Patents by Inventor Akira Takada

Akira Takada has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220291043
    Abstract: A wavelength-swept light source is configured to generate light to be measured that is wavelength-swept coherent light with a wavelength periodically changed. The light to be measured is separated into a measurement section and a reference section that have different optical path lengths, and is then coupled in an interference section to generate interfering light. An analyzer performs a Fourier transform of interference signals of the interfering light, and acquires an actual measured noise floor value for each of the optical path length differences based on a point spread function. An estimated coherence time is determined so that an actual measured amplitude value of the noise floor value and a calculated amplitude value coincide with each other. Linewidth of the light emitted from the coherent light source is measured based on the estimated coherence time.
    Type: Application
    Filed: March 5, 2022
    Publication date: September 15, 2022
    Applicant: Topcon Corporation
    Inventor: Akira TAKADA
  • Publication number: 20220242378
    Abstract: A braking control system includes control circuitry configured to control first and second brakes in a vehicle. The control circuitry is configured to calculate a target braking force in accordance with the operation amount of a brake pedal by a driver, determine a first braking force and a second braking force based on the target braking force, and control each of the first and second brakes such that each of the determined braking forces is generated in the vehicle. The first and second braking forces are determined such that a sum of the first and second braking forces becomes the target braking force and a pitch behavior specified by a preset pitch behavior model occurs in the vehicle.
    Type: Application
    Filed: January 24, 2022
    Publication date: August 4, 2022
    Applicant: Mazda Motor Corporation
    Inventors: Akira HASHIZAKA, Masahiro NAGOSHI, Norihira WAKAYAMA, Shinichi KAIHARA, Masakazu TAKADA, Kentaro WATANABE, Yuji NAKANO, Hirotaka MOCHIZUKI, Akira TSUDA, Naoki TSUKAMOTO
  • Publication number: 20220218300
    Abstract: A disclosed radiation source position estimation system includes a first position information specifier configured to specify position information of one or more elements included in a position measuring member; an imager configured to acquire images of the one or more elements formed by radiation emitted from a radiation source; and a second position information specifier configured to specify position information of the radiation source, based on the first position information specified by the first position information specifier and the images acquired by the imager.
    Type: Application
    Filed: June 23, 2020
    Publication date: July 14, 2022
    Applicant: Ricoh Company, Ltd.
    Inventors: Masahiro TAKADA, Yoshihisa NAIJO, Akira KINOSHITA
  • Publication number: 20220206164
    Abstract: An optical interference measurement device includes: a light source having a wavelength-swept light source that changes a wavelength of emitted light periodically; a light splitter configured to split light emitted from the light source into measurement light and reference light; a measurement section configured to emit the measurement light onto a measurement target; an interference section configured to couple the measurement light reflected or scattered by the measurement target and the reference light together to produce interfering light; a light detector configured to detect the interfering light; and an analyzer configured to analyze an interference signal detected by the light detector. The optical interference measurement device has an optical element in the measurement section, and the optical element is configured to cause an optical loss that makes an amount of light received inversely proportional to a square of a propagation distance.
    Type: Application
    Filed: December 18, 2021
    Publication date: June 30, 2022
    Applicant: Topcon Corporation
    Inventor: Akira TAKADA
  • Publication number: 20220179307
    Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes a resin X including a repeating unit derived from a compound including two or more structural moieties consisting of an anionic moiety and a cationic moiety, and a polymerizable group, in which the compound generates an acid including an acidic moiety derived from the anionic moiety in the two or more structural moieties by irradiation with actinic rays or radiation.
    Type: Application
    Filed: February 23, 2022
    Publication date: June 9, 2022
    Applicant: FUJIFILM Corporation
    Inventors: Akira TAKADA, Akiyoshi GOTO, Masafumi KOJIMA, Aina USHIYAMA, Michihiro SHIRAKAWA, Keita KATO, Hironori OKA, Mitsuhiro FUJITA, Yasuharu SHIRAISHI
  • Publication number: 20220171253
    Abstract: An optical scanner includes: a light source; a deflection element including a plurality of pixels arranged one-dimensionally or two-dimensionally; a one-cycle diffraction grating including, among the pixels, continuous N pixels, where N is a natural number of two or more; the one-cycle diffraction grating having a length d in the alignment direction that is smaller than a wavelength ? of the light emitted from the light source; and a phase modulation controller configured to control a phase modulation amount of each of the pixels. Incident light is emitted from the light source obliquely from the reflecting surface at an incident angle ?1. Sin ?i+(?/d)>1 or sin ?i?(?/d)>1 is satisfied.
