Abstract: A method for manufacturing a pattern of a light shielding layer and a patter forming body of light shielding layer. After placing a photocatalyst containing layer side substrate having a base material and a photocatalyst containing layer, and a pattern forming body substrate having a substrate and a property changing layer, the property of an exposed part changes by the action of a photocatalyst in a photocatalyst containing layer, to form a wettability pattern having a lyophilic region and a liquid repellent region on the property changing layer. A light shielding layer composition is coated on the whole surface of the pattern forming body substrate on which the above-mentioned wettability pattern is formed, adhering and solidifying a light shielding layer composition only to the lyophilic region, to form a light shielding layer pattern.

Abstract: The main object of the present invention is to provide a method for manufacturing a color filter, capable of having the surface of the pixel part flatly even in the case a pixel part is formed by an ink discharging method, and the thickness of each pixel part evenly. In order to achieve the above-mentioned object, the present invention provides a method for manufacturing a color filter comprising at least a pixel part forming process of forming a pixel part of a plurality of colors in a predetermined pattern by adhering an ink on a transparent substrate by a discharging method, and the convex pixel part is formed in the pixel part forming process, wherein a pixel part flattening process of flattening the convex pixel part is executed after the pixel part forming process.

Abstract: The main object of the present invention is to provide a method for manufacturing a color filter, capable of having the surface of the pixel part flatly even in the case a pixel part is formed by an ink discharging method, and the thickness of each pixel part evenly. In order to achieve the above-mentioned object, the present invention provides a method for manufacturing a color filter comprising at least a pixel part forming process of forming a pixel part of a plurality of colors in a predetermined pattern by adhering an ink on a transparent substrate by a discharging method, and the convex pixel part is formed in the pixel part forming process, wherein a pixel part flattening process of flattening the convex pixel part is executed after the pixel part forming process.

Abstract: A pixel electrode substrate includes a glass substrate, parallel signal lines formed on the glass substrate, parallel gate lines formed perpendicularly to the signal lines on the glass substrate, and a plurality of TFTs disposed near the intersections of the signal lines and gate lines. A color filter layer and pixel electrodes are formed in that order over pixel regions defined by the signal lines and the gate lines on the glass substrate. The pixel electrodes and the color filter layer form color stripes. Each of the signal lines has offset sections formed near the intersections of the signal line and the gate lines with their center axes dislocated laterally from a center axis of the signal line such that the switching devices are disposed in dark regions outside color regions corresponding to the color layer. The pixel electrodes have projections projecting from the color regions into the dark regions, respectively, and the projections are connected to the switching devices in the dark regions.

Abstract: The main object of the present invention is to provide a method for manufacturing a color filter, capable of having the surface of the pixel part flatly even in the case a pixel part is formed by an ink discharging method, and the thickness of each pixel part evenly. In order to achieve the above-mentioned object, the present invention provides a method for manufacturing a color filter comprising at least a pixel part forming process of forming a pixel part of a plurality of colors in a predetermined pattern by adhering an ink on a transparent substrate by a discharging method, and the convex pixel part is formed in the pixel part forming process, wherein a pixel part flattening process of flattening the convex pixel part is executed after the pixel part forming process.

Abstract: A method for manufacturing a pattern of a light shielding layer and a pattern forming body of light shielding layer by the same, used in various color filters, capable of manufacturing a high sensitive and high precise light shielding layer pattern, and capable of manufacturing a light shielding layer pattern in a short period of time are provided.

Abstract: A pixel electrode substrate includes a glass substrate, parallel signal lines formed on the glass substrate, parallel gate lines formed perpendicularly to the signal lines on the glass substrate, and a plurality of TFTs disposed near the intersections of the signal lines and gate lines. A color filter layer and pixel electrodes are formed in that order over pixel regions defined by the signal lines and the gate lines on the glass substrate. The pixel electrodes and the color filter layer form color stripes. Each of the signal lines has offset sections formed near the intersections of the signal line and the gate lines with their center axes dislocated laterally from a center axis of the signal line such that the switching devices are disposed in dark regions outside color regions corresponding to the color layer. The pixel electrodes have projections projecting from the color regions into the dark regions, respectively, and the projections are connected to the switching devices in the dark regions.