Patents by Inventor Akira Mitsui

Akira Mitsui has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6489439
    Abstract: A process for producing a polyphenylene ether by oxidative polymerization of a phenol compound using a catalyst and an oxygen-containing gas, wherein the catalyst comprises a copper compound, a bromine compound, a diamine compound represented by the following formula (1): (wherein, R1, R2, R3 and R4 each independently represents hydrogen or a C1-6 linear or branched alkyl group with the proviso that all of them do not represent hydrogen simultaneously, and R5 represents a linear or methyl-branched C2-5 alkylene group), a tertiary monoamine compound and a secondary monoamine compound, wherein the process comprises the steps of: controlling an absolute pressure at a gaseous phase of a reaction vessel to a range of from 0.098 MPa to less than 0.392 MPa; and feeding the oxygen-containing gas to the reaction vessel, the oxygen-containing gas having an oxygen partial pressure, in terms of an absolute pressure, of from 0.0147 MPa to 0.0883 MPa.
    Type: Grant
    Filed: June 19, 2001
    Date of Patent: December 3, 2002
    Assignees: Asahi Kasei Kabushiki Kaisha, Mitsubishi Gas Chemical Company, Inc.
    Inventors: Akira Mitsui, Yuji Takeda
  • Publication number: 20020117785
    Abstract: A sputtering target which comprises SiC and metallic Si and has an atomic ratio of C to Si of from 0.5 to 0.95 and a density of from 2.75×103 kg/m3 to 3.1×103 kg/m3 and which is capable of forming a film comprising SiO2 as the main component and having a low refractive index at a high speed; a process for its production; and a film-forming method.
    Type: Application
    Filed: April 15, 2002
    Publication date: August 29, 2002
    Applicant: ASAHI GLASS COMPANY LIMITED
    Inventors: Akira Mitsui, Hiroshi Ueda, Kouichi Kanda, Susumu Nakagama
  • Patent number: 6440278
    Abstract: A sputtering target comprising a substrate and a target material formed on the substrate, wherein the target material comprises a metal oxide of the chemical formula MOx as the main component, wherein MOx is a metal oxide which is deficient in oxygen as compared with the stoichiometric composition, and M is at least one metal selected from the group consisting of Ti, Nb, Ta, Mo, W, Zr and Hf, a process for its production, and a method for forming a film having a high refractive index.
    Type: Grant
    Filed: September 28, 2001
    Date of Patent: August 27, 2002
    Assignee: Asahi Glass Company Ltd.
    Inventors: Otojiro Kida, Akira Mitsui, Eri Suzuki, Hisashi Osaki, Atsushi Hayashi
  • Patent number: 6402424
    Abstract: A vibratory roller R comprises a pair of rolls 5 axially supported at both sides of a body 1 in a cantilevered fashion, a pair of vibration generating devices 6 for vibrating each of the rolls 5, a pair of vibrating motors 7 for driving each of the vibration generating devices 6 and a pair of roll-driving motors 8 for rotating each of the rolls 5. The rolls 5 are connected to each other through the roll-driving motors 8 and by a connecting member 29, and the connecting member 29 is attached to the body 1 through vibration isolating members 30. The vibratory roller R enables a compacting operation with both rolls 5 vibrating simultaneously, and the service life of the vibration isolating members 30 can be extended.
    Type: Grant
    Filed: June 1, 2001
    Date of Patent: June 11, 2002
    Assignee: Sakai Heavy Industries, Ltd.
    Inventor: Akira Mitsui
  • Publication number: 20020040126
    Abstract: A process for producing a polyphenylene ether, which comprises contacting, with an aqueous solution of a chelating agent, a polyphenylene ether solution and adding a water-soluble poor solvent for the polyphenylene ether to precipitate the polyphenylene ether; and recovering the thus precipitated polyphenylene ether. A mixture remaining after the recovery of the polyphenylene ether is brought into contact with water to extract the water-soluble poor solvent, and a water phase containing the thus extracted water-soluble poor solvent is recovered by separation. The water-soluble poor solvent is separated and removed from the water phase by distillation, and the whole or a part of the remaining water phase is recycled as water to be brought into contact with the mixture, the remaining water phase having a content of a high-boiling-point organic substance of 1 wt. % or less.
