Patents by Inventor Akio Naka

Akio Naka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8119739
    Abstract: The invention provides a retardation film, composed primarily of an acrylic polymer, with transparency, heat resistance, and large retardation. The retardation film of the present invention is composed primarily of an acrylic polymer. The film has an in-plane retardation of from 130 nm to 500 nm, inclusive, per 100 ?m thickness at a wavelength of 589 nm. The film has a total light transmittance of not less than 85%. The retardation film has a glass transition temperature of preferably from 110° C. to 200° C., inclusive. The acrylic polymer, which is the primary component, preferably has a lactone ring structure.
    Type: Grant
    Filed: February 27, 2007
    Date of Patent: February 21, 2012
    Assignee: Nippon Shokubai Co., Ltd.
    Inventors: Hideo Asano, Akio Naka, Hirokazu Niwa, Tomoyuki Kuwamoto, Hiroyasu Watabe, Yoshiyuki Shiotani
  • Patent number: 7972680
    Abstract: To realize a resin composition which enables formation of a film having excellent film formability and bending resistance and having a small retardation. A resin composition of the present invention comprises: an acrylic resin as a main component; and organic fine particles whose average particle diameter ranges from 0.01 ?m to 1 ?m, wherein a glass transition temperature of the acrylic resin ranges from 110° C. to 200° C., and each of the organic fine particles has a structural unit of a vinyl cyanide monomer and a structural unit of an aromatic vinyl monomer.
    Type: Grant
    Filed: February 21, 2007
    Date of Patent: July 5, 2011
    Assignee: Nippon Shokubai Co., Ltd.
    Inventors: Kenichi Ueda, Shigeo Otome, Akio Naka
  • Publication number: 20100182689
    Abstract: Provided is a resin composition containing a thermoplastic acrylic resin and an ultraviolet absorber (UVA). While this resin composition has excellent heat resistance because of its high glass transition temperature, foaming and bleed-out can be suppressed and the problems arising from the evaporation of the UVA can be reduced even during the molding of the resin composition at a high temperature. The resin composition is a thermoplastic resin composition containing a thermoplastic acrylic resin and an ultraviolet absorber having a molecular weight of 700 or more, and having a glass transition temperature of 110° C. or higher. It is preferable that the ultraviolet absorber has a hydroxyphenyltriazine skeleton. It is preferable that the acrylic resin has a ring structure in its main chain. The ring structure is, for example, at least one selected from a lactone ring structure, a glutaric anhydride structure, a glutarimide structure, an N-substituted maleimide structure, and a maleic anhydride structure.
    Type: Application
    Filed: June 13, 2008
    Publication date: July 22, 2010
    Applicant: NIPPON SHOKUBAI CO., LTD.
    Inventors: Hidetaka Nakanishi, Akio Naka
  • Publication number: 20100168340
    Abstract: To realize a resin composition which enables formation of a film having excellent film formability and bending resistance and having a small retardation. A resin composition of the present invention comprises: an acrylic resin as a main component; and organic fine particles whose average particle diameter ranges from 0.01 ?m to 1 ?m, wherein a glass transition temperature of the acrylic resin ranges from 110° C. to 200° C., and each of the organic fine particles has a structural unit of a vinyl cyanide monomer and a structural unit of an aromatic vinyl monomer.
    Type: Application
    Filed: February 21, 2007
    Publication date: July 1, 2010
    Applicant: NIPPON SHOKUBAI CO., LTD
    Inventors: Kenichi Ueda, Shigeo Otome, Akio Naka
  • Patent number: 7700674
    Abstract: Disclosed is a vinylpyrrolidone-based polymer composition which has improved storage stability and of which the reduction in the molecular weight (K value) under shear stress is small. The composition comprises a vinylpyrrolidone-based polymer and contains from 1 to 10000 ppm of at least one compound selected from a group consisting of biguanides and further contains from 1000 to 30000 ppm of 2-pyrrolidone and from 1 to 5000 ppm of ammonia.
    Type: Grant
    Filed: July 31, 2007
    Date of Patent: April 20, 2010
    Assignees: Nippon Shokubai Co., Ltd., Dai-Chj Kogyo Seiyaki Co., Ltd.
