Patents by Inventor Akira Sasano

Akira Sasano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5610738
    Abstract: An active matrix liquid crystal display device, with a plurality of thin-film transistors provided over a glass substrate each including an anodized oxide film of aluminum gate electrode, in which transparent pixel electrodes are formed in the same plane as the gate electrodes between the glass substrate and amorphous silicon islands over which source and drain electrodes are provided. In such a device structure, in which the spacing between the ITO and the gate electrode can be compacted while ensuring that there are no short-circuits effected between the ITO layer and gate electrode during the manufacture of the LCD device, the gate electrode and, therefore, also the plate (lower) electrode of the capacitor Cadd are first formed, followed by the formation of the AOF layer over the gate electrode and over the plate electrode of the capacitor, respectively.
    Type: Grant
    Filed: March 27, 1995
    Date of Patent: March 11, 1997
    Assignee: Hitachi, Ltd.
    Inventors: Akira Sasano, Kazuo Shirahashi, Yuka Matsukawa, Hideaki Taniguchi, Hideaki Yamamoto, Haruo Matsumaru
  • Patent number: 5589962
    Abstract: An anodized oxide film of Al is formed on a scanning signal line and a gate electrode. An alloy of Al containing Ta and Ti is used as material of each of the scanning signal line and gate electrode. The thickness of the anodized oxide film is set to 1,000 angstroms or more. The fabrication yield and reliability can be improved.
    Type: Grant
    Filed: June 6, 1995
    Date of Patent: December 31, 1996
    Assignee: Hitachi, Ltd.
    Inventors: Hideaki Yamamoto, Haruo Matsumaru, Tetsuaki Suzuki, Mitsuo Nakatani, Michio Tsukii, Akira Sasano, Saburo Oikawa, Ryoji Oritsuki
  • Patent number: 5585290
    Abstract: The present invention concerns an active-matrix addressed TFT substrate using a thin film transistor, a manufacturing method and an anodic oxidation method thereof, a liquid crystal display panel using the TFT substrate and a liquid crystal display equipment using the liquid crystal display panel and, more in particular, it relates to a structure and a manufacturing method which enables to improve the characteristics thereof. In the present invention, Cr or Ta is used for gate terminals, aluminum or a metal mainly composed of aluminum is used for gate bus-lines extended therefrom, gate electrodes and thin film capacitances (additional capacitance, storage capacitance) and an anodic oxidized film composed of the metal and free from defect is used for at least one of gate insulators, dielectric films of the thin film capacitances and interlayer insulation films for the intersections between the bus-lines.
    Type: Grant
    Filed: November 29, 1993
    Date of Patent: December 17, 1996
    Assignee: Hitachi, Ltd.
    Inventors: Hideaki Yamamoto, Haruo Matsumaru, Yasuo Tanaka, Ken Tsutsui, Toshihisa Tsukada, Kazuo Shirahashi, Akira Sasano, Yuka Matsukawa
  • Patent number: 5532850
    Abstract: There are disclosed various types of TFT active matrix liquid crystal display devices in which a pixel is divided into three, a capacitor is added to each pixel, light shielding is applied to each TFT, and the matrix is drived by a DC cancelling technique.
    Type: Grant
    Filed: June 1, 1995
    Date of Patent: July 2, 1996
    Assignee: Hitachi, Ltd.
    Inventors: Sakae Someya, Ryuuzoh Nashimoto, Hirofumi Suzuki, Katsuhiko Yarita, Shinji Matsumoto, Akira Sasano, Hideaki Taniguchi, Ryouji Oritsuki
  • Patent number: 5528396
    Abstract: There are disclosed various types of TFT active matrix liquid crystal display devices in which a pixel is divided into three parts, a capacitor is added to each pixel, light shielding is applied to each TFT, and the matrix is driven by a DC cancelling technique.
    Type: Grant
    Filed: July 18, 1994
    Date of Patent: June 18, 1996
    Assignee: Hitachi, Ltd.
