Patents by Inventor Akira Chida

Akira Chida has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10787587
    Abstract: Provided is an aqueous dispersion capable of providing a coating film excellent in solvent resistance, stain resistance, and adhesion to a base material. The invention relates to an aqueous dispersion including a particulate polymer composite; a polyisocyanate compound; and water. The particulate polymer composite includes a fluoropolymer (A) and an acrylic polymer (B). Either or both of the fluoropolymer (A) and the acrylic polymer (B) contain a hydroxyl group and a hydrolyzable silyl group.
    Type: Grant
    Filed: April 21, 2016
    Date of Patent: September 29, 2020
    Assignee: DAIKIN INDUSTRIES, LTD.
    Inventors: Takuji Ishikawa, Akira Chida, Katsuhiko Imoto
  • Patent number: 10692257
    Abstract: Provided is a process management apparatus, a process management method, and a storage medium that can display retention of articles based on a value of the articles handled in the process in addition to a time period of the process. A process management apparatus according to one example embodiment of the present invention includes: an acquisition unit that acquires information indicating a time period in which a process to handle articles is performed and a value of the articles; a generation unit that generates information used for displaying bands indicating at least two process regions surrounded by two first sides opposed to each other and two second sides connecting endpoints of the two first sides and a retention region connecting the first sides of the two process regions to each other that are temporally adjacent; and a display control unit that performs control to display the bands based on the information used for displaying the bands.
    Type: Grant
    Filed: October 26, 2017
    Date of Patent: June 23, 2020
    Assignee: NEC CORPORATION
    Inventors: Shuji Hishiyama, Miho Yamada, Daizaburou Shiramizu, Akira Chida, Kazuto Ohishi
  • Publication number: 20200051294
    Abstract: Provided is a process management apparatus, a process management method, and a storage medium that can display retention of articles based on a value of the articles handled in the process in addition to a time period of the process. A process management apparatus according to one example embodiment of the present invention includes: an acquisition unit that acquires information indicating a time period in which a process to handle articles is performed and a value of the articles; a generation unit that generates information used for displaying bands indicating at least two process regions surrounded by two first sides opposed to each other and two second sides connecting endpoints of the two first sides and a retention region connecting the first sides of the two process regions to each other that are temporally adjacent; and a display control unit that performs control to display the bands based on the information used for displaying the bands.
    Type: Application
    Filed: October 26, 2017
    Publication date: February 13, 2020
    Applicant: NEC Corporation
    Inventors: Shuji HISHIYAMA, Miho YAMADA, Daizaburou SHIRAMIZU, Akira CHIDA, Kazuto OHISHI
  • Publication number: 20180118969
    Abstract: Provided is an aqueous dispersion capable of providing a coating film excellent in solvent resistance, stain resistance, and adhesion to a base material. The invention relates to an aqueous dispersion including a particulate polymer composite; a polyisocyanate compound; and water. The particulate polymer composite includes a fluoropolymer (A) and an acrylic polymer (B). Either or both of the fluoropolymer (A) and the acrylic polymer (B) contain a hydroxyl group and a hydrolyzable silyl group.
    Type: Application
    Filed: April 21, 2016
    Publication date: May 3, 2018
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Takuji ISHIKAWA, Akira CHIDA, Katsuhiko IMOTO
  • Patent number: 8710142
    Abstract: The present invention provides a low-staining room temperature curable coating composition having an excellent low-staining property and recoatability, and comprising (A) a hydroxyl-containing resin, (B) an isocyanate based curing agent, (C) an organosilicate based hydrophilizing agent, (D) a recoatability modifier and (E) an organic solvent, in which the recoatability modifier (D) comprises at least (D1) an amide-containing polymer and (D2) a silane coupling agent.
    Type: Grant
    Filed: March 18, 2010
    Date of Patent: April 29, 2014
    Assignee: Daikin Industries, Ltd.
    Inventors: Akira Chida, Shinya Murakami, Susumu Wada
  • Publication number: 20130319521
    Abstract: A solar cell system includes a solar cell and a reflecting layer. The solar cell has a sunlight-incidence side. The reflecting layer is disposed on an opposite side of the solar cell from the sunlight-incidence side of the solar cell. The reflecting layer includes a fluororesin and a light-reflective pigment.
    Type: Application
    Filed: November 25, 2011
    Publication date: December 5, 2013
    Applicant: Daikin Industries, Ltd.
    Inventors: Akira Chida, Ansgar Thiemann
  • Publication number: 20120029140
    Abstract: The present invention provides a low-staining room temperature curable coating composition having an excellent low-staining property and recoatability, and comprising (A) a hydroxyl-containing resin, (B) an isocyanate based curing agent, (C) an organosilicate based hydrophilizing agent, (D) a recoatability modifier and (E) an organic solvent, in which the recoatability modifier (D) comprises at least (D1) an amide-containing polymer and (D2) a silane coupling agent.
    Type: Application
    Filed: March 18, 2010
    Publication date: February 2, 2012
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Akira Chida, Shinya Murakami, Susumu Wada
  • Patent number: 6548614
    Abstract: A stain-proofing agent comprising a compound represented by the formula (1): and non-aqueous composition for paints comprising the stain-proofing agent, resin, curing agent and/or curing catalyst and being capable of forming a coating film remarkably excellent in stain-proofing property.
    Type: Grant
    Filed: April 3, 2001
    Date of Patent: April 15, 2003
    Assignee: Daikin Industries, Ltd.