    Inventors: Keiichi Fujise, Itsuko Hamaguchi, Akio Naka, Daijyo Tomihisa
  • Publication number: 20090135483
    Abstract: The invention provides a retardation film, composed primarily of an acrylic polymer, with transparency, heat resistance, and large retardation. The retardation film of the present invention is composed primarily of an acrylic polymer. The film has an in-plane retardation of from 130 nm to 500 nm, inclusive, per 100 ?m thickness at a wavelength of 589 nm. The film has a total light transmittance of not less than 85%. The retardation film has a glass transition temperature of preferably from 110° C. to 200° C., inclusive. The acrylic polymer, which is the primary component, preferably has a lactone ring structure.
    Type: Application
    Filed: February 27, 2007
    Publication date: May 28, 2009
    Applicant: Nippon Shokubai Co., Ltd.
    Inventors: Hideo Asano, Akio Naka, Hirokazu Niwa, Tomoyuki Kuwamoto, Hiroyasu Watabe, Yoshiyuki Shiotani
  • Publication number: 20080033081
    Abstract: Disclosed is a vinylpyrrolidone-based polymer composition which has improved storage stability and of which the reduction in the molecular weight (K value) under shear stress is small. The composition comprises a vinylpyrrolidone-based polymer and contains from 1 to 10000 ppm of at least one compound selected from a group consisting of biguanides and further contains from 1000 to 30000 ppm of 2-pyrrolidone and from 1 to 5000 ppm of ammonia.
    Type: Application
    Filed: July 31, 2007
    Publication date: February 7, 2008
    Inventors: Keiichi Fujise, Itsuko Hamaguchi, Akio Naka, Daijyo Tomihisa
  • Publication number: 20060216263
    Abstract: A polyvinylpyrrolidone composition in a form of a solid preparation or an aqueous solution, the composition including polyvinylpyrrolidone, ammonia, and a secondary amine, and processes for producing the polyvinylpyrrolidone composition, the first process including heat drying a polyvinylpyrrolidone aqueous solution containing ammonia and a secondary amine to obtain the polyvinylpyrrolidone in a form of a solid preparation, the second process including adding a secondary amine to an aqueous solution containing polyvinylpyrrolidone and ammonia to obtain the polyvinylpyrrolidone composition in a form of an aqueous solution, and the third process including polymerizing N-vinyl-2-pyrrolidone using hydrogen peroxide as a polymerization initiator in a presence of a metal catalyst using ammonia as a promoter in an aqueous medium to obtain the polyvinylpyrrolidone composition in a form of an aqueous solution.
    Type: Application
    Filed: March 17, 2006
    Publication date: September 28, 2006
    Inventors: Takashi Miyai, Mitsuru Nakajima, Akio Naka
  • Publication number: 20040266929
    Abstract: A solid adhesive comprising a water-soluble adhesive polymer and a polymer component derived from an aqueous polymer emulsion as the components, wherein a solid content of the aqueous polymer emulsion are contained in an amount of 0.01 to 30 mass % with respect to the total amount of the water-soluble adhesive polymer and the solid content of aqueous polymer emulsion.
    Type: Application
    Filed: May 26, 2004
    Publication date: December 30, 2004
    Inventors: Daisuke Imai, Akio Naka, Kazuhiro Okamura
  • Patent number: 6498231
    Abstract: The present invention provides: a vinylpyrrolidone polymer which exhibits good heat resistance and storage stability; a composition containing the vinylpyrrolidone polymer; a stabilization process for the vinylpyrrolidone polymer, and a preservation process for a vinylpyrrolidone polymer by which: even when the vinylpyrrolidone polymer is preserved for a long time or at high temperature, the physical properties such as molecular weight (K value) of the vinylpyrrolidone polymer can be prevented from changing, therefore the vinylpyrrolidone polymer can stably be preserved. To enhance the heat resistance and the storage stability, a vinylpyrrolidone polymer is mixed with a certain amount of antioxidant, and the oxygen concentration is suppressed to not higher than 50,000 ppm in a gas phase that contacts with the vinylpyrrolidone polymer when preserving.
    Type: Grant
    Filed: December 3, 2001
    Date of Patent: December 24, 2002
    Assignee: Nippon Shokubai Co., Ltd.
    Inventors: Daijo Tomihisa, Toshiaki Kuriyama, Tomiyasu Ueta, Akio Naka, Hideyuki Nishibayashi, Yoshitomo Nakata
  • Publication number: 20020156218
    Abstract: The present invention is to provide a curable resin composition comprising a new crosslinking system by which both hydrophilicity and water resistance properties are realized, and a product treated by said curable resin composition.
    Type: Application
    Filed: January 17, 2002
    Publication date: October 24, 2002
    Applicant: NIPPON SHOKUBAI CO., LTD.
