Patents by Inventor Akio Shimano

Akio Shimano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4883985
    Abstract: An FET circuit suitable for a latch has a pair of inverters. The input stage FET of each of the inverters is connected such that the gate electrode thereof is connected to receive an output signal of the FET of the other inverter through a circuit having an FET and at least a diode. The sources of the input stage FETs are connected to a common connection point, and a current source arrangement such as a resistor is connected between the common connection point and a power supply terminal. The circuit provides an extended allowable range of the effective threshold voltage V.sub.T and has small power consumption.
    Type: Grant
    Filed: October 28, 1987
    Date of Patent: November 28, 1989
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Shin Katsu, Shutaro Nambu, Akio Shimano
  • Patent number: 4712023
    Abstract: A buffered FET logic gate circuit has a bias diode (9), which is connected across the gate and the source of a current source FET (4) of a buffer part (3, 4), and a capacitor (8), which is connected across the gate of said FET (4) and an input terminal (V.sub.I); and thereby a high load drivability with a low power consumption rate is realized.
    Type: Grant
    Filed: November 13, 1986
    Date of Patent: December 8, 1987
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Tatsuo Otsuki, Akio Shimano, Hiromitsu Aoki, Ikuko Aoki
  • Patent number: 4247373
    Abstract: An epitaxial layer having a specified conductivity type formed on a semiinsulative or high resistivity semiconductor substrate or insulative substrate is anodized (anodically oxidized) by a predetermined D.C. current under an illumination of light of a predetermined intensity, thereby a depletion layer is formed beneath an oxide layer, which is formed by the anodizing, and the anodizing ceases in areas where the bottom face of the depletion layer reaches the semiinsulative or high resistivity semiconductor substrate or insulative substrate thus retaining a layer of highly uniform thickness layer of the epitaxial grown layer on the substrate.
    Type: Grant
    Filed: June 12, 1979
    Date of Patent: January 27, 1981
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Akio Shimano, Hiromitsu Takagi