Patents by Inventor Akio Iwaki

Akio Iwaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4961859
    Abstract: A method and a device of dividing an aqueous processing waste solution of a non-silver halide light-sensitive material into solid and water are disclosed comprising the steps of:(a) introducing said solution into an evaporator,(b) concentrating by heating said solution,(c) removing sludge produced from the evaporator during concentrating by heating said solution,(d) separating the sludge into solid and liquid and(e) cooling and condensing evaporated gas to liquid.
    Type: Grant
    Filed: January 31, 1989
    Date of Patent: October 9, 1990
    Assignee: Konica Corporation
    Inventors: Masafumi Uehara, Akira Nogami, Kazuhiro Shimura, Keiichi Yumiki, Akio Iwaki
  • Patent number: 4522891
    Abstract: A support for lithographic printing plate having provided on an iron material (i) a layer substantially consisting of chromium and/or chromium oxide and (ii) a layer consisting essentially of a water soluble polymeric compound and at least one selected from water soluble salts of calcium, magnesium, zinc, barium, strontium, cobalt, manganese, nickel and silicon, in this order.
    Type: Grant
    Filed: June 6, 1983
    Date of Patent: June 11, 1985
    Assignee: Konishiroku Photo Industry Co., Ltd.
    Inventors: Akio Iwaki, Norihito Suzuki, Takeshi Yamamoto, Toru Aoki
  • Patent number: 4492740
    Abstract: Disclosed is a support for lithographic printing plate having an electrodeposited chromium layer on an iron material, characterized in that the surface of said electrodeposited layer has a shape in which crystalline products with angles protrude thereon, the elemental composition in the surface side portion of said electrodeposited layer consists substantially of chromium and oxygen and the ratios of atomic concentrations of chromium and oxygen at said portion are substantially even at the same depth from every point on said surface.
    Type: Grant
    Filed: June 10, 1983
    Date of Patent: January 8, 1985
    Assignee: Konishiroku Photo Industry Co., Ltd.
    Inventors: Takeshi Yamamoto, Norihito Suzuki, Toru Aoki, Akio Iwaki
  • Patent number: 4442196
    Abstract: The main photosensitive ingredient of the photosensitive composition is prepared by subjecting a polymer, which is obtained by homopolymerizing, or copolymerizing with another copolymerizable monomer, a monomer of the general formula ##STR1## in which R represents a hydrogen atom, a halogen atom, or an alkyl group, Y represents a substituted or unsubstituted phenylene group or a substituted or unsubstituted naphthylene group, p is 0 or 1, and when p=1, X represents a divalent organic group, to reaction with p-azidocinnamylidene-.alpha.-cyanoacetic chloride in the presence of an organic or inorganic base.
    Type: Grant
    Filed: November 14, 1980
    Date of Patent: April 10, 1984
    Assignee: Konishiroku Photo Industry Co., Ltd.
    Inventors: Akio Iwaki, Noriyasu Kita, Tatsuya Sasazawa, Hiroyoshi Yamaguchi
  • Patent number: 4425418
    Abstract: New liquid developers for electrophotography comprise (a) a coloring agent, (b) a charge control agent and (c) one or more of a polyethylene, a polypropylene, an ethylene copolymer and a propylene copolymer, with or without (d) a hydrocarbon resin soluble in a hydrocarbon solvent and containing a 1,3-pentadiene moiety, in an electro-insulating liquid. These developers have an excellent etching resistance and a high dispersion stability.
    Type: Grant
    Filed: May 12, 1982
    Date of Patent: January 10, 1984
    Assignee: Konishiroku Photo Industry Co., Ltd.
    Inventors: Akio Iwaki, Toyoki Nishijima, Akio Iijima, Tatsuya Sasazawa
  • Patent number: 4306011
    Abstract: A photosensitive composition useful for making a photosensitive lithographic printing plate are made from a condensation product of sulfonyl chloride of o-benzoquinone diazide or o-naphthoquinone diazide and a polyhydric phenol resin obtained by condensing a polyhydric phenol such as 2-methyl resorcinol with an aldehyde or ketone.
    Type: Grant
    Filed: May 28, 1980
    Date of Patent: December 15, 1981
    Assignee: Konishiroku Photo Industry Co., Ltd.
    Inventors: Masafumi Uehara, Akio Iwaki, Yoko Ogawa, Fumio Shimada, Masatoshi Matsuzaki
  • Patent number: 4306010
    Abstract: A photosensitive composition useful for making a photosensitive lithographic printing plate are made from a condensation product of sulfonylchloride of o-benzoquinone diazide or o-naphthoquinone diazide and a polyhydric phenol resin obtained by condensing a polyhydric phenol such as resorcinol with a benzaldehyde, an acetophenone, or a benzophenone.
    Type: Grant
    Filed: May 28, 1980
    Date of Patent: December 15, 1981
    Assignee: Konishiroku Photo Industry Co., Ltd.
    Inventors: Masafumi Uehara, Akio Iwaki, Yoko Ogawa, Fumio Shimada, Masatoshi Matsuzaki
  • Patent number: 4229514
    Abstract: A composition containing a photosensitive polymer which becomes insoluble by a light exposure and particularly to a highly photosensitive composition which comprises a photosensitive polymer having in the structure as photosensitive groups both an a,B-unsaturated ketone group having a cyano group at the a-position and an azide group.
    Type: Grant
    Filed: December 29, 1978
    Date of Patent: October 21, 1980
    Assignee: Konishiroku Photo Industry Co., Ltd.
    Inventors: Yoshio Kurita, Akio Iwaki