    Inventors: Haruhiko Mohri, Susumu Wada, Akira Chida, Masaru Nagato, Keiko Kunimasa, Yoshiki Shimizu
  • Publication number: 20010031850
    Abstract: A stain-proofing agent comprising a compound represented by the formula (1): 1
    Type: Application
    Filed: April 3, 2001
    Publication date: October 18, 2001
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Haruhiko Mohri, Susumu Wada, Akira Chida, Masaru Nagato, Keiko Kunimasa, Yoshiki Shimizu
  • Patent number: 6075110
    Abstract: A stain-proofing agent comprising a compound represented by the formula (1): ##STR1## and non-aqueous composition for paints comprising the stain-proofing agent, resin, curing agent and/or curing catalyst and being capable of forming a coating film remarkably excellent in stain-proofing property.
    Type: Grant
    Filed: August 18, 1997
    Date of Patent: June 13, 2000
    Assignee: Daikin Industries, Ltd.
    Inventors: Haruhiko Mohri, Susumu Wada, Akira Chida, Masaru Nagato, Keiko Kunimasa, Yoshiki Shimizu
  • Patent number: 5229461
    Abstract: A vinylidene fluoride copolymer comprising 50 to 90% by mole of units having the formula (I):--CH.sub.2 --CF.sub.2 -- (I)1 to 30% by mole of units having the formula (II): ##STR1## 1 to 30% by mole of units having the formula (III): ##STR2## 1 to 30% by mole of units having the formula (IV): ##STR3## and a composition comprising the copolymer as the main component. Since the copolymer is excellent in solvent solubility, it can be dissolved in a widely used solvent for coatings and it is not required to treat the film at a high temperature after coating. Moreover, the obtained film is excellent in adhesion to a substrate, glossiness, weatherability, stain resistance and corrosion resistance.
    Type: Grant
    Filed: May 21, 1991
    Date of Patent: July 20, 1993
    Assignee: Daikin Industries, Ltd.
    Inventors: Hideya Saitoh, Yoshiki Shimizu, Masayuki Oka, Akira Chida, Atsushi Sakakura
  • Patent number: 5216081
    Abstract: A fluorine-containing copolymer comprising 20 to 60% by mole of the fluoroolefin unit (1), 5 to 45% by mole of the .beta.-methyl substituted .alpha.-olefin unit (2), 1 to 45% by mole of the unit (3) derived from a monomer having a chemically curable functional group, 1 to 45% by mole of the unit (4) derived from a monomer having ester moieties in the side chains and 0 to 45% by mole of the unit (5) derived from a copolymerizable monomer other than the above monomers, if necessary, 0.1 to 15% by mole of the unit (6) derived from a monomer having carboxyl groups. The copolymer can provide a curable composition alone or with an acrylic polymer. The fluorine-containing copolymer is excellent in solvent-solubility, compatibility with curing agents, additives and other polymers, pigment dispersibility, curing reactivity, dispersibility to water, pot life, film forming ability, coating properties, and the like.
    Type: Grant
    Filed: September 30, 1992
    Date of Patent: June 1, 1993
    Assignee: Daikin Industries, Ltd.
    Inventors: Haruhiko Mohri, Yoshiki Shimizu, Hideya Saito, Akira Chida
  • Patent number: 5169915
    Abstract: A fluorine-containing copolymer comprising 20 to 60% by mole of the fluoroolefin unit (1), 5 to 45% by mole of the .beta.-methyl substituted .alpha.-olefin unit (2), 1 to 45% by mole of the unit (3) derived from a monomer having a chemically curable functional group, 1 to 45% by mole of the unit (4) derived from a monomer having ester moieties in the side chains and 0 to 45% by mole of the unit (5) derived from a copolymerizable monomer other than the above monomers, if necessary, 0.1 to 15% by mole of the unit (6) derived from a monomer having carboxyl groups. The copolymer can provide a curable composition alone or with an acrylic polymer. The fluorine-containing copolymer is excellent in solvent-solubility, compatibility with curing agents, additives and other polymers, pigment dispersibility, curing reactivity, dispersibility to water, pot life, film forming ability, coating properties, and the like.
    Type: Grant
    Filed: June 28, 1991
    Date of Patent: December 8, 1992
    Assignee: Daikin Industries, Ltd.
    Inventors: Haruhiko Mohri, Yoshiki Shimizu, Hideya Saito, Akira Chida
  • Patent number: 5130201
    Abstract: A vinylidene fluoride resin composition which comprises (A) 10 to 95 parts by weight of a vinylidene fluoride resin, (B) 1 to 80 parts by weight of a resin having a poor compatibility with said vinylidene fluoride resin (A), and (C) 1 to 30 parts by weight of a resin having an excellent compatibility with both said vinylidene fluoride resin (A) and said resin (B), total amount of said resins (A), (B) and (C) being 100 parts by weight. The film obtained by baking the composition of the present invention has the structure that the surface side is rich in the VdF resin, and the excellent adhesion to the substrate. Consequently, the film has the excellent chemical resistance, adhesion to a substrate, and the like.
    Type: Grant
    Filed: April 23, 1990
    Date of Patent: July 14, 1992
    Assignee: Daikin Industries, Ltd.
    Inventors: Tatsushiro Yoshimura, Nobuyuki Tomihashi, Akira Chida
  • Patent number: 4728707
    Abstract: A water- and oil-repellent of a copolymer which comprises repeating units derived from (a) a monomeric compound having at least a perfluoroalkyl or perfluoroalkenyl group and an acrylate or methacrylate group and (b) a methacrylate, a homopolymer of which has a glass transition temperature of not lower than 115.degree. C., which has good resistance to dry cleaning and resistance to slippage.
    Type: Grant
    Filed: March 12, 1986
    Date of Patent: March 1, 1988
    Assignee: Daikin Industries Ltd.
    Inventors: Yoshio Amimoto, Hirokazu Aoyama, Akira Chida