    Type: Application
    Filed: November 24, 2021
    Publication date: June 2, 2022
    Applicant: Topcon Corporation
    Inventor: Akira TAKADA
  • Patent number: 11257205
    Abstract: An image measuring method performed with an image measuring device measuring a dimension of a measured object from an image of the measured object captured by an image capturer. The method executes a standard reference object measurement measuring a dimension of the standard reference object with the image measuring device; a standard reference dimension input inputting a dimension of the standard reference object specified by a device other than the image measuring device; a preset value calculation calculating a preset value from the dimension of the measured standard reference object and from a dimension of the standard reference object measured by a predetermined measurement tool; a measurement measuring a dimension of a measured object other than the standard reference object using the image measuring device; and a correction correcting the dimension of the measured object other than the standard reference object measured by the image measuring device.
    Type: Grant
    Filed: December 20, 2016
    Date of Patent: February 22, 2022
    Assignee: MITUTOYO CORPORATION
    Inventors: Gyokubu Cho, Koichi Komatsu, Akira Takada, Hiroyuki Yoshida, Takashi Hanamura, Takuho Maeda, Makoto Kaieda, Isao Tokuhara
  • Publication number: 20220043347
    Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes an acid-decomposable resin and a compound that generates an acid upon irradiation with actinic rays or radiation, in which the compound that generates an acid upon irradiation with actinic rays or radiation includes one or more compounds selected from the group consisting of compounds (I) to (III), and a content of the compounds selected from the group consisting of the compounds (I) to (III) is more than 20.0% by mass with respect to a total solid content in the composition.
    Type: Application
    Filed: October 21, 2021
    Publication date: February 10, 2022
    Applicant: FUJIFILM Corporation
    Inventors: Akira TAKADA, Akiyoshi GOTO, Masafumi KOJIMA, Aina USHIYAMA
  • Patent number: 11067890
    Abstract: An actinic ray-sensitive or radiation-sensitive resin composition contains a compound represented by General Formula (1). In General Formula (1), X represents a sulfur atom or an iodine atom. m represents 1 or 2, in a case where X is a sulfur atom, m is 2, and in a case where X is an iodine atom, m is 1. R1's each independently represent an alkyl group or alkenyl group which may include a heteroatom, an aromatic heterocyclic group, or an aromatic hydrocarbon ring group. Further, in a case where m is 2, two R1's may be bonded to each other to form a ring. R2 represents a divalent linking group. R3 represents a divalent linking group having no aromatic group. Y? represents an anionic moiety. The pKa of the compound represented by General Formula (1) as Y? is protonated is ?2.0 to 1.5.
    Type: Grant
    Filed: July 10, 2019
    Date of Patent: July 20, 2021
    Assignee: FUJIFILM Corporation
    Inventors: Akiyoshi Goto, Masafumi Kojima, Akira Takada, Keita Kato, Kyohei Sakita
  • Publication number: 20210109446
    Abstract: The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition in which fewer defects are generated in any development treatment of alkali development and organic solvent development, a pattern forming method, a method for manufacturing an electronic device, and a resin. The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention includes a resin having a repeating unit represented by Formula (1) and a repeating unit having an acid-decomposable group, and a photoacid generator.
    Type: Application
    Filed: December 22, 2020
    Publication date: April 15, 2021
    Applicant: FUJIFILM Corporation
    Inventors: Akiyoshi Goto, Takashi Kawashima, Kazunari Yagi, Daisuke Asakawa, Akira Takada
  • Publication number: 20200183274
    Abstract: A photosensitive resin composition includes a resin, a photoacid generator, a solvent, and a low-molecular-weight ester compound, in which low-molecular-weight ester compound has alkali degradability and has a molecular weight of less than 1,500, and a content of the low-molecular-weight ester compound is from 0.1% by mass to 6% by mass with respect to the total solid content of the composition.