    Inventors: Sakae Someya, Ryuuzoh Nashimoto, Hirofumi Suzuki, Katsuhiko Yarita, Shinji Matsumoto, Akira Sasano, Hideaki Taniguchi, Ryouji Oritsuki
  • Patent number: 5402254
    Abstract: An active matrix liquid crystal display device, with a plurality of thin-film transistors provided over a glass substrate each including an anodized oxide film of aluminum gate electrode, in which transparent pixel electrodes are formed in the same plane as the gate electrodes between the glass substrate and amorphous silicon islands over which source and drain electrodes are provided.
    Type: Grant
    Filed: November 24, 1993
    Date of Patent: March 28, 1995
    Assignee: Hitachi, Ltd.
    Inventors: Akira Sasano, Kazuo Shirahashi, Yuka Matsukawa, Hideaki Taniguchi, Hideaki Yamamoto, Haruo Matsumaru
  • Patent number: 5359206
    Abstract: Disclosed is an active-matrix addressed TFT substrate using a thin film transistor, a manufacturing method and an anodic oxidation method thereof, a liquid crystal display panel using the TFT substrate and a liquid crystal display equipment using the liquid crystal display panel. In the TFT substrate, Cr or Ta is used for gate terminals, aluminum or a metal mainly composed of aluminum is used for gate bus-lines extending therefrom, for gate electrodes, and for electrodes of thin film capacitors (additional capacitance, storage capacitance), and an anodic oxidized film composed of the metal and free from defect is used for at least one of gate insulators, dielectric films of the thin film capacitances and interlayer insulating films for the intersections between the bus-lines. Also disclosed is a method of selectively forming an anodic oxidized film on an aluminum pattern.
    Type: Grant
    Filed: April 15, 1991
    Date of Patent: October 25, 1994
    Assignee: Hitachi, Ltd.
    Inventors: Hideaki Yamamoto, Haruo Matsumaru, Yasuo Tanaka, Ken Tsutsui, Toshihisa Tsukada, Kazuo Shirahashi, Akira Sasano, Yuka Matsukawa
  • Patent number: 5331447
    Abstract: There are disclosed various types of TFT active matrix liquid crystal display devices in which a pixel is divided into three parts, a capacitor is added to each pixel, light shielding is applied to each TFT, and the matrix is driven by a DC cancelling technique.
    Type: Grant
    Filed: July 8, 1992
    Date of Patent: July 19, 1994
    Assignee: Hitachi, Ltd.
    Inventors: Sakae Someya, Ryuuzoh Nashimoto, Hirofumi Suzuki, Katsuhiko Yarita, Shinji Matsumoto, Akira Sasano, Hideaki Taniguchi, Ryouji Oritsuki
  • Patent number: 5285301
    Abstract: An active matrix liquid crystal display device with a plurality of thin-film transistors each including a gate electrode, preferably made of an aluminum film formed over a glass substrate, and a gate insulator preferably made of an upper silicon nitride film and a lower anodized oxide film of the aluminum film. Dummy gate lines DGL are disposed outside the outermost scanning signal line GL, and dummy data lines DDL are disposed outside the outermost video signal line DL so as to prevent breakage of outermost signal lines.
    Type: Grant
    Filed: March 16, 1992
    Date of Patent: February 8, 1994
    Assignee: Hitachi, Ltd.
    Inventors: Kazuo Shirahashi, Yuka Matsukawa, Akira Sasano, Hideaki Taniguchi, Hideaki Yamamoto, Haruo Matsumaru
  • Patent number: 5187604
    Abstract: An active matrix liquid crystal device is provided with improved external terminal structures including an ITO (indiumtin-oxide) pad covering an interconnection wiring, and a layout of a passivation film for protecting an aluminium wiring from outer moisture.
    Type: Grant
    Filed: January 29, 1990
    Date of Patent: February 16, 1993
    Assignee: Hitachi, Ltd.
