Abstract: A thin film vacuum evaporation device having a reaction gas supplier for locally supplying a reaction gas to the evaporating point on a target. The device includes a reaction chamber that can be kept under vacuum with a light transmitting window disposed therein allowing the passage of a laser beam on the target. Also, a differential pressure chamber may be provided between the target and the light transmitting window, and a gas introducing section may be connected to the differential pressure chamber. Thus, the vapor generated by the target is prevented from adhering to the light transmitting window, and the light transmitting window can be kept clean.

Abstract: In an ion beam irradiating apparatus for providing a neutralized ion beam to a sample, there are provided an ion source, an accelerating device and an ion beam selecting device to which the accelerated and selection ion beam is irradiated.

Abstract: In an ion beam irradiating apparatus, a specified ion beam is first deflected in a deflection direction perpendicular to an ion beam orbit by an ion beam deflector. The deflected ion beam is neutralized by a thermoelectron beam emitted from a filament of an ion neutralizer. An electrode is employed to control the supply of the thermoelectron beam to the deflected ion beam. Both the filament and control electrode elongated along the deflection direction surround the deflected ion beam traveled along the ion beam orbit.