Abstract: A pile press-in machine that receives reaction force from an existing pile to press in a new pile, includes: a reaction force block that grips the existing pile by a clamp to receive the reaction force; a platform that is horizontally movable relative to the reaction force block; and a press-in block that is coupled to the platform, supported to be freely lifted up and down with respect to the platform at a front of the clamp, and grips and presses in the new pile, wherein a plurality of kinds of the reaction force blocks each according to a kind and size of the existing pile are freely attachable to and detachable from one platform.

Abstract: Provided are a pile joint, a pile coupling structure, and a pile coupling method that allow firm uniting of piles to be coupled. A joint (10) for coupling two piles (12) comprises: a tubular body (16) into which each pile (12) provided with a key (14) on a periphery thereof is inserted through an end (16A) of the body (16); and a fitting portion (22) formed on the body (16) so as to be fitted to the key (14) by the insertion and rotation of the pile (12). The fitting portion (22) is formed with: a tapered shape having a surface (22A) that is inclined so as to become distant from the end (16A) of the body (16) as the surface (22A) extends in the direction of rotation of the pile (12); or a wedge shape for fitting between a projection and a pile.

Abstract: A manufacturing method of a concrete pile is shown. The method includes the following, that is, pouring concrete in the pile molding space, reducing the pile molding space to compress and mold the concrete, draining water drained from the concrete by compression and molding outside of the formwork from the drainage hole, and holding the concrete a predetermined amount of time to harden the concrete. The formwork includes an outer formwork that molds an outer wall surface of the concrete pile, an inner formwork that molds an inner wall surface of a hollow space of the concrete pile, and a pair of end formwork that mold upper and lower end surfaces of the concrete pile. The drainage hole is a gap between adjacent components when the mold is tightened, and the gap is configured to be capable of being opened larger during cleaning than when the mold is tightened.

Abstract: Provided are a pile joint, a pile coupling structure, and a pile coupling method that allow firm uniting of piles to be coupled. A joint (10) for coupling two piles (12) comprises: a tubular body (16) into which each pile (12) provided with a key (14) on a periphery thereof is inserted through an end (16A) of the body (16); and a fitting portion (22) formed on the body (16) so as to be fitted to the key (14) by the insertion and rotation of the pile (12). The fitting portion (22) is formed with: a tapered shape having a surface (22A) that is inclined so as to become distant from the end (16A) of the body (16) as the surface (22A) extends in the direction of rotation of the pile (12); or a wedge shape for fitting between a projection and a pile.

Abstract: Provided is a semiconductor module comprising: a semiconductor chip; a cooling portion having a refrigerant passing portion through which a refrigerant passes; and a laminated substrate having: a first metal interconnection layer; a second metal interconnection layer; and an insulation provided between the first metal interconnection layer and the second metal interconnection layer, wherein the cooling portion has: a top plate; a bottom plate; and a plurality of protruding parts which are provided on a surface of the bottom plate, and are separated from each other in a flow direction of the refrigerant, and are respectively provided continuously in a direction orthogonal to the flow direction, wherein the plurality of protruding parts are provided at a position overlapping with one end of the second metal interconnection layer and at a position overlapping with the semiconductor chip in the flow direction.

Abstract: A pile press-in machine that receives reaction force from an existing pile to press in a new pile, includes: a reaction force block that grips the existing pile by a clamp to receive the reaction force; a platform that is horizontally movable relative to the reaction force block; and a press-in block that is coupled to the platform, supported to be freely lifted up and down with respect to the platform at a front of the clamp, and grips and presses in the new pile, wherein a plurality of kinds of the reaction force blocks each according to a kind and size of the existing pile are freely attachable to and detachable from one platform.

Abstract: Provided is a semiconductor module comprising: a semiconductor chip; a cooling portion having a refrigerant passing portion through which a refrigerant passes; and a laminated substrate having: a first metal interconnection layer; a second metal interconnection layer; and an insulation provided between the first metal interconnection layer and the second metal interconnection layer, wherein the cooling portion has: a top plate; a bottom plate; and a plurality of protruding parts which are provided on a surface of the bottom plate, and are separated from each other in a flow direction of the refrigerant, and are respectively provided continuously in a direction orthogonal to the flow direction, wherein the plurality of protruding parts are provided at a position overlapping with one end of the second metal interconnection layer and at a position overlapping with the semiconductor chip in the flow direction.