    Inventors: Hideaki Taniguchi, Hirofumi Kunitou, Ryouji Oritsuki, Akira Sasano
  • Patent number: 5177577
    Abstract: An active matrix liquid crystal display device with a plurality of thin-film transistors each including a gate electrode of an upper aluminum film and a lower tantalum film formed over a glass substrate and a gate insulator of an upper silicon nitride film and a lower anodized oxide film of the aluminum film.
    Type: Grant
    Filed: July 5, 1991
    Date of Patent: January 5, 1993
    Assignee: Hitachi, Ltd.
    Inventors: Hideaki Taniguchi, Kazuo Shirahashi, Yuka Matsukawa, Haruo Matsumaru, Akira Sasano
  • Patent number: 5151385
    Abstract: A semiconductor device such as a solar cell, photodiode and solid state imaging device comprises a semiconductor layer made of amorphous silicon formed on a given substrate, and a transparent conductive layer formed by an interfacial reaction between the amorphous silicon and a metallic film directly formed on the amorphous silicon. This transparent conductive layer is used as a transparent electrode of the device and if necessary the remainder after having partially removed the metallic film for the transparent conductive layer is used as a conductive layer and light shielding film.
    Type: Grant
    Filed: October 3, 1988
    Date of Patent: September 29, 1992
    Assignee: Hitachi, Ltd.
    Inventors: Hideaki Yamamoto, Koichi Seki, Toshihiro Tanaka, Akira Sasano, Toshihisa Tsukada, Yasuharu Shimomoto, Toshio Nakano, Hideto Kanamori
  • Patent number: 5132820
    Abstract: There are disclosed various types of TFT active matrix liquid crystal display devices in which a pixel is divided into three parts, a capacitor is added to each pixel, light shielding is applied to each TFT, and the matrix is driven by a DC cancelling technique.
    Type: Grant
    Filed: June 10, 1988
    Date of Patent: July 21, 1992
    Assignee: Hitachi, Ltd.
    Inventors: Sakae Someya, Ryuuzoh Nashimoto, Hirofumi Suzuki, Katsuhiko Yarita, Shinji Matsumoto, Akira Sasano, Hideaki Taniguchi, Ryouji Oritsuki
  • Patent number: 4955697
    Abstract: A liquid crystal display panel and a method of driving the display panel are disclosed. The display panel and the driving method can reduce the leakage of a gate driving voltage to a first pixel electrode due to the parasitic capacitance of a thin film transistor, and can lessen an adverse effect of noise which is generated at a second pixel electrode by cancelling out the capacitive coupling to the first pixel electrode, on an image displayed by the display panel.
    Type: Grant
    Filed: April 19, 1988
    Date of Patent: September 11, 1990
    Assignee: Hitachi, Ltd.
    Inventors: Toshihisa Tsukada, Yoshiyuki Kaneko, Akira Sasano
  • Patent number: 4909602
    Abstract: An active matrix liquid crystal display is disclosed in which a better image quality is obtained by specifying a relation between voltages applied to the liquid crystal display. Also, a better holding characteristic is obtained by selecting the channel resistance R.sub.OFF of a thin film transistor in its OFF state to be not smaller than 10.sup.12 .OMEGA..
    Type: Grant
    Filed: April 19, 1988
    Date of Patent: March 20, 1990
    Assignee: Hitachi, Ltd.
    Inventors: Yoshiyuki Kaneko, Akira Sasano, Toshihisa Tsukada
  • Patent number: 4855795
    Abstract: A photosensor comprises an insulating substrate, an electrode, a photoconductor layer composed of a hydrogenated amorphous silicon semiconductor layer obtained by the glow discharge decomposition of monosilane gas, a junction stabilizing layer composed of a boron-containing hydrogenated amorphous silicon semiconductor which is obtained by the glow discharge decomposition of a mixed gas of monosilane and diborane, a transparent electrode and a transparent protective layer, these elements being laminated in that order. The insertion of the junction stabilizing layer between the photoconductor layer and the transparent electrode greatly improves the dark current characteristic. The electrode, the photoconductor layer and the junction stabilizing layer can be divided in correspondence with each picture element, thereby improving the resolution of the photosensor.