    Inventors: Yoshitomo Nakata, Akio Naka, Miwako Yonezawa
  • Patent number: 6391994
    Abstract: The present invention provides a production process for a vinylpyrrolidone polymer which process prevents the polymerization reaction of N-vinylpyrrolidone from being hindered by by-products (as formed by nucleomethylation of N-vinylpyrrolidone) or &ggr;-butyrolactone, and therefore enables to obtain a vinylpyrrolidone polymer that has a desired molecular weight and involves only a small amount of residual monomers, wherein the vinylpyrrolidone polymer can display excellent properties even if the vinylpyrrolidone polymer is, for example, crosslinked to convert it into a water-absorbent resin. The production process for a vinylpyrrolidone polymer comprises the step of polymerizing a polymerizable monomer component or components which include N-vinylpyrrolidone, wherein: the N-vinylpyrrolidone as used is N-vinylpyrrolidone having a &ggr;-butyrolactone content of not more than 500 ppm; and/or the N-vinylpyrrolidone as used is N-vinylpyrrolidone obtained without using acetylene as a raw material.
    Type: Grant
    Filed: January 31, 2001
    Date of Patent: May 21, 2002
    Assignee: Nippon Shokubai Co., Ltd.
    Inventors: Daijo Tomihisa, Nobuyuki Harada, Akio Naka, Toshiaki Kuriyama, Yuuji Shimasaki, Hideyuki Nishibayashi
  • Publication number: 20020058782
    Abstract: The present invention provides: a vinylpyrrolidone polymer which exhibits good heat resistance and storage stability; a composition containing the vinylpyrrolidone polymer; a stabilization process for the vinylpyrrolidone polymer, and a preservation process for a vinylpyrrolidone polymer by which: even when the vinylpyrrolidone polymer is preserved for a long time or at high temperature, the physical properties such as molecular weight (K value) of the vinylpyrrolidone polymer can be prevented from changing, therefore the vinylpyrrolidone polymer can stably be preserved. To enhance the heat resistance and the storage stability, a vinylpyrrolidone polymer is mixed with a certain amount of antioxidant, and the oxygen concentration is suppressed to not higher than 50,000 ppm in a gas phase that contacts with the vinylpyrrolidone polymer when preserving.
    Type: Application
    Filed: December 3, 2001
    Publication date: May 16, 2002
    Inventors: Daijo Tomihisa, Toshiaki Kuriyama, Tomiyasu Ueta, Akio Naka, Hideyuki Nishibayashi, Yoshitomo Nakata
  • Patent number: 6346600
    Abstract: The present invention provides: a vinylpyrrolidone polymer which exhibits good heat resistance and storage stability; a composition containing the vinylpyrrolidone polymer; a stabilization process for the vinylpyrrolidone polymer, and a preservation process for a vinylpyrrolidone polymer by which: even when the vinylpyrrolidone polymer is preserved for a long time or at high temperature, the physical properties such as molecular weight (K value) of the vinylpyrrolidone polymer can be prevented from changing, therefore the vinylpyrrolidone polymer can stably be preserved. To enhance the heat resistance and the storage stability, a vinylpyrrolidone polymer is mixed with a certain amount of antioxidant, and the oxygen concentration is suppressed to not higher than 50,000 ppm in a gas phase that contacts with the vinylpyrrolidone polymer when preserving.
    Type: Grant
    Filed: April 6, 2000
    Date of Patent: February 12, 2002
    Assignee: Nippon Shokubai Co., Ltd.
    Inventors: Daijo Tomihisa, Toshiaki Kuriyama, Tomiyasu Ueta, Akio Naka, Hideyuki Nishibayashi, Yoshitomo Nakata
  • Publication number: 20010020078
    Abstract: The present invention provides a production process for a vinylpyrrolidone polymer which process prevents the polymerization reaction of N-vinylpyrrolidone from being hindered by by-products (as formed by nucleomethylation of N-vinylpyrrolidone) or &ggr;-butyrolactone, and therefore enables to obtain a vinylpyrrolidone polymer that has a desired molecular weight and involves only a small amount of residual monomers, wherein the vinylpyrrolidone polymer can display excellent properties even if the vinylpyrrolidone polymer is, for example, crosslinked to convert it into a water-absorbent resin. The production process for a vinylpyrrolidone polymer comprises the step of polymerizing a polymerizable monomer component or components which include N-vinylpyrrolidone, wherein: the N-vinylpyrrolidone as used is N-vinylpyrrolidone having a &ggr;-butyrolactone content of not more than 500 ppm; and/or the N-vinylpyrrolidone as used is N-vinylpyrrolidone obtained without using acetylene as a raw material.
