Abstract: A correct viable cell number of a microorganism in a biological tissue is measured by cultivating a fragment of the biological tissue such as skin infected with the microorganism and administered with an antimicrobial agent, in a medium containing a phospholipid, a nonionic surfactant, or both of the phospholipid and the nonionic surfactant.

Abstract: An object of the present invention is to provide a medicinal composition useful for external application in the treatment of a fungal infection reaching the lower part of a thick keratin layer. Provided is an antifungal medicinal composition, comprising: (1) a film-forming agent; (2) a water-soluble plasticizer in a form of a solid or a paste at 20° C. at 1 atm; and (3) an antifungal compound represented by a general formula (1) and/or a physiologically acceptable salt thereof.

Abstract: A correct viable cell number of a microorganism in a biological tissue is measured by cultivating a fragment of the biological tissue such as skin infected with the microorganism and administered with an antimicrobial agent, in a medium containing a phospholipid, a nonionic surfactant, or both of the phospholipid and the nonionic surfactant.

Abstract: A correct viable cell number of a microorganism in a biological tissue is measured by cultivating a fragment of the biological tissue such as skin infected with the microorganism and administered with an antimicrobial agent, in a medium containing a phospholipid, a nonionic surfactant, or both of the phospholipid and the nonionic surfactant.

Abstract: The present invention relates to amine derivatives represented by formula (1) or salts thereof. R3 represents C1-C3 alkyl, hydroxylated C1-C5 alkyl, C1-C5 acyl; C2-C5 alkenyl, or a halogen atom; and k, l, and m are each an integer of 1 to 4.) Exhibiting excellent antifungal effect, these compounds are highly useful as antifungal agents, antifungal compositions, drugs, etc.

Abstract: Method and device for producing ball-shaped metallic particles substantially equal in diameter are disclosed. The device comprises a cylindrical metallic housing and a vessel provided on the cylindrical metallic housing. The vessel has a plurality of small openings through a bottom plate thereof. A vibrator is disposed above the vessel in a manner that the vessel may be subjected to vibration. A pair of pipes are provided to deliver and fill nitrogen or inert gas within the housing. An inclined bottom plate having a soft layer is arranged at a bottom portion of the housing to form a shielding structure. An exhaust pipe is provided at an outlet of the inclined bottom plate, and a selector is arranged at a bottom outlet of the shielding structure.

Abstract: Method and device for producing ball-shaped metallic particles at least almost equal in diameter are disclosed comprising a cylindrical metallic housing, a vessel provided on the cylindrical metallic housing, the vessel having a plurality of small openings through a bottom plate thereof, a vibrator disposed on a mount to locate above the vessel in a manner that the vessel may be subjected to vibration, a pair of pipes provided to locate at an opposition portion of the cylindrical metallic housing to deliver and fill nitrogen or inert gas within the housing, an inclined bottom plate having a soft layer arranged at a bottom portion of the housing to form a shielding structure, an exhaust pipe provided outwardly at an outlet of the inclined bottom plate and a selector arranged at a bottom outlet of the shielding structure.

Abstract: Novel amine derivatives having an excellent antimycotic effect represented by general formula (1) below and salts thereof are provided. [in the formula (1, R1 represents a C1-5 alkyl group which may be halogenated, R2 represents 4-(1,1-dimethylalkyl)benzyl group, 4-(1-methyl-phenylethyl)benzyl group, 1-or 2-naphthylmethyl group, or a hydrocarbon group having 3,3-dimethyl-1-butynyl group or a phenyl group at its terminal and 1 to 3 double bonds; R3 represents oxygen atom or a methylene group which may be substituted by a C1-4 alkyl group; and R4 represents 1-or 2 naphthyl group or a phenyl group which may be substituted.

Abstract: This invention relates to compounds represented by the following formula (1): ##STR1## wherein R.sup.1 represents a substituted or unsubstituted aromatic hydrocarbon group having 6 to 18 carbon atoms, R.sup.2 represents a hydrogen atom or a substituted or unsubstituted aromatic hydrocarbon group having 6 to 18 carbon atoms, R.sup.3 represents an alkyl group having 1 to 4 carbon atoms, R.sup.4 represents a substituted or unsubstituted phenyl group or an aliphatic hydrocarbon group containing at least four .pi. electrons, and m and n individually represent integers of from 1 to 4, or salts thereof, and also to compositions containing the same. These compounds have antifungal activities and are useful as drugs and the like.

Abstract: The present invention provides a plasma etching system, comprising a process chamber enclosing a plasma, means for evacuating said process chamber, a chuck electrode for supporting a substrate, a shower electrode positioned to face said chuck electrode and provided with a large number of small holes, a power source for applying a plasma voltage between the chuck electrode and said shower electrode, gas supply means communicating with said small holes of the shower electrode for supplying a plasma-forming gas into the process chamber through the small holes, and means for controlling said gas supply means such that said plasma-forming gas flows through said small holes at a mass flow rate of at least 620 kg/m.sup.2 /hr.

Abstract: The present invention provides a plasma etching system, comprising a process chamber enclosing a plasma, means for evacuating said process chamber, a chuck electrode for supporting a substrate, a shower electrode positioned to face said chuck electrode and provided with a large number of small holes, a power source for applying a plasma voltage between the chuck electrode and said shower electrode, gas supply means communicating with said small holes of the shower electrode for supplying a plasma-forming gas into the process chamber through the small holes, and means for controlling said gas supply means such that said plasma-forming gas flows through said small holes at a mass flow rate of at least 620 kg/m.sup.2 /hr.