Abstract: The present invention provides a polymer brush-type filler which contains polymer chains at a high density and with a broad molecular weight distribution. Specifically, the present invention provides fine particles for chromatography comprising graft polymer chains obtained by grafting polymer chains via polymerization initiating groups on the surface of solid particles, wherein the graft polymer chains include specific repeating units, have a specific number average molecular weight and a specific molecular weight distribution and also have a high density of 0.03 chains/nm2 or more and 0.70 chains/nm2 or less.

Abstract: A photosemiconductor protective material comprising a chain olefin-cyclic olefin copolymer elastomer composed of a chain olefin and a cyclic olefin as polymerizable components is prepared. The elastomer may comprise an ?-chain C2-4olefin and a polycyclic olefin as polymerizable components, and the molar ratio of the ?-chain C2-4olefin relative to the polycyclic olefin may be 80/20 to 99/1 in a ratio of the ?-chain C2-4olefin/the polycyclic olefin. The photosemiconductor protective material may further contain an organic silicon compound having a hydrolytically condensable group. The organic silicon compound may be a silane coupling agent having a (meth)acryloyl group. A photosemiconductor protective material 1 as the protective material is suitable as a solar cell encapsulant or filler 3 for encapsulating a solar cell 4. The photosemiconductor protective material has a high transparency and a high weather resistance and a proper elasticity and effectively protects a photosemiconductor.

Abstract: An N-substituted benzimidazole-containing bridged alicyclic compound is provided.

Abstract: A prepolymer is a reaction product of a compound A and a compound B, in which the compounds A and B each have two or more functional groups or sets of functional groups in one molecule and are capable of undergoing polymerization as a result of binding of the functional groups or sets of functional groups of one compound with the functional groups or sets of functional groups of the other compound to thereby form a high-molecular-weight polymer with a porous structure. The prepolymer has a weight-average molecular weight of about 200 to about 100000. The functional groups or sets of functional groups of the compound A are preferably each a carboxyl group or an amino group, and the functional groups or sets of functional groups of the compound B are preferably two amino groups, an amino group and a hydroxyl group, an amino group and a mercapto group, or two carboxyl groups.

Abstract: A photoresist polymeric compound includes a monomer unit represented by following Formula (I): The polymeric compound may further include at least one of monomer units represented by Formulae (IIa) to (IIg) as described in the specification. The photoresist polymeric compound can exhibit high adhesion to substrates and can highly precisely form fine patterns.

Abstract: A polymeric compound of the invention includes at least one monomer unit selected from the following formulae (I), (II), (III) and (IV): (wherein R1 is a hydrogen atom or a methyl group, R2 and R3 are each a hydrogen atom, a hydroxyl group or a —COOR4 group, where R4 is, e.g.

Abstract: A photoresist polymeric compound includes a monomer unit represented by following Formula (I): 1

Abstract: A photoresist polymeric compound includes a monomer unit represented by following Formula (I): The polymeric compound may further include at least one of monomer units represented by Formulae (IIa) to (IIg) as described in the specification. The photoresist polymeric compound can exhibit high adhesion to substrates and can highly precisely form fine patterns.

Abstract: A photoresist polymeric compound includes a monomer unit represented by following Formula (I): 1

Abstract: A polymeric compound includes at least one monomeric unit of the following formula (I): wherein R1 is a hydrogen atom or a methyl group; and each of R2 and R3 is independently a hydrogen atom or a hydroxyl group. The polymeric compound may include the monomeric unit and at least one monomeric unit selected from monomeric units represented by the following formulae (IIa) and (IIb): wherein R1 is a hydrogen atom or a methyl group; each of R4 and R5 is, for example, a hydrogen atom, a hydroxyl group, an oxo group, or a carboxyl group, wherein R4 and R5 are not concurrently hydrogen atoms; and each of R7 and R8 is independently a hydrogen atom, a hydroxyl group, or an oxo group. The polymeric compound have a high etching resistance in addition to satisfactory transparency, alkali-solubility, and adhesion.