    Type: Application
    Filed: June 19, 2001
    Publication date: April 4, 2002
    Inventors: Yuji Takeda, Akio Hasebe, Isamu Masumoto, Akira Mitsui
  • Publication number: 20020027817
    Abstract: A sputtering target comprising a substrate and a target material formed on the substrate, wherein the target material comprises a metal oxide of the chemical formula MOx as the main component, wherein MOx is a metal oxide which is deficient in oxygen as compared with the stoichiometric composition, and M is at least one metal selected from the group consisting of Ti, Nb, Ta, Mo, W, Zr and Hf, a process for its production, and a method for forming a film having a high refractive index.
    Type: Application
    Filed: September 28, 2001
    Publication date: March 7, 2002
    Applicant: Asahi Glass Company Ltd.
    Inventors: Otojiro Kida, Akira Mitsui, Eri Suzuki, Hisashi Osaki, Atsushi Hayashi, Takuji Oyama, Kenichi Sasaki
  • Publication number: 20020022134
    Abstract: An excellent heat-resistant electroconductive nitride film containing Ti and/or Zr, and at least one metal selected from the group consisting of Al, Mo, Cr, Nb, Hf, Ni, Co, Fe, Pd, Ag, Au and Pt, its production method and an antireflector using the electroconductive nitride film.
    Type: Application
    Filed: August 10, 2001
    Publication date: February 21, 2002
    Applicant: ASAHI GLASS COMPANY, LIMITED
    Inventors: Masami Fujino, Kazuo Sato, Akira Mitsui, Satoshi Takeda, Noritoshi Horie
  • Publication number: 20020013446
    Abstract: A process for producing a polyphenylene ether by oxidative polymerization of a phenol compound using a catalyst and an oxygen-containing gas, wherein said catalyst comprises a copper compound, a bromine compound, a diamine compound of formula (1) as recited in the specification, a tertiary monoamine compound and a secondary monoamine compound, and wherein said process comprises the steps of: preparing a catalyst component (P1) in a container which is under a substantially oxygen-free inert atmosphere by mixing the copper compound and the bromine compound to obtain a mixture and then mixing the mixture with the secondary monoamine compound in an amount of at least 2 times the molar amount of the copper atom; separately preparing a catalyst component (P2) by mixing the diamine compound of formula (1) and the tertiary monoamine compound together with a solvent in an oxidative polymerization vessel; adding a predetermined amount of the catalyst component (P1) to the polymerization vessel containing the catalyst c
    Type: Application
    Filed: June 19, 2001
    Publication date: January 31, 2002
    Inventors: Akira Mitsui, Yuji Takeda
  • Publication number: 20020010314
    Abstract: A process for producing a polyphenylene ether by oxidative polymerization of a phenol compound using a catalyst and an oxygen-containing gas, wherein the catalyst comprises a copper compound, a bromine compound, a diamine compound represented by the following formula (1): 1
    Type: Application
    Filed: June 19, 2001
    Publication date: January 24, 2002
    Inventors: Akira Mitsui, Yuji Takeda
  • Patent number: 6334938
    Abstract: A sputtering target comprising a substrate and a target material formed on the substrate, wherein the target material comprises a metal oxide of the chemical formula MOx as the main component, wherein MOx is a metal oxide which is deficient in oxygen as compared with the stoichiometric composition, and M is at least one metal selected from the group consisting of Ti, Nb, Ta, Mo, W, Zr and Hf, a process for its production, and a method for forming a film having a high refractive index.
    Type: Grant
    Filed: December 5, 2000
    Date of Patent: January 1, 2002
    Assignee: Asahi Glass Company, Ltd.
