Patents by Inventor Akira Morishige

Akira Morishige has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7811501
    Abstract: A mold which is processed by ion beam irradiation or electron beam irradiation and in which a throughput of the mold is high and a decrease in the throughput or electrostatic discharge due to charging does not occur, a method of producing the mold, and a method of producing a molded article produced using the mold. When molding a plastic resin, at least one of a cavity and a core is provided on the surface of a conductive glass substrate. A method of producing a mold for molding a plastic resin or the like includes forming at least one of a cavity and a core by irradiating an ion beam on the surface of a conductive vanadate glass substrate that contains vanadium pentoxide (V2O5) as a main component and that has an electric conductivity in the range of 1.0×10?1 to 1.0×10?8 S/cm.
    Type: Grant
    Filed: September 5, 2005
    Date of Patent: October 12, 2010
    Assignee: Kitakyushu Foundation for the Advancement of Industry, Science and Technology
    Inventors: Tetsuaki Nishida, Ken-ichi Kobayashi, Akira Morishige
  • Publication number: 20100027178
    Abstract: [Problems] To provide a means for preventing electric/electronic materials from losing or degrading functionality when electrically conductive glasses are used as such electric/electronic materials. [Means for Solving the Problems] An electric/electronic circuit system comprises an electrically conductive glass member and an overcurrent preventing means for preventing overcurrent through the electrically conductive glass member, both contained within the electric/electronic circuit system.
    Type: Application
    Filed: November 13, 2007
    Publication date: February 4, 2010
    Applicant: TOKAI INDUSTRY CORPORATION
    Inventors: Kazumi Manabe, Akira Morishige, Takeshi Manabe, Mitsugi Matsushita, Kenichi Kobayashi
  • Publication number: 20090241554
    Abstract: An object of the present invention is to provide a Peltier device capable of retaining a certain temperature at a high accuracy by using a conductive glass consisting primarily of vanadate as an electrode, excellent in handleability, easy in temperature regulation, excellent in stability of cooling performance, capable of securely preventing an electrode from corrosion resulting from chemicals or dew condensation etc., and excellent in reliability and durability of the electrode. The Peltier device has a heat absorbing portion and a heat emitting portion, in which at least the electrode of the heat absorbing portion is formed with the conductive glass consisting primarily of vanadate.
    Type: Application
    Filed: March 30, 2007
    Publication date: October 1, 2009
    Applicant: KITAKYUSHU FOUNDATION FOR THE ADVANCEMENT OF INDUSTRY, SCIENCE AND TECHNOLOGY
    Inventors: Tetsuaki Nishida, Kenichi Kobayashi, Akira Morishige, Kazumi Manabe
  • Publication number: 20080303193
    Abstract: The present invention provides a mold which is processed by ion beam irradiation or electron beam irradiation and in which a throughput of the mold is high and a decrease in the throughput or electrostatic discharge due to charging does not occur, a method of producing the mold, and a method of producing a molded article produced using the mold. In a mold for molding a plastic resin or the like, at least one of a cavity and a core on the micrometer order to the nanometer order is provided on the surface of a conductive glass substrate. A method of producing a mold for molding a plastic resin or the like includes forming at least one of a cavity and a core on the micrometer order to the nanometer order by irradiating an ion beam on the surface of a conductive vanadate glass substrate that contains vanadium pentoxide (V2O5) as a main component and that has an electric conductivity in the range of 1.0×10?1 to 1.0×10?8 S/cm.
    Type: Application
    Filed: September 5, 2005
    Publication date: December 11, 2008
    Applicant: KITAKYUSHU FOUNDATION FOR THE ADVANCEMENT OF INDUSTRY, SCIENCE AND TECHNOLOGY
    Inventors: Tetsuaki Nishida, Ken-ich Kobayashi, Akira Morishige
  • Patent number: 4444869
    Abstract: An improved positive-working resist material capable of forming on a substrate either a positive resist pattern or a negative resist pattern. The positive-working resist material comprises a positive-working resist resin having incorporated therein one or more photochromic compounds, such as spiropyrans, triphenylmethane dyes, anils and the like. A positive or negative resist pattern having a remarkably improved definition can be obtained. The use of such a positive-working resist material in the formation of a negative resist pattern on the substrate is also disclosed.
    Type: Grant
    Filed: November 25, 1981
    Date of Patent: April 24, 1984
    Assignee: Fujitsu Limited
    Inventors: Tsunehiro Chonan, Akira Morishige