAInventor: Akinori Ohkubo
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Publication number: 20090180094Abstract: A measurement apparatus which illuminates a pattern inserted on the object plane of an optical system, and measures a light intensity distribution corresponding to the pattern formed on the image plane of the optical system includes a sensor. The sensor includes a light-shielding member having a slit and a plurality of light-receiving units, wherein the light-shielding member is inserted on the image plane of the optical system and rotates and scans, and the plurality of light-receiving units receive light transmitted through the slit. The measurement apparatus controls rotation of the light-shielding member, on the basis of the positional relationship between the plurality of light-receiving units, and the phase differences between the signals detected by the plurality of light-receiving units arising from the scan of the light-shielding member.Type: ApplicationFiled: January 14, 2009Publication date: July 16, 2009Applicant: CANON KABUSHIKI KAISHAInventor: Akinori Ohkubo
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Publication number: 20090009740Abstract: A measurement apparatus configured to measure a light intensity distribution in a plane to be measured includes a mask including an opening having a dimension smaller than a wavelength of light for forming the light intensity distribution, and a light-shielding portion being configured to substantially shield the light; a first photoelectric conversion element configured to receive the light passing through the opening and output a light intensity signal; and a second photoelectric conversion element arranged at a position apart from the first photoelectric conversion element, and configured to receive the light transmitted through the light-shielding portion and output a light intensity signal. The mask, and the first and second photoelectric conversion elements are moved along the plane to be measured. The light intensity distribution in the plane to be measured is calculated on the basis of the light intensity signals respectively output from the first and second photoelectric conversion elements.Type: ApplicationFiled: July 3, 2008Publication date: January 8, 2009Applicant: CANON KABUSHIKI KAISHAInventor: Akinori Ohkubo
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Publication number: 20080291420Abstract: An image measurement method is provided for measuring an image of a pattern of a mask projected with a projection optical system. The method includes the steps of detecting light transmitted through an aperture while a substrate is arranged at an image plane of the projection optical system, the substrate having a slit and the aperture having a width larger than a width of the slit; adjusting an alignment angle of the slit on the basis of a signal related to the light detected in the detecting; and measuring the image by detecting light transmitted through the slit while moving the slit, the alignment angle of which has been adjusted in the adjusting, in the image plane of the projection optical system.Type: ApplicationFiled: May 12, 2008Publication date: November 27, 2008Applicant: CANON KABUSHIKI KAISHAInventor: Akinori Ohkubo
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Patent number: 7414240Abstract: A particle remover includes an irradiation unit for irradiating plural lights onto a target from different directions, and for scanning the lights on the target, and a collector for collecting particles carried as a result of scanning of the lights.Type: GrantFiled: October 20, 2005Date of Patent: August 19, 2008Assignee: Canon Kabushiki KaishaInventors: Akinori Ohkubo, Kenji Yamazoe, Hiroshi Osawa
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Patent number: 7379151Abstract: An exposure apparatus for exposing a pattern of a mask onto a plate to be exposed, the exposure apparatus includes a cleaning apparatus for cleaning the mask. The cleaning apparatus includes an irradiating part for irradiating a laser beam to the mask, and a polarization controller for controlling a polarization characteristic of the laser beam according to a longitudinal direction of the pattern.Type: GrantFiled: July 13, 2006Date of Patent: May 27, 2008Assignee: Canon Kabushiki KaishaInventors: Hiroshi Osawa, Akinori Ohkubo, Kenji Yamazoe