    Type: Grant
    Filed: August 21, 1986
    Date of Patent: August 8, 1989
    Assignee: Hitachi, Ltd.
    Inventors: Hideaki Yamamoto, Akira Sasano, Haruo Matsumaru, Yasuo Tanaka, Toshihisa Tsukada
  • Patent number: 4788582
    Abstract: A semiconductor device such as a solar cell, photodiode and solid state imaging device comprises a semiconductor layer made of amorphous silicon formed on a given substrate, and a transparent conductive layer formed by an interfacial reaction between the amorphous silicon and a metallic film directly formed on the amorphous silicon. This transparent conductive layer is used as a transparent electrode of the device and if necessary the remainder after having partially removed the metallic film for the transparent conductive layer is used as a conductive layer and right shielding film.
    Type: Grant
    Filed: November 10, 1986
    Date of Patent: November 29, 1988
    Assignee: Hitachi, Ltd.
    Inventors: Hideaki Yamamoto, Koichi Seki, Toshihiro Tanaka, Akira Sasano, Toshihisa Tsukada, Yasuharu Shimomoto, Toshio Nakano, Hideto Kanamori
  • Patent number: 4618873
    Abstract: In a thin film device having a hydrogenated amorphous silicon film, a metal layer is formed on the hydrogenated amorphous silicon film and then the metal layer is removed. A resulting reaction layer formed on the hydrogenated amorphous silicon film is used as a resistor.
    Type: Grant
    Filed: June 18, 1984
    Date of Patent: October 21, 1986
    Assignee: Hitachi, Ltd.
    Inventors: Akira Sasano, Kouichi Seki, Hideaki Yamamoto, Toru Baji, Toshihisa Tsukada
  • Patent number: 4565928
    Abstract: A photosensor comprises a first conductive layer formed on a given substrate, a one-dimensional array of a plurality of unit picture elements formed on the first conductive layer to extend in the longitudinal direction thereof, each unit picture element having a photodiode and a blocking diode connected in series with the photodiode in a relationship of reversed rectifying direction therewith, a second conductive layer for connecting together, at one end, respective unit picture elements belonging to each of at least two unit picture element groups having each at least two of adjacent unit picture elements, and a third conductive layer for connecting together, at the other end, corresponding unit picture elements in the respective groups, the set of the photodiode and blocking diode in the respective groups being made of the same semiconductor material. Dispersion of outputs from the respective unit picture elements can be minimized.
    Type: Grant
    Filed: September 22, 1982
    Date of Patent: January 21, 1986
    Assignees: Nippon Telegraph & Telephone Public Corp., Hitachi, Ltd.
    Inventors: Hideaki Yamamoto, Toru Baji, Toshihisa Tsukada, Akira Sasano
  • Patent number: 4500915
    Abstract: The present invention consists in providing a CCD type color solid-state imager in which color signals respectively separated in time can be derived from picture elements for respective colors arrayed in the shape of a matrix and which permits interlacing without degrading a resolution and without causing image lag. Concretely, pairs of CCD shift registers which are electrically insulated and separated and which run in the vertical direction are arrayed in the horizontal direction, signal charges stored in adjacent picture elements are sent into the individual opposing CCD registers through transfer gates arrayed in a checkerboard pattern, and signal charges transferred in time sequence are distributed to a plurality of CCD shift registers which run in the horizontal direction, whereby a CCD type color solid-state imager having a high resolution and exhibiting no image lag is obtained.
    Type: Grant
    Filed: September 24, 1982
    Date of Patent: February 19, 1985
    Assignee: Hitachi, Ltd.
    Inventors: Norio Koike, Toshihisa Tsukada, Toru Baji, Akira Sasano