Abstract: A semiconductor device including a semiconductor element, an upper-surface electrode provided on an upper surface of the semiconductor element, a plated layer provided on an upper surface of the upper-surface electrode, one or more gate runners penetrating the plated layer and provided to extend in a predetermined direction on the upper surface of the semiconductor element, and a metal connecting plate that is arranged above the plated layer and is electrically connected to the upper-surface electrode, wherein the metal connecting plate has a joint portion parallel to the upper surface of the semiconductor element and has a rising portion that is connected to a first end of the joint portion and extends in a direction away from the upper surface of the semiconductor element, and in a plane parallel to the upper surface of the semiconductor element, the rising portion and the gate runner do not overlap with each other.

Abstract: A semiconductor device including a semiconductor element, an upper-surface electrode provided on an upper surface of the semiconductor element, a plated layer provided on an upper surface of the upper-surface electrode, one or more gate runners penetrating the plated layer and provided to extend in a predetermined direction on the upper surface of the semiconductor element, and a metal connecting plate that is arranged above the plated layer and is electrically connected to the upper-surface electrode, wherein the metal connecting plate has a joint portion parallel to the upper surface of the semiconductor element and has a rising portion that is connected to a first end of the joint portion and extends in a direction away from the upper surface of the semiconductor element, and in a plane parallel to the upper surface of the semiconductor element, the rising portion and the gate runner do not overlap with each other.

Abstract: An integrated circuit in which a voltage divider circuit is integrated comprises a first resistor, second resistor, control portion, switch, and switching portion. The first resistor and second resistor form a resistive voltage divider element for dividing a voltage obtained by rectifying an alternating-current voltage, or a direct-current voltage, supplied to a control portion. The switch is provided in series with the resistive voltage divider element, and passes or cuts off current passing through the resistive voltage divider element. The switching portion switches the switch so as to pass current during driving of the control portion, and cut off current during standby of the control portion.

Abstract: A vertical super junction MOSFET and a lateral MOSFET are integrated on the same semiconductor substrate. The lateral MOSFET is electrically isolated from the vertical super junction MOSFET by an n-buried isolating layer and an n-diffused isolating layer. The lateral MOSFET is formed of a p-well region formed in an n?semiconductor layer bounded by the n-buried isolating layer and n-diffused isolating layer, an n-source region and n-drain region formed in the p-well region, and a gate electrode that covers a portion of the p-well region sandwiched by the n-source region and n-drain region. As the n-buried isolating layer is formed at the same time as an n-layer (3) of the vertical super junction MOSFET, it is possible to reduce cost. Also, it is possible to suppress parasitic action between the elements with the n-buried isolating layer.

Abstract: An integrated circuit in which a voltage divider circuit is integrated comprises a first resistor, second resistor, control portion, switch, and switching portion. The first resistor and second resistor form a resistive voltage divider element for dividing a voltage obtained by rectifying an alternating-current voltage, or a direct-current voltage, supplied to a control portion. The switch is provided in series with the resistive voltage divider element, and passes or cuts off current passing through the resistive voltage divider element. The switching portion switches the switch so as to pass current during driving of the control portion, and cut off current during standby of the control portion.

Abstract: A vertical super junction MOSFET and a lateral MOSFET are integrated on the same semiconductor substrate. The lateral MOSFET is electrically isolated from the vertical super junction MOSFET by an n-buried isolating layer and an n-diffused isolating layer. The lateral MOSFET is formed of a p-well region formed in an n? semiconductor layer bounded by the n-buried isolating layer and n-diffused isolating layer, an n-source region and n-drain region formed in the p-well region, and a gate electrode that covers a portion of the p-well region sandwiched by the n-source region and n-drain region. As the n-buried isolating layer is formed at the same time as an n-layer (3) of the vertical super junction MOSFET, it is possible to reduce cost. Also, it is possible to suppress parasitic action between the elements with the n-buried isolating layer.

Abstract: A vertical super junction MOSFET and a lateral MOSFET are integrated on the same semiconductor substrate. The lateral MOSFET is electrically isolated from the vertical super junction MOSFET by an n-buried isolating layer and an n-diffused isolating layer. The lateral MOSFET is formed of a p-well region formed in an n? semiconductor layer bounded by the n-buried isolating layer and n-diffused isolating layer, an n-source region and n-drain region formed in the p-well region, and a gate electrode that covers a portion of the p-well region sandwiched by the n-source region and n-drain region. As the n-buried isolating layer is formed at the same time as an n-layer (3) of the vertical super junction MOSFET, it is possible to reduce cost. Also, it is possible to suppress parasitic action between the elements with the n-buried isolating layer.

