Abstract: To provide an aircraft of which flight efficiency can be improved. An image capturing method according to this embodiment is a method for capturing an image of an object to be photographed by using a plurality of aircrafts including an image capturing part. The image capturing method includes a ranking step of setting up a predetermined ranking for each of the aircrafts, a control step of performing control on the basis of the ranking, and an image capturing step of moving the aircraft and using the image capturing part to capture an image of the object. According to this configuration, a plurality of aircrafts can be used to capture images of a plurality of objects to be photographed simultaneously from different angles.

Abstract: To provide an aircraft of which flight efficiency can be improved. An image capturing method according to this embodiment is a method for capturing an image of an object to be photographed by using a plurality of aircrafts including an image capturing part. The image capturing method includes a ranking step of setting up a predetermined ranking for each of the aircrafts, a control step of performing control on the basis of the ranking, and an image capturing step of moving the aircraft and using the image capturing part to capture an image of the object. According to this configuration, a plurality of aircrafts can be used to capture images of a plurality of objects to be photographed simultaneously from different angles.

Abstract: A heat sink has a structure which enables the heat sink to be carried by a holding device in an automated production line. The heat sink includes a base portion at a center thereof and a finned portion around the base portion. The heat sink is arranged in contact with, or very close to, an object to be cooled, e.g., an MPU, and receives the heat generated in the object. The heat is then dissipated to ambient air from the fins. At an object-side end of the heat sink is provided a convex portion which has an engagement feature to be caught by the holding device while the heat sink is carried.

Abstract: A cooling device includes a fan, a heat sink, and an attaching portion arranged to attach the fan to the heat sink. The fan includes an impeller rotating about a center axis, a motor arranged to rotate the impeller, and a base portion supporting the motor. The attaching portion includes a frame surrounding a portion of the impeller opposed to the heat sink, a plurality of supports projecting from the frame to a side opposite to the heat sink, and a plurality of supporting ribs connecting the supports and the base portion to each other, arranged about the center axis, and extending from the base portion away from the center axis. Each supporting rib has a first primary surface and a second primary surface arranged opposite to the impeller. The first and second primary surfaces are inclined with respect to a plane substantially perpendicular to the center axis.

Abstract: In a manufacturing method of a fin unit for a heat sink for dissipating a heat from a heat source, the fin unit includes a plurality of fins radially arranged about its center axis, and a fin supporting portion connecting inner ends of the fins and supporting the fins. First, metal is heated. The heated metal is extruded and/or drawn through a die to obtain a metal body. One of the die and the metal body obtained through the die is rotated relative to the other about a center axis of a die hole of the die. The metal body is then cut, thereby obtaining the fin unit.

Abstract: A sealed battery has an outer can having an opening and functioning as an electrode terminal, a sealing member fitted in the opening of the outer can and functioning as an electrode terminal which is different in polarity from the outer can, and a spiral-wound electrode assembly contained in the outer can. The spiral-wound electrode assembly includes a positive electrode, a negative electrode and a separator wound together spirally, in which the electrodes are separated by the separator and the outermost coil of the separator forms the outer circumferential face of the spiral-wound electrode assembly. A substrate included in the positive or negative electrode which is adjacent to the outermost coil of the separator has an exposed portion, which projects in the axial direction of the spiral-wound electrode assembly beyond the outermost coil of the separator and is in direct contact with the inner face of the outer can.

Abstract: The present invention discloses a sintered cadmium negative electrode for use in an alkaline storage battery having a porous sintered nickel substrate and an active material containing cadmium hydroxide, the active material impregnated in the porous sintered nickel substrate, sintered cadmium negative electrode in which a groove 3 having a depth of 0.1 to 20 &mgr;m is provided on a surface of the substrate so that a projected region and a depressed region are formed on the surface of the substrate. An alkaline storage battery employing the sintered cadmium negative electrode of the invention achieves, as well as a high capacity, an improved large current charge-discharge characteristic by increasing an oxygen gas absorbing performance.

