Patents by Inventor Akinori Shimamura
Akinori Shimamura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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APPARATUS FOR TRANSFERRING SUBSTRATE, SUBSTRATE PROCESSING SYSTEM AND METHOD OF PROCESSING SUBSTRATE
Publication number: 20240120225Abstract: Provided is an apparatus that transfers a substrate inside a substrate transfer chamber by a substrate transfer module using magnetic levitation. The apparatus includes: a substrate transfer chamber having a floor portion provided with a first magnet and connected, through an opening portion, to a substrate processing chamber in which the substrate is processed; and a substrate transfer module including a substrate holder configured to hold the substrate, and a second magnet configured such that a repulsive force acts between the first magnet and the second magnet. The substrate transfer module is movable inside the substrate transfer chamber by the magnetic levitation based on the repulsive force. The substrate transfer module performs loading/unloading of the substrate by directly entering into the substrate transfer chamber via the opening portion, or delivers the substrate to and from a substrate transfer mechanism fixedly provided inside the substrate transfer chamber.Type: ApplicationFiled: January 12, 2022Publication date: April 11, 2024Inventors: Takehiro SHINDO, Akinori SHIMAMURA, Hiromitsu SAKAUE, Dongwei LI -
Publication number: 20230154777Abstract: There is a substrate transfer apparatus comprising: a circular tube having a tube axis extending in a lateral direction and having a transfer region for a substrate in the circular tube; a magnetic field generating portion having a magnetic field generating surface facing the transfer region and configured to generate a magnetic field on the magnetic field generating surface; and a transfer body configured to transfer the substrate while moving in a plane direction of the magnetic field generating surface in a state that the transfer body is distant from the magnetic field generating surface by the magnetic field.Type: ApplicationFiled: November 3, 2022Publication date: May 18, 2023Inventors: Akinori SHIMAMURA, Hiroki OKA
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Patent number: 10615378Abstract: A reduced-pressure drying apparatus, for drying solution on a substrate in a chamber in a depressurized state, includes a solvent collecting unit that is a net-shaped plate configured to temporarily collect a solvent in the solution vaporized from the substrate. The solvent collecting unit is provided to face the substrate in the chamber, and the net-shaped plate has an opening ratio of 60% to 80% and a thermal capacity of 850 J/K or less per 1 m2.Type: GrantFiled: September 28, 2017Date of Patent: April 7, 2020Assignee: Tokyo Electron LimitedInventors: Akinori Shimamura, Teruyuki Hayashi
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Publication number: 20180097205Abstract: A reduced-pressure drying apparatus, for drying solution on a substrate in a chamber in a depressurized state, includes a solvent collecting unit that is a net-shaped plate configured to temporarily collect a solvent in the solution vaporized from the substrate. The solvent collecting unit is provided to face the substrate in the chamber, and the net-shaped plate has an opening ratio of 60% to 80% and a thermal capacity of 850 J/K or less per 1 m2.Type: ApplicationFiled: September 28, 2017Publication date: April 5, 2018Inventors: Akinori SHIMAMURA, Teruyuki HAYASHI
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Patent number: 8191505Abstract: A processing gas introducing mechanism for introducing a processing gas into a processing space is provided between a plasma generation unit and a chamber of a plasma processing apparatus. The processing gas introducing mechanism includes a gas introducing base having therein a gas introducing path for introducing the processing gas into the processing space, and a near ring-shaped gas introducing plate equipped in the hole part of the gas introducing base such that it can be detached therefrom. Herein, the gas introducing base has a hole part forming one portion of the processing space in a central portion thereof, and the gas introducing plate has plural gas discharge holes communicating with the processing space to discharge thereinto the processing gas from the gas introducing path.Type: GrantFiled: June 23, 2009Date of Patent: June 5, 2012Assignee: Tokyo Electron LimitedInventors: Takayuki Kamaishi, Akinori Shimamura, Masato Morishima
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Publication number: 20090260762Abstract: A processing gas introducing mechanism for introducing a processing gas into a processing space is provided between a plasma generation unit and a chamber of a plasma processing apparatus. The processing gas introducing mechanism includes a gas introducing base having therein a gas introducing path for introducing the processing gas into the processing space, and a near ring-shaped gas introducing plate equipped in the hole part of the gas introducing base such that it can be detached therefrom. Herein, the gas introducing base has a hole part forming one portion of the processing space in a central portion thereof, and the gas introducing plate has plural gas discharge holes communicating with the processing space to discharge thereinto the processing gas from the gas introducing path.Type: ApplicationFiled: June 23, 2009Publication date: October 22, 2009Applicant: TOKYO ELECTRON LIMITEDInventors: Takayuki Kamaishi, Akinori Shimamura, Masato Morishima
