Patents by Inventor Akira Takada

Akira Takada has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240149461
    Abstract: A foolproof device provided to a manufacturing process includes an imaging part that captures an object on which a plurality of identifiable marks are provided, an image processing part that obtains state data including a coordinate position of each mark from at least one captured image captured by the imaging part, a storage that stores reference data obtained by the image processing part, the reference data including a reference position of each mark, and a comparison processing part that compares the reference data stored in the storage with the current state data obtained by the image processing part, and outputs a result of the comparison regarding at least some of the plurality of marks.
    Type: Application
    Filed: November 3, 2023
    Publication date: May 9, 2024
    Applicant: MITUTOYO CORPORATION
    Inventors: Akira TAKADA, Mitsuru FUKUDA, Hirotada ANZAI, Eran YERUHAM, Yuval YERUHAM, David BUNIMOVICH
  • Publication number: 20240114941
    Abstract: The present invention provides a sweetener composition that can be used for food as a sugar substitute sweetener. Specifically, the sweetener composition contains rebaudioside O and rebaudioside N as active ingredients, or contains at least one of rebaudioside D and rebaudioside M and at least one of rebaudioside O and rebaudioside N as active ingredients. In addition, the sweetener composition is used in combination with an additional sweetener.
    Type: Application
    Filed: July 13, 2023
    Publication date: April 11, 2024
    Inventors: Toyoshige Morita, Akira Takada
  • Patent number: 11815399
    Abstract: A wavelength-swept light source is configured to generate light to be measured that is wavelength-swept coherent light with a wavelength periodically changed. The light to be measured is separated into a measurement section and a reference section that have different optical path lengths, and is then coupled in an interference section to generate interfering light. An analyzer performs a Fourier transform of interference signals of the interfering light, and acquires an actual measured noise floor value for each of the optical path length differences based on a point spread function. An estimated coherence time is determined so that an actual measured amplitude value of the noise floor value and a calculated amplitude value coincide with each other. Linewidth of the light emitted from the coherent light source is measured based on the estimated coherence time.
    Type: Grant
    Filed: March 5, 2022
    Date of Patent: November 14, 2023
    Assignee: Topcon Corporation
    Inventor: Akira Takada
  • Patent number: 11723391
    Abstract: The present invention provides a sweetener composition that can be used for food as a sugar substitute sweetener. Specifically, the sweetener composition contains rebaudioside O and rebaudioside N as active ingredients, or contains at least one of rebaudioside D and rebaudioside M and at least one of rebaudioside O and rebaudioside N as active ingredients. In addition, the sweetener composition is used in combination with an additional sweetener.
    Type: Grant
    Filed: March 11, 2016
    Date of Patent: August 15, 2023
    Assignee: MORITA KAGAKU KOGYO CO., LTD.
    Inventors: Toyoshige Morita, Akira Takada
  • Publication number: 20230148344
    Abstract: The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition with which a pattern having excellent LWR performance can be obtained, a resist film, a pattern forming method, a method for manufacturing an electronic device, a compound, and a method for producing the compound. The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention is an actinic ray-sensitive or radiation-sensitive resin composition including a resin having a repeating unit having a group having a polarity that increases through decomposition by the action of an acid, in which the actinic ray-sensitive or radiation-sensitive resin composition further includes, in addition to the resin, a compound having at least one cation represented by General Formula (1), or the resin further has, in addition to the repeating unit, a repeating unit having the cation represented by General Formula (1).
    Type: Application
    Filed: November 28, 2022
    Publication date: May 11, 2023
    Applicant: FUJIFILM Corporation
    Inventors: Akiyoshi GOTO, Akira Takada, Aina Ushiyama, Masafumi Kojima, Michihiro Shirakawa
  • Publication number: 20230139891
    Abstract: A first object of the present invention is to provide an actinic ray-sensitive or radiation-sensitive resin composition with which a pattern having a good shape can be obtained. Furthermore, a second object of the present invention is to provide a resist film, a pattern forming method, and a method for manufacturing an electronic device, each relating to the actinic ray-sensitive or radiation-sensitive resin composition. In addition, a third object of the present invention is to provide a compound which can be suitably used in the actinic ray-sensitive or radiation-sensitive resin composition. The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention includes a compound that generates an acid upon irradiation with actinic rays or radiation, an acid-decomposable resin having a weight-average molecular weight of 30,000 or less, and a solvent, and the compound that generates an acid upon irradiation with actinic rays or radiation includes a compound (I).