    Inventors: Otojiro Kida, Akira Mitsui, Eri Suzuki, Hisashi Osaki, Atsushi Hayashi, Takuji Oyama, Kenichi Sasaki
  • Publication number: 20010048221
    Abstract: A vibratory roller R comprises a pair of rolls 5 axially supported at both sides of a body 1 in a cantilevered fashion, a pair of vibration generating devices 6 for vibrating each of the rolls 5, a pair of vibrating motors 7 for driving each of the vibration generating devices 6 and a pair of roll-driving motors 8 for rotating each of the rolls 5. The rolls 5 are connected to each other through the roll-driving motors 8 and by a connecting member 29, and the connecting member 29 is attached to the body 1 through vibration isolating members 30. The vibratory roller R enables a compacting operation with both rolls 5 vibrating simultaneously, and the service life of the vibration isolating members 30 can be extended.
    Type: Application
    Filed: June 1, 2001
    Publication date: December 6, 2001
    Applicant: SAKAI HEAVY INDUSTRIES, LTD.
    Inventor: Akira Mitsui
  • Publication number: 20010020586
    Abstract: A sputtering target comprising a substrate and a target material formed on the substrate, wherein the target material comprises a metal oxide of the chemical formula MOx as the main component, wherein MOx is a metal oxide which is deficient in oxygen as compared with the stoichiometric composition, and M is at least one metal selected from the group consisting of Ti, Nb, Ta, Mo, W Zr and Hf, a process for its production, and a method for forming a film having a high refractive index.
    Type: Application
    Filed: December 5, 2000
    Publication date: September 13, 2001
    Applicant: Asahi Glass Company, Ltd.
    Inventors: Otojiro Kida, Akira Mitsui, Eri Suzuki, Hisashi Osaki, Atsushi Hayashi, Takuji Oyama, Kenichi Sasaki
  • Patent number: 6261982
    Abstract: A ceramic filter comprising at least 50 mass % of a cordierite aggregate having a particle size of at least 74 &mgr;m and a binder, wherein said binder comprises at least 10 mass % of a fine powder of cordierite having a particle size of less than 74 &mgr;m and &bgr;-spodumene, and the mass ratio of said &bgr;-spodumene to said fine powder of cordierite is from 0.6 to 2.5, and wherein said ceramic filter has a pressure loss coefficient m′ of at least 30×10−8 cm2 as represented by the following formula and as calculated with respect to pores having diameters corresponding to at least {fraction (1/10)} of the volume-based median pore diameter: m′=(Vp/Sp)2×(&rgr;) wherein Vp (cm3/g) is a cumulative pore specific volume, Sp (cm2/g) is a cumulative pore specific surface area, and &rgr; is a cumulative porosity.
    Type: Grant
    Filed: November 10, 1999
    Date of Patent: July 17, 2001
    Assignee: Asahi Glass Company Ltd.
    Inventors: Hideo Takahashi, Akira Mitsui
  • Patent number: 6193856
    Abstract: A sputtering target comprising a substrate and a target material formed on the substrate, wherein the target material comprises a metal oxide of the chemical formula MOx as the main component, wherein MOx is a metal oxide which is deficient in oxygen as compared with the stoichiometric composition, and M is at least one metal selected from the group consisting of Ti, Nb, Ta, Mo, W, Zr and Hf, a process for its production, and a method for forming a film having a high refractive index.
    Type: Grant
    Filed: March 12, 1998
    Date of Patent: February 27, 2001
    Assignee: Asahi Glass Company Ltd.
    Inventors: Otojiro Kida, Akira Mitsui, Eri Suzuki, Hisashi Osaki, Atsushi Hayashi
  • Patent number: 6146765
    Abstract: A transparent conductive film of a zinc oxide type containing gallium and silicon, which contains silicon in an amount of from 0.01 to 1.5 mol % in terms of SiO.sub.2.
    Type: Grant
    Filed: August 18, 1997
    Date of Patent: November 14, 2000
    Assignee: Asahi Glass Company Ltd.