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System, apparatus, and method for processing information, and computer program, and recording medium
Patent number: 7392252Abstract: An information processing apparatus, present in an intranet, sharing information with an information processing apparatus present in the other intranet connected to the intranet via a network, includes a memory storing the information, and a controller setting the information stored in the memory to an update disabled state in the updating of the information stored in the memory if the information is in an update enabled state, requesting the information processing apparatus sharing the information and present in the other intranet to set an update disabled state, and updating the information on condition that the update disabled state is set in all information processing apparatuses sharing the information and present in the intranets. Updating of the information shared by a plurality of intranets connected to each other via a network is thus synchronized to prevent updating contention.Type: GrantFiled: February 28, 2005Date of Patent: June 24, 2008Assignee: Fujitsu LimitedInventors: Hiroshi Tsukada, Akihiro Kaneko, Akinori Shimamura -
Publication number: 20070089672Abstract: The present invention is a substrate placing mechanism including: a placing stage provided for placing a substrate to be processed thereon in a processing container in which a processing atmosphere is formed by a process gas, the placing stage having a plurality of pin-inserting holes; a plurality of lifter-pins, each of which is inserted into and vertically movable in each of the plurality of pin-inserting holes; an elevating member that supports the plurality of lifter-pins; and an elevating mechanism that causes the lifter-pins to vertically move via the elevating member. Each of the plurality of pin-inserting holes has a circular protrusion at an opening part of a lower end thereof. The circular protrusion protrudes inwardly and circularly. Each of the plurality of lifter-pins has a diameter-increasing part configured to be supported by the circular protrusion to close the opening part when a corresponding lifter-pin is caused to move down.Type: ApplicationFiled: September 27, 2006Publication date: April 26, 2007Inventors: Akinori Shimamura, Kentaro Asakura
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System, apparatus, and method for processing information, and computer program, and recording medium
Publication number: 20060101087Abstract: An information processing apparatus, present in an intranet, sharing information with an information processing apparatus present in the other intranet connected to the intranet via a network, includes a memory storing the information, and a controller setting the information stored in the memory to an update disabled state in the updating of the information stored in the memory if the information is in an update enabled state, requesting the information processing apparatus sharing the information and present in the other intranet to set an update disabled state, and updating the information on condition that the update disabled state is set in all information processing apparatuses sharing the information and present in the intranets. Updating of the information shared by a plurality of intranets connected to each other via a network is thus synchronized to prevent updating contention.Type: ApplicationFiled: February 28, 2005Publication date: May 11, 2006Applicant: FUJITSU LIMITEDInventors: Hiroshi Tsukada, Akihiro Kaneko, Akinori Shimamura -
Publication number: 20060060141Abstract: A processing gas introducing mechanism for introducing a processing gas into a processing space is provided between a plasma generation unit and a chamber of a plasma processing apparatus. The processing gas introducing mechanism includes a gas introducing base having therein a gas introducing path for introducing the processing gas into the processing space, and a near ring-shaped gas introducing plate equipped in the hole part of the gas introducing base such that it can be detached therefrom. Herein, the gas introducing base has a hole part forming one portion of the processing space in a central portion thereof, and the gas introducing plate has plural gas discharge holes communicating with the processing space to discharge thereinto the processing gas from the gas introducing path.Type: ApplicationFiled: November 2, 2005Publication date: March 23, 2006Applicant: TOKYO ELECTRON LIMITEDInventors: Takayuki Kamaishi, Akinori Shimamura, Masato Morishima