    Type: Application
    Filed: December 8, 2022
    Publication date: May 4, 2023
    Applicant: FUJIFILM Corporation
    Inventors: Masafumi Kojima, Akira Takada, Akiyoshi Goto, Takeshi Kawabata, Aina Ushiyama
  • Publication number: 20230133710
    Abstract: An object of the present invention is to provide an actinic ray-sensitive or radiation-sensitive resin composition with which a pattern having excellent LWR performance can be formed even after the composition is stored for a long period of time. In addition, another object of the present invention is to provide a resist film, a pattern forming method, and a method for manufacturing an electronic device, each relating to the actinic ray-sensitive or radiation-sensitive resin composition. The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention includes a resin of which polarity increases through decomposition by an action of an acid, and a compound that generates an acid upon irradiation with actinic rays or radiation, and the compound that generates an acid upon irradiation with actinic rays or radiation is selected from compounds (I) and (II).
    Type: Application
    Filed: December 8, 2022
    Publication date: May 4, 2023
    Applicant: FUJIFILM Corporation
    Inventors: Aina USHIYAMA, Akira TAKADA, Masafumi KOJIMA, Akiyoshi GOYO, Michihiro SHIRAKAWA, Keita KATO
  • Publication number: 20230067750
    Abstract: An object of the present invention is to provide a pattern forming method using a non-chemically amplified resist composition, which has excellent washing properties in a washing step with an EBR liquid and is less likely to cause a film loss in a non-exposed portion during development using an organic solvent-based developer. Another object of the present invention to provide a method for manufacturing an electronic device using the pattern forming method.
    Type: Application
    Filed: September 26, 2022
    Publication date: March 2, 2023
    Applicant: FUJIFILM Corporation
    Inventors: Kazuhiro MARUMO, Michihiro SHIRAKAWA, Akira TAKADA
  • Patent number: 11584810
    Abstract: An actinic ray-sensitive or radiation-sensitive resin composition contains a resin (C) having a repeating unit represented by Formula (1). A pattern forming method includes a step of forming a film with the actinic ray-sensitive or radiation-sensitive resin composition, and a method of manufacturing an electronic device includes the pattern forming method, in Formula (1), Z represents a halogen atom, a group represented by R11OCH2—, or a group represented by R12OC(?O)CH2—. R11 and R12 each represent a monovalent substituent. X represents an oxygen atom or a sulfur atom. L represents a (n+1)-valent linking group. R represents a group having a group that is decomposed due to the action of an alkali developer to increase solubility in an alkali developer, n represents a positive integer.
    Type: Grant
    Filed: February 4, 2019
    Date of Patent: February 21, 2023
    Assignee: FUJIFILM Corporation
    Inventors: Akira Takada, Ryo Nishio, Akiyoshi Goto, Michihiro Shirakawa, Naohiro Tango, Kazuhiro Marumo, Kyohei Sakita
  • Patent number: 11579528
    Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes a resin whose solubility in an aqueous alkali solution increases by the action of an acid, a compound that generates an acid upon irradiation with actinic rays or radiation, an ester compound, and a fluorine-containing polymer, in which the ester compound has alkali decomposability and has a molecular weight of 50 or more and less than 1,500.
    Type: Grant
    Filed: January 21, 2020
    Date of Patent: February 14, 2023
    Assignee: FUJIFILM Corporation
    Inventors: Ryo Nishio, Akira Takada, Akiyoshi Goto, Naohiro Tango, Kazuhiro Marumo, Keiyu O
  • Publication number: 20220382153
    Abstract: The present invention provides a positive tone resist composition containing (A) an ionic compound and (B) a resin that has a repeating unit (b1) having an interactive group which interacts with an ionic group in the ionic compound and of which a main chain is decomposed by an irradiation with X-rays, electron beam, or extreme ultraviolet rays; a resist film formed of the positive tone resist composition; a pattern forming method; and a method for manufacturing an electronic device.
