Patents by Inventor Akira Nagase

Akira Nagase has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of producing MIS structure
    Patent number: 3972756
    Abstract: A method of producing an MIS structure having self-alignment construction, wherein an insulating film is formed on the surface of a semiconductor substrate, a semiconductor layer is formed on a selected area of the insulating film, parts of the insulating film are etched using the semiconductor layer as a mask, and the surface of the semiconductor layer is etched in such manner that the underlying insulating film may not be etched, whereby the marginal portion of the semiconductor layer which otherwise projects laterally beyond the underlying insulating film is caused to recede.
    Type: Grant
    Filed: September 26, 1973
    Date of Patent: August 3, 1976
    Assignee: Hitachi, Ltd.
    Inventors: Akira Nagase, Masayasu Tsunematsu, Norio Anzai, Akihiro Tomozawa