    Type: Application
    Filed: January 31, 2001
    Publication date: September 6, 2001
    Inventors: Daijo Tomihisa, Nobuyuki Harada, Akio Naka, Toshiaki Kuriyama, Yuuji Shimasaki, Hideyuki Nishibayashi
  • Patent number: 6235859
    Abstract: Provided are an industrially advantageous process for producing a polymer of polyvinyl ether at a temperature of not lower than a room temperature for short time, and a catalyst used for the process. The above process is characterized by using an acid clay mineral subjected to acid treatment as a catalyst to polymerize vinyl ether.
    Type: Grant
    Filed: June 1, 1999
    Date of Patent: May 22, 2001
    Assignee: Nippon Shokubah Co Ltd
    Inventors: Akio Naka, Yuuji Shimasaki
  • Patent number: 6159546
    Abstract: A process for producing a coated film continuously, comprises the steps of:running a substrate film; andextruding a coating composition having a viscosity of 0.1 to 100 cps at 20.degree. C. through a slit of a die onto a surface of the substrate film to produce a coating layer having a thickness of 0.1 to 20 .mu.m over the substrate film. According to the present invention, it is possible to produce a coated film continuously at high speed, using a coating material having a viscosity as low as water or a coating material with a problem of deterioration due to the exposure to the air, thereby producing a coating layer over the substrate film to a uniform thickness.
    Type: Grant
    Filed: February 27, 1997
    Date of Patent: December 12, 2000
    Assignee: Nippon Shokubai Co., Ltd.
    Inventors: Tetsuya Yamamoto, Akio Naka, Yukiko Nishio
  • Patent number: 6040101
    Abstract: A carrier particle which includes a core and a coating layer formed on the surface of the core. The coating layer is made of a coating material including: an organic compound (A) having a functional group other than an Si(OR.sup.1) group, where R.sup.1 is a hydrogen atom, a lower alkyl group or an acyl group; a compound (B) and/or a hydrolytic condensation product thereof, having a functional group having reactivity with the functional group of the organic compound (A), and an Si(OR.sup.1) group; an organometallic compound (C) and/or a hydrolytic condensation product thereof; and a solvent (D). The carrier particles of the present invention, enable toner particles to be sufficiently charged even at high temperature and high humidity, so that an image with no fog can be formed. In addition, the carrier particle has high durability. There is no unnecessary attachment of the toner particles onto the carrier particles, so that the problems of carrier particle contamination and spent toner never arise.
    Type: Grant
    Filed: June 9, 1997
    Date of Patent: March 21, 2000
    Assignee: Nippon Shokubai Co., Ltd.
    Inventors: Akio Naka, Tetsuya Yamamoto, Yoshikuni Mori
  • Patent number: 6010757
    Abstract: The present invention provides a surface coating composition including: an organometallic comound (I) and/or a hydrolytic condensation product thereof: an organic compound (II) having a primary and/or secondary amino group in its molecule; and a compound (III) having a functional group reactable with the amino group in its molecule. The surface coating composition is capable of forming a coating layer which exhibits excellent gas barrier properties, transparency, and flexibility. A resin molding formed with the coating layer is preferably used as a wrapping material and a substrate for liquid crystal display device.
    Type: Grant
    Filed: September 29, 1997
    Date of Patent: January 4, 2000
    Assignee: Nippon Shokubai Co., Ltd.
    Inventors: Tetsuya Yamamoto, Akio Naka, Yukiko Nishio
  • Patent number: 5728770
    Abstract: A surface treatment composition which can form a coating having excellent gas barrier properties, transparency and flexibility, contains at least one silane compound component selected from the group consisting of a silane compound (A) having amino groups and hydrolytic condensation groups in their molecules, a hydrolytic condensation product (B) of the silane compound (A), and a co-hydrolytic condensation product (D) of the silane compound (A) and an organometallic compound (C); a compound (E) having at least two functional groups which can react with an amino group in its molecule; and solvent (F).
    Type: Grant
    Filed: January 28, 1997
    Date of Patent: March 17, 1998
    Assignee: Nippon Shokubai Co., Ltd.
    Inventors: Tetsuya Yamamoto, Akio Naka, Yukiko Hori, Daijo Tomihisa, Tadahiro Yoneda