Abstract: A vertical super junction MOSFET and a lateral MOSFET are integrated on the same semiconductor substrate. The lateral MOSFET is electrically isolated from the vertical super junction MOSFET by an n-buried isolating layer and an n-diffused isolating layer. The lateral MOSFET is formed of a p-well region formed in an n? semiconductor layer bounded by the n-buried isolating layer and n-diffused isolating layer, an n-source region and n-drain region formed in the p-well region, and a gate electrode that covers a portion of the p-well region sandwiched by the n-source region and n-drain region. As the n-buried isolating layer is formed at the same time as an n-layer (3) of the vertical super junction MOSFET, it is possible to reduce cost. Also, it is possible to suppress parasitic action between the elements with the n-buried isolating layer.

Abstract: A vertical super junction MOSFET and a lateral MOSFET are integrated on the same semiconductor substrate. The lateral MOSFET is electrically isolated from the vertical super junction MOSFET by an n-buried isolating layer and an n-diffused isolating layer. The lateral MOSFET is formed of a p-well region formed in an n?semiconductor layer bounded by the n-buried isolating layer and n-diffused isolating layer, an n-source region and n-drain region formed in the p-well region, and a gate electrode that covers a portion of the p-well region sandwiched by the n-source region and n-drain region. As the n-buried isolating layer is formed at the same time as an n-layer (3) of the vertical super junction MOSFET, it is possible to reduce cost. Also, it is possible to suppress parasitic action between the elements with the n-buried isolating layer.

Abstract: An integrated circuit (100) in which a voltage divider circuit is integrated comprises a first resistor (121), second resistor (122), control portion (130), switch (140), and switching portion (150). The first resistor (121) and second resistor (122) form a resistive voltage divider element for dividing a voltage obtained by rectifying an alternating-current voltage, or a direct-current voltage, supplied to a control portion (130). The switch (140) is provided in series with the resistive voltage divider element, and passes or cuts off current passing through the resistive voltage divider element. The switching portion (150) switches the switch (140) so as to pass current during driving of the control portion (130), and cut off current during standby of the control portion (130).

Abstract: An integrated circuit in which a voltage divider circuit is integrated comprises a first resistor, second resistor, control portion, switch, and switching portion. The first resistor and second resistor form a resistive voltage divider element for dividing a voltage obtained by rectifying an alternating-current voltage, or a direct-current voltage, supplied to a control portion. The switch is provided in series with the resistive voltage divider element, and passes or cuts off current passing through the resistive voltage divider element. The switching portion switches the switch so as to pass current during driving of the control portion, and cut off current during standby of the control portion.

Abstract: A semiconductor device can output a reference voltage for an arbitrary potential and can detect the voltage of each cell in a battery including multiple cells very precisely. The device includes a depletion-type MOSFET 21 and an enhancement type MOSFET 22, and has a floating structure that isolates depletion-type MOSFET 21 and enhancement type MOSFET 22 from a ground terminal. The depletion-type MOSFET 21 and enhancement type MOSFET 22 are connected in series to each other, wherein the depletion-type MOSFET 21 is connected to high-potential-side terminal and the enhancement type MOSFET 22 is connected to low-potential-side terminal. The semiconductor device having the configuration described above is disposed in a voltage detecting circuit section in a control IC for a battery including multiple cells.

Abstract: A semiconductor device can output a reference voltage for an arbitrary potential and can detect the voltage of each cell in a battery including multiple cells very precisely. The device includes a depletion-type MOSFET 21 and an enhancement type MOSFET 22, and has a floating structure that isolates depletion-type MOSFET 21 and enhancement type MOSFET 22 from a ground terminal. The depletion-type MOSFET 21 and enhancement type MOSFET 22 are connected in series to each other, wherein the depletion-type MOSFET 21 is connected to high-potential-side terminal and the enhancement type MOSFET 22 is connected to low-potential-side terminal. The semiconductor device having the configuration described above is disposed in a voltage detecting circuit section in a control IC for a battery including multiple cells.