    Inventors: Akira Mitsui, Kazuo Sato, Masami Miyazaki, Junichi Ebisawa, Yasuo Hayashi, Masao Higeta, Katsuaki Aikawa, Atsushi Hayashi
  • Patent number: 6042752
    Abstract: A transparent conductive film of tin oxide containing gallium and indium, which contains, when gallium is calculated as Ga.sub.2 O.sub.3, indium is calculated as In.sub.2 O.sub.3 and tin is calculated as SnO.sub.2, gallium in an amount of from 0.1 to 30 mol % and indium in an amount of from 0.1 to 30 mol %, based on the total amount of Ga.sub.2 O.sub.3, In.sub.2 O.sub.3 and SnO.sub.2, a sputtering target and a transparent conductive film bonded substrate. The transparent conductive film of the present invention exhibits chemical resistance and abrasion resistance.
    Type: Grant
    Filed: October 21, 1998
    Date of Patent: March 28, 2000
    Assignee: Asahi Glass Company Ltd.
    Inventor: Akira Mitsui
  • Patent number: 5984572
    Abstract: To be able to start and stop vibration without resonating a vibratory body as well as to prevent a drawback of a conventional technology in which when a vibration generating shaft is rotated at a high speed, a torsional coil spring is worn by being brought into abrasive contact with a bent support member and a receiving seat and a large sound is generated when a main weight returns in an axial direction of the vibration generating shaft, there is provided a vibratory generating mechanism having a movable eccentric weight 4 rotatable around a pivoting shaft 3, a sliding member 11 capable of linearly moving on the axial line of the vibration generating shaft along a guide member 6 at one end of the vibration generating shaft, a connecting rod 12 one end of which is connected to the sliding member and other end of which is connected to the movable eccentric weight for transforming a displacement of a linear movement of the sliding member into a displacement of a rotational movement around a pivoting shaft of the
    Type: Grant
    Filed: December 9, 1997
    Date of Patent: November 16, 1999
    Assignee: Sakai Heavy Industries, Inc.
    Inventor: Akira Mitsui
  • Patent number: 5788408
    Abstract: A vibratory pneumatic tire roller of the present invention comprises a frame, tire attaching means supported on each side by said frame with vibration proof members and bearings, a tire attached to said tire attaching means, and a vibration generating device having a vibration generating shaft provided within the outer diameter of said tire between said bearings placed at the ends of said tire attaching means, said vibration generating device transmitting vibration to said tire by rotating said vibration generating shaft with a drive source for generating vibration. Accordingly, the vibration generated by the vibration generating device is transmitted to the tire efficiently. The present invention achieves a self-propelled ride-on type vibratory pneumatic tire roller which is suitable for the road compaction.
    Type: Grant
    Filed: April 12, 1996
    Date of Patent: August 4, 1998
    Assignee: Sakai Heavy Industries, Ltd.
    Inventors: Akira Mitsui, Kristian John Guard
  • Patent number: 5772862
    Abstract: The present invention relates to a film comprising silicon dioxide as the main component, which contains Zr, etc., and a method for forming it by reactive DC sputtering. It makes it possible to form reflection preventive films, alkali barrier films and various multi-layered films such as multi-layered films for anti-iridescent glass, which contain said film comprising silicon dioxide as the main component, by a physical vapor deposition method without breaking a vacuum.
    Type: Grant
    Filed: April 27, 1995
    Date of Patent: June 30, 1998
    Assignee: Asahi Glass Company Ltd.
    Inventors: Eiichi Ando, Akira Mitsui, Junichi Ebisawa, Koichi Suzuki, Kiyoshi Matsumoto, Takuji Oyama
  • Patent number: 5736267
    Abstract: A transparent conductive film of a zinc oxide type containing gallium and silicon, which contains silicon in an amount of from 0.01 to 1.5 mol % in terms of SiO.sub.2.
    Type: Grant
    Filed: August 16, 1995
    Date of Patent: April 7, 1998
    Assignee: Asahi Glass Company Ltd.
    Inventors: Akira Mitsui, Kazuo Sato, Masami Miyazaki, Junichi Ebisawa, Yasuo Hayashi, Masao Higeta, Katsuaki Aikawa, Atsushi Hayashi