Patents by Inventor Akio Inada

Akio Inada has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6713975
    Abstract: A lighting apparatus capable of improving amenity and energy-saving and controlling a lighting load as a user intends to do. The lighting apparatus is connected to a network and controlling the lighting load corresponding to information from the network, and the lighting apparatus further comprises an automatic mode for controlling the lighting load corresponding to the information from the network, a manual mode for controlling the lighting load independently of the information from the network, and a switching means for switching between the automatic mode and the manual mode.
    Type: Grant
    Filed: July 27, 2001
    Date of Patent: March 30, 2004
    Assignee: Hitachi, Ltd.
    Inventors: Tatsumi Yamauchi, Fumio Murabayashi, Haruki Komatsu, Akio Inada
  • Publication number: 20020050799
    Abstract: A lighting apparatus capable of improving amenity and energy-saving and controlling a lighting load as a user intends to do. The lighting apparatus is connected to a network and controlling the lighting load corresponding to information from the network, and the lighting apparatus further comprises an automatic mode for controlling the lighting load corresponding to the information from the network, a manual mode for controlling the lighting load independently of the information from the network, and a switching means for switching between the automatic mode and the manual mode.
    Type: Application
    Filed: July 27, 2001
    Publication date: May 2, 2002
    Inventors: Tatsumi Yamauchi, Fumio Murabayashi, Haruki Komatsu, Akio Inada
  • Patent number: 5478401
    Abstract: An apparatus and method for surface treatment of a substance to be processed, which are capable of decreasing the number of foreign matters holding on the reverse side of the substance more than prior art like apparatus and method without largely decreasing a surface treating speed as compared with that of the prior art, by supplying ozone gas to the surface of the substance mounted on a supporting base. The supporting base has a heating part and a supporting part. There is provided a supporting material on the surface of the supporting part for partly supporting one side of the substance to be processed so that a required amount of gap may be formed between the substance to be processed and the supporting part. In the heating part is built a heater. And for a member constituting the supporting part is used a material having greater emissivity than a member constituting the heating part.
    Type: Grant
    Filed: March 7, 1995
    Date of Patent: December 26, 1995
    Assignee: Hitachi, Ltd.
    Inventors: Sukeyoshi Tsunekawa, Keisuke Funatsu, Kenichi Kawasumi, Akio Inada, Masaro Kaku
  • Patent number: 5246526
    Abstract: In a surface treatment apparatus, an organic substance is removed through ashing by ultraviolet rays and ozone at atmospheric pressure. A transparent partition plate is provided in closely spaced, opposed relation to a material to be treated, and at least one gas outlet is open to that surface of the partition plate opposed to the material to be treated. With this arrangement, the gas can be directly collected via the gas outlet during the treatment, and the end point of the organic substance removal treatment can be detected by analyzing the collected gas.
    Type: Grant
    Filed: July 2, 1992
    Date of Patent: September 21, 1993
    Assignee: Hitachi, Ltd.
    Inventors: Sumio Yamaguchi, Akio Inada, Kenichi Kawasumi
  • Patent number: 4842828
    Abstract: A surface treatment apparatus for treating the surface of a substrate that is supported on a rotating table. The apparatus has a plate transmissive of ultraviolet rays that is mounted in parallel with the substrate. The plate has a plurality of supply nozzles for supplying a reactive gas to the rotating substrate surface, the nozzles being provided at positions of different radius of rotation in order to complete the surface treatment in a short period of time.
    Type: Grant
    Filed: January 27, 1988
    Date of Patent: June 27, 1989
    Assignee: Hitachi, Ltd.
    Inventors: Ken-ichi Kawasumi, Akio Inada
  • Patent number: 4344018
    Abstract: A high pressure metal vapor discharge lamp according to the present invention comprises the following first and second starting aid circuits mounted within an outer envelope. The first starting aid circuit includes a starting aid and a first thermal switch, and the second starting aid circuit includes a resistive element and a second thermal switch. These two thermal switches are arranged so that at the time of re-starting after a certain period of stopping, the first thermal switch is reset earlier than the second thermal switch. In this high pressure metal vapor discharge lamp having this specific structure, the starting characteristic is improved, and a high voltage pulse generated by the second starting aid circuit and a ballast is assuredly absorbed by an arc tube and occurrence of dielectric breakdown in the respective elements can be completely prevented.
    Type: Grant
    Filed: May 23, 1980
    Date of Patent: August 10, 1982
    Assignee: Hitachi, Ltd.
    Inventor: Akio Inada