    Type: Application
    Filed: February 6, 2020
    Publication date: June 11, 2020
    Applicant: FUJIFILM Corporation
    Inventors: Naohiro TANGO, Akiyoshi GOTO, Keiyu O, Kazuhiro Marumo, Ryo NISHIO, Akira TAKADA
  • Publication number: 20200183279
    Abstract: A photosensitive resin composition includes a resin having a constitutional unit having an acid-decomposable group, a photoacid generator, a solvent, and a compound represented by Formula D. In Formula D, XD represents an O atom or an S atom, R1D represents a hydrogen atom, a hydrocarbon group, an acyl group, an acyloxy group, or an alkoxycarbonyl group, R2D represents a substituent, nD represents an integer from 0 to 4, and two or more of R2D's may be bonded to each other to form a ring.
    Type: Application
    Filed: February 13, 2020
    Publication date: June 11, 2020
    Applicant: FUJI FILM Corporation
    Inventors: Kazuhiro MARUMO, Naohiro TANGO, Ryo NISHIO, Akira TAKADA
  • Publication number: 20200159117
    Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes a resin whose solubility in an aqueous alkali solution increases by the action of an acid, a compound that generates an acid upon irradiation with actinic rays or radiation, an ester compound, and a fluorine-containing polymer, in which the ester compound has alkali decomposability and has a molecular weight of 50 or more and less than 1,500.
    Type: Application
    Filed: January 21, 2020
    Publication date: May 21, 2020
    Applicant: FUJIFILM Corporation
    Inventors: Ryo NISHIO, Akira Takada, Akiyoshi Goto, Naohiro Tango, Kazuhiro Marumo, Keiyu O
  • Patent number: 10551739
    Abstract: Provided are a resist composition capable of forming a pattern having excellent pattern collapse performance, particularly in the formation of an ultrafine pattern (for example, a pattern with a line width 50 nm or less) using the resist composition containing a resin (A) having a repeating unit (a) having an aromatic ring group and a repeating unit (b) having a silicon atom in a side chain, as well as a resist film, a pattern forming method, and a method for manufacturing an electronic device, each using the resist composition.
    Type: Grant
    Filed: March 20, 2018
    Date of Patent: February 4, 2020
    Assignee: FUJIFILM Corporation
    Inventors: Akira Takada, Shuji Hirano, Naoya Shimoju, Toshiya Takahashi, Hidehiro Mochizuki
  • Publication number: 20200012189
    Abstract: An actinic ray-sensitive or radiation-sensitive resin composition contains a compound represented by General Formula (1). In General Formula (1), X represents a sulfur atom or an iodine atom. m represents 1 or 2, in a case where X is a sulfur atom, m is 2, and in a case where X is an iodine atom, m is 1. R1's each independently represent an alkyl group or alkenyl group which may include a heteroatom, an aromatic heterocyclic group, or an aromatic hydrocarbon ring group. Further, in a case where m is 2, two R1's may be bonded to each other to form a ring. R2 represents a divalent linking group. R3 represents a divalent linking group having no aromatic group. Y? represents an anionic moiety. The pKa of the compound represented by General Formula (1) as Y? is protonated is ?2.0 to 1.5.
    Type: Application
    Filed: July 10, 2019
    Publication date: January 9, 2020
    Applicant: FUJIFILM Corporation
    Inventors: Akiyoshi GOTO, Masafumi KOJIMA, Akira TAKADA, Keita KATO, Kyohei SAKITA
  • Patent number: 10488755
    Abstract: A pattern forming method including a step of coating a substrate with an actinic ray-sensitive or radiation-sensitive resin composition and forming an actinic ray-sensitive or radiation-sensitive film; a step of simultaneously irradiating the actinic ray-sensitive or radiation-sensitive film with a plurality of electron beams; and a step of developing the actinic ray-sensitive or radiation-sensitive film after the irradiation with electron beams is provided. The composition contains a resin (A), a photoacid generator (B), and an acid diffusion control agent (C) and a molar ratio (Qp) between the photoacid generator (B) and the acid diffusion control agent (C), which is represented by Equation (1) is 0.3 or greater.