    Type: Application
    Filed: July 29, 2022
    Publication date: December 1, 2022
    Applicant: FUJIFILM Corporation
    Inventors: Akira TAKADA, Akiyoshi GOTO, Kazunari YAGI, Michihiro SHIRAKAWA, Kazuhiro MARUMO
  • Publication number: 20220349694
    Abstract: An abnormality determination apparatus includes a data acquisition part that acquires position data indicating a plurality of positions to be measured of a standard gage used in a coordinate measuring apparatus, in association with apparatus identification information for identifying the coordinate measuring apparatus, a generation part that generates distance data indicating a distance to be measured that is a distance between the plurality of positions to be measured indicated by the position data, a storage that stores an appropriate range in which the distance data is determined to be appropriate, and a determination part that determines whether there is an abnormality in the coordinate measuring apparatus on the basis of whether or not the distance to be measured indicated by the distance data is included in the appropriate range, and outputs a determination result in association with the apparatus identification information.
    Type: Application
    Filed: April 13, 2022
    Publication date: November 3, 2022
    Applicant: MITUTOYO CORPORATION
    Inventors: Yo TERASHITA, Yuuto KARASAWA, Akira TAKADA, Shinji HASHIMOTO, Takuya KOMADA
  • Publication number: 20220291043
    Abstract: A wavelength-swept light source is configured to generate light to be measured that is wavelength-swept coherent light with a wavelength periodically changed. The light to be measured is separated into a measurement section and a reference section that have different optical path lengths, and is then coupled in an interference section to generate interfering light. An analyzer performs a Fourier transform of interference signals of the interfering light, and acquires an actual measured noise floor value for each of the optical path length differences based on a point spread function. An estimated coherence time is determined so that an actual measured amplitude value of the noise floor value and a calculated amplitude value coincide with each other. Linewidth of the light emitted from the coherent light source is measured based on the estimated coherence time.
    Type: Application
    Filed: March 5, 2022
    Publication date: September 15, 2022
    Applicant: Topcon Corporation
    Inventor: Akira TAKADA
  • Publication number: 20220206164
    Abstract: An optical interference measurement device includes: a light source having a wavelength-swept light source that changes a wavelength of emitted light periodically; a light splitter configured to split light emitted from the light source into measurement light and reference light; a measurement section configured to emit the measurement light onto a measurement target; an interference section configured to couple the measurement light reflected or scattered by the measurement target and the reference light together to produce interfering light; a light detector configured to detect the interfering light; and an analyzer configured to analyze an interference signal detected by the light detector. The optical interference measurement device has an optical element in the measurement section, and the optical element is configured to cause an optical loss that makes an amount of light received inversely proportional to a square of a propagation distance.
    Type: Application
    Filed: December 18, 2021
    Publication date: June 30, 2022
    Applicant: Topcon Corporation
    Inventor: Akira TAKADA
  • Publication number: 20220179307
    Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes a resin X including a repeating unit derived from a compound including two or more structural moieties consisting of an anionic moiety and a cationic moiety, and a polymerizable group, in which the compound generates an acid including an acidic moiety derived from the anionic moiety in the two or more structural moieties by irradiation with actinic rays or radiation.
