Abstract: The control unit controls the relative position in an optical axis direction of the projection system and the relative position in a direction perpendicular to an optical axis direction at a third timing after a second timing based on a first distribution of illumination light detected by the detection system at a first timing and a second distribution of illumination light detected by the detection system at the second timing after the first timing, the illumination light detected at the first and second timings having passed through the first and second marks.

Abstract: The control unit controls the relative position in an optical axis direction of the projection system and the relative position in a direction perpendicular to an optical axis direction at a third timing after a second timing based on a first distribution of illumination light detected by the detection system at a first timing and a second distribution of illumination light detected by the detection system at the second timing after the first timing, the illumination light detected at the first and second timings having passed through the first and second marks.

Abstract: The present invention provides an exposure apparatus that performs an exposure process to transfer a pattern of a mask to a substrate, including a projection optical system configured to project the pattern of the mask onto the substrate, a measurement pattern arranged on an object plane of the projection optical system and including a plurality of pattern elements having different positions in an optical axis direction of the projection optical system, a first detection unit configured to detect light from the measurement pattern via the projection optical system, and a control unit configured to control a relative position between the mask and the substrate in the optical axis direction when the exposure process is performed.

Abstract: The present invention provides an exposure apparatus that performs an exposure process to transfer a pattern of a mask to a substrate, including a projection optical system configured to project the pattern of the mask onto the substrate, a measurement pattern arranged on an object plane of the projection optical system and including a plurality of pattern elements having different positions in an optical axis direction of the projection optical system, a first detection unit configured to detect light from the measurement pattern via the projection optical system, and a control unit configured to control a relative position between the mask and the substrate in the optical axis direction when the exposure process is performed.

Abstract: The present invention provides a detection apparatus which detects an original mark on an original and a substrate mark on a substrate, the original mark and the substrate mark being arranged via a projection optical system, the apparatus comprising an optical system including an imaging device and configured to form an image of the original mark and an image of the substrate mark onto the imaging device, wherein the optical system includes a detection reference member having a first mark and a second mark, and is configured to form an image of the first mark onto the original, form an image of the second mark onto the substrate via the projection optical system and the original, and form the image of the first mark, and the image of the second mark onto the imaging device.

Abstract: The present invention provides a detection apparatus which detects an original mark on an original and a substrate mark on a substrate, the original mark and the substrate mark being arranged via a projection optical system, the apparatus comprising an optical system including an imaging device and configured to form an image of the original mark and an image of the substrate mark onto the imaging device, wherein the optical system includes a detection reference member having a first mark and a second mark, and is configured to form an image of the first mark onto the original, form an image of the second mark onto the substrate via the projection optical system and the original, and form the image of the first mark, and the image of the second mark onto the imaging device.

Abstract: The vessel monitoring system has, in a trial navigation by provisionally setting a value of the speed of the own vessel arbitrarily, a display unit immediately display an Obstacle Zone by Targets (OZT) corresponding to the speed of the own vessel. The vessel monitoring system includes a calculator for calculating an Obstacle Zone by Targets, a display unit for displaying the Obstacle Zone by Targets obtained by the calculation by the calculator, and an integrated controller for processing trial navigation that integrally controls mutually cooperated processing of calculation by the calculator and display by the display unit, in a trial navigation by provisionally setting a value of the speed of the own vessel arbitrarily, so that the calculator calculates an Obstacle Zone by Targets corresponding to the arbitrarily and provisionally set value of the speed of the own vessel, and the display unit displays the result of the calculation.

Abstract: The vessel monitoring system has, in a trial navigation by provisionally setting a value of the speed of the own vessel arbitrarily, a display unit immediately display an Obstacle Zone by Targets (OZT) corresponding to the speed of the own vessel. The vessel monitoring system includes a calculator for calculating an Obstacle Zone by Targets, a display unit for displaying the Obstacle Zone by Targets obtained by the calculation by the calculator, and an integrated controller for processing trial navigation that integrally controls mutually cooperated processing of calculation by the calculator and display by the display unit, in a trial navigation by provisionally setting a value of the speed of the own vessel arbitrarily, so that the calculator calculates an Obstacle Zone by Targets corresponding to the arbitrarily and provisionally set value of the speed of the own vessel, and the display unit displays the result of the calculation.

Abstract: An exposure apparatus according to this invention comprises an illumination optical system which illuminates an original with exposure light, a projection optical system which projects an image of the original onto a substrate, an original stage which holds and drives the original, a substrate stage which holds and drives the substrate, and a position detection apparatus which detects the relative position between the original and the substrate. A plurality of different first marks are formed on at least one of the original and a reference plate held on the original stage. The position detection apparatus has a function of selecting a first mark in accordance with the illumination condition from a plurality of first marks, and detecting the relative position between the original and the substrate using the selected first mark and a second mark formed on the substrate stage.

Abstract: An exposure apparatus for exposing a pattern of a reticle onto a plate while synchronously scanning the reticle and the plate, said exposure apparatus includes a projection optical system for projecting the pattern of the reticle onto the plate, a measuring part for measuring a position of a surface of a target to be measured in an optical axis direction of the projection optical system, and a controller for controlling the position of the surface of the target in the optical axis direction based on a measurement result by the measuring part, wherein said measuring part measures a position of the same measurement point on the surface of the target plural times, wherein said controller uses, as a measurement value of the same measurement point, an average value of plural measurement results obtained at the same measurement point, and wherein said target is the reticle or the plate.

Abstract: An exposure apparatus for exposing a pattern of a reticle onto a plate while synchronously scanning the reticle and the plate, said exposure apparatus includes a projection optical system for projecting the pattern of the reticle onto the plate, a measuring part for measuring a position of a surface of a target to be measured in an optical axis direction of the projection optical system, and a controller for controlling the position of the surface of the target in the optical axis direction based on a measurement result by the measuring part, wherein said measuring part measures a position of the same measurement point on the surface of the target plural times, wherein said controller uses, as a measurement value of the same measurement point, an average value of plural measurement results obtained at the same measurement point, and wherein said target is the reticle or the plate.

Abstract: The present invention relates to an automobile pilot system employing an electronic navigation receiver such as a Loran C receiver and an azimuth detector such as a magnetic compass. The automatic pilot system is capable of coping with undesirable forces to move a moving body laterally due to current flows and the wind, thereby directing the moving body to a destination point preset.