Abstract: A sealed battery has an outer can having an opening and functioning also as an electrode terminal, a sealing member fitted in the opening of the outer can and functioning also as an electrode terminal which is different in polarity from the outer can, and a spiral-wound electrode assembly contained in the outer can. The spiral-wound electrode assembly includes a positive electrode, a negative electrode and a separator wound together spirally, in which the positive electrode and the negative electrode are separated by the separator and the outermost coil of the separator forms the outer circumferential face of the spiral-wound electrode assembly. A substrate included in the positive or negative electrode which is adjacent to the outermost coil of the separator has an exposed portion. The exposed portion projects in the axial direction of the spiral-wound electrode assembly beyond the outermost coil of the separator and is in direct contact with the inner face of the outer can.

Abstract: Selective pattern exposure with high reliability is made possible by a desired pattern of repeated pattern and a non-repeated pattern. Exposure technology is obtained to enable improvement of preparation efficiency of pattern data and to secure inspection of an aperture pattern. With the invention, an electron beam is used as focused beam, and a pattern exposure apparatus of a batch transfer system for transferring repeated pattern and non-repeated pattern of plural graphics of a semiconductor integrated circuit or the like comprises an EB drawing section for controlling the beam and irradiating beam onto a sample, a control I/O section, a drawing control section and a data storage section. In the EB drawing section, a semiconductor wafer is mounted on a platform, and in the path of the electron beam from the electron beam source to the stage, a first mask, a blanking electrode, an electron lens, a first deflector, a second deflector, a second mask and a third deflector are installed.

Abstract: Selective pattern exposure with high reliability is made possible by a desired pattern of repeated pattern and a non-repeated pattern. Exposure technology is obtained to enable improvement of preparation efficiency of pattern data and to secure inspection of an aperture pattern. With the invention, an electron beam is used as focused beam, and a pattern exposure apparatus of a batch transfer system for transferring repeated pattern and non-repeated pattern of plural graphics of a semiconductor integrated circuit or the like comprises an EB drawing section for controlling the beam and irradiating beam onto a sample, a control I/O section, a drawing control section and a data storage section. In the EB drawing section, a semiconductor wafer is mounted on a platform, and in the path of the electron beam from the electron beam source to the stage, a first mask, a blanking electrode, an electron lens, a first deflector, a second deflector, a second mask and a third deflector are installed.

Abstract: Not only for a memory device having a high repeatabitlity but also for a device having a low repeatability, there can be realized an electron beam lithography method which can carry out high speed processing of the device with a less number of lithography shots as well as an apparatus therefor. An input pattern is classified into repetitive and non-repetitive patterns. The classified non-repetitive pattern is further classified into unit areas, i.e., repetitive and no-repetitive unit patterns. Next, the non-repetitive unit patterns are converted into lithography data, while the repetitive unit patterns and repetitive patterns are composed on the lithography data of the non-repetitive unit patterns. A result of composing the repetitive unit patterns and repetitive patterns and the lithography data of the non-repetitive unit patterns is sorted according to a lithography sequence and output as the lithography data.

Abstract: Disclosed is a rechargeable alkaline storage cell having a negative electrode, a positive electrode, and a separator disposed between the electrodes. The negative electrode has an active material layer and a conductive layer formed on the active layer, the active layer including cadmium active material, the conductive layer including polyvinylpyrrolidone as a binder and conductive powder.

Abstract: The present invention discloses an enclosed alkaline storage cell. The enclosed alkaline storage cell comprising a negative electrode made of materials including a main active material of cadmium oxide, a positive electrode, and a separator impregnated with an alkaline electrolytic solution and interposed therebetween, characterized in that the negative electrode has a product produced by cross linking reaction between high polymers having hydroxyl group and at least one of boric acid and boric acid salt inside and/or on the surface thereof.

Abstract: An electron beam lithographic method in which a sample is irradiated with an electron beam, wherein an extreme point of a contour of a pattern is calculated and a lithographic area is divided into a first region that is surrounded by straight lines drawn from the extreme point in parallel with the x-axis and the y-axis of the sample and by said pattern, and second regions in order to be lithographed.