    Type: Application
    Filed: February 23, 2022
    Publication date: June 9, 2022
    Applicant: FUJIFILM Corporation
    Inventors: Akira TAKADA, Akiyoshi GOTO, Masafumi KOJIMA, Aina USHIYAMA, Michihiro SHIRAKAWA, Keita KATO, Hironori OKA, Mitsuhiro FUJITA, Yasuharu SHIRAISHI
  • Publication number: 20220171253
    Abstract: An optical scanner includes: a light source; a deflection element including a plurality of pixels arranged one-dimensionally or two-dimensionally; a one-cycle diffraction grating including, among the pixels, continuous N pixels, where N is a natural number of two or more; the one-cycle diffraction grating having a length d in the alignment direction that is smaller than a wavelength ? of the light emitted from the light source; and a phase modulation controller configured to control a phase modulation amount of each of the pixels. Incident light is emitted from the light source obliquely from the reflecting surface at an incident angle ?1. Sin ?i+(?/d)>1 or sin ?i?(?/d)>1 is satisfied.
    Type: Application
    Filed: November 24, 2021
    Publication date: June 2, 2022
    Applicant: Topcon Corporation
    Inventor: Akira TAKADA
  • Patent number: 11257205
    Abstract: An image measuring method performed with an image measuring device measuring a dimension of a measured object from an image of the measured object captured by an image capturer. The method executes a standard reference object measurement measuring a dimension of the standard reference object with the image measuring device; a standard reference dimension input inputting a dimension of the standard reference object specified by a device other than the image measuring device; a preset value calculation calculating a preset value from the dimension of the measured standard reference object and from a dimension of the standard reference object measured by a predetermined measurement tool; a measurement measuring a dimension of a measured object other than the standard reference object using the image measuring device; and a correction correcting the dimension of the measured object other than the standard reference object measured by the image measuring device.
    Type: Grant
    Filed: December 20, 2016
    Date of Patent: February 22, 2022
    Assignee: MITUTOYO CORPORATION
    Inventors: Gyokubu Cho, Koichi Komatsu, Akira Takada, Hiroyuki Yoshida, Takashi Hanamura, Takuho Maeda, Makoto Kaieda, Isao Tokuhara
  • Publication number: 20220043347
    Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes an acid-decomposable resin and a compound that generates an acid upon irradiation with actinic rays or radiation, in which the compound that generates an acid upon irradiation with actinic rays or radiation includes one or more compounds selected from the group consisting of compounds (I) to (III), and a content of the compounds selected from the group consisting of the compounds (I) to (III) is more than 20.0% by mass with respect to a total solid content in the composition.
    Type: Application
    Filed: October 21, 2021
    Publication date: February 10, 2022
    Applicant: FUJIFILM Corporation
    Inventors: Akira TAKADA, Akiyoshi GOTO, Masafumi KOJIMA, Aina USHIYAMA
  • Patent number: 11067890
    Abstract: An actinic ray-sensitive or radiation-sensitive resin composition contains a compound represented by General Formula (1). In General Formula (1), X represents a sulfur atom or an iodine atom. m represents 1 or 2, in a case where X is a sulfur atom, m is 2, and in a case where X is an iodine atom, m is 1. R1's each independently represent an alkyl group or alkenyl group which may include a heteroatom, an aromatic heterocyclic group, or an aromatic hydrocarbon ring group. Further, in a case where m is 2, two R1's may be bonded to each other to form a ring. R2 represents a divalent linking group. R3 represents a divalent linking group having no aromatic group. Y? represents an anionic moiety. The pKa of the compound represented by General Formula (1) as Y? is protonated is ?2.0 to 1.5.
    Type: Grant
    Filed: July 10, 2019
    Date of Patent: July 20, 2021
    Assignee: FUJIFILM Corporation
    Inventors: Akiyoshi Goto, Masafumi Kojima, Akira Takada, Keita Kato, Kyohei Sakita
  • Publication number: 20210109446
    Abstract: The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition in which fewer defects are generated in any development treatment of alkali development and organic solvent development, a pattern forming method, a method for manufacturing an electronic device, and a resin. The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention includes a resin having a repeating unit represented by Formula (1) and a repeating unit having an acid-decomposable group, and a photoacid generator.
    Type: Application
    Filed: December 22, 2020
    Publication date: April 15, 2021
    Applicant: FUJIFILM Corporation
    Inventors: Akiyoshi Goto, Takashi Kawashima, Kazunari Yagi, Daisuke Asakawa, Akira Takada