    Type: Grant
    Filed: September 28, 2017
    Date of Patent: November 26, 2019
    Assignee: FUJIFILM Corporation
    Inventors: Hidehiro Mochizuki, Shuji Hirano, Akira Takada
  • Publication number: 20190171104
    Abstract: An actinic ray-sensitive or radiation-sensitive resin composition contains a resin (C) having a repeating unit represented by Formula (I), A pattern forming method includes a step of forming a film with the actinic ray-sensitive or radiation-sensitive resin composition, and a method of manufacturing an electronic device includes the pattern forming method, in Formula (I), Z represents a halogen atom, a group represented by R11OCH2—, or a group represented by R12OC(?O)CH2—. R11 and R12 each represent a monovalent substituent. X represents an oxygen atom or a sulfur atom. L represents a (n+1)-valent linking group. R represents a group having a group that is decomposed due to the action of an alkali developer to increase solubility in an alkali developer, n represents a positive integer.
    Type: Application
    Filed: February 4, 2019
    Publication date: June 6, 2019
    Applicant: FUJIFILM Corporation
    Inventors: Akira Takada, Ryo Nishio, Akiyoshi Goto, Michihiro Shirakawa, Naohiro Tango, Kazuhiro Marumo, Kyohei Sakita
  • Patent number: 10295328
    Abstract: A calibration method for improving distortion of a waveform of a point-spread-function without constantly executing feedback control to a wavelength-swept light source is provided. An interference signal is generated by varying voltage to be applied to a light source within one period, the interference signal is sampled at equal time intervals on a time axis, the point-spread-function is obtained through Fourier transform by multiplying by a first window function, and a complex analysis signal including frequency information of light is obtained through inverse Fourier transform by multiplying the point-spread-function by a second window function. After a variation in a frequency of the light relative to a time within one period is obtained at equal time intervals by unwrapping phase information of the complex analysis signal, a correspondence relationship between the variation in the frequency of the light within one period and a variation in voltage within one period is obtained.
    Type: Grant
    Filed: February 24, 2015
    Date of Patent: May 21, 2019
    Assignee: Kabushiki Kaisha TOPCON
    Inventor: Akira Takada
  • Patent number: 10190686
    Abstract: A cover member is to cover a cylinder and includes a plurality of peaks, a plurality of valleys, and coupling portions, which couple the plurality of peaks to the plurality of valleys. The cover member is expandable and contractable in an alignment direction in which the plurality of peaks and the plurality of valleys are aligned. Each peak of the plurality of peaks includes a depression depressed from an apex of the peak in a direction toward the cylinder, and each valley of the plurality of valleys includes a protrusion protruding from a bottom of the valley in a direction opposite to the cylinder.
    Type: Grant
    Filed: March 29, 2016
    Date of Patent: January 29, 2019
    Assignees: SHOWA CORPORATION, FUKOKU BUSSAN CO., LTD.
    Inventors: Tomoyoshi Nagamachi, Akira Takada, Shinichi Sutou
  • Patent number: 10163201
    Abstract: A hardness tester includes a memory associating and storing a parts program having defined measurement conditions with respect to a sample, including a test position, and an image file acquired by capturing an image of the shape of the sample; an image acquirer acquiring image data of the sample to be measured; a pattern matcher performing a pattern matching process on the image data of the sample using the image file associated with the parts program; a determiner determining whether an image file exists which has a shape related to the image data of the sample; a retriever retrieving the parts program associated with the image file having a related shape; and a measurer measuring hardness of the sample based on the retrieved parts program.
    Type: Grant
    Filed: August 30, 2016
    Date of Patent: December 25, 2018
    Assignee: MITUTOYO CORPORATION
    Inventors: Takeshi Sawa, Takashi Hanamura, Akira Takada, Takuho Maeda