Patents by Inventor Akira Tanikawa
Akira Tanikawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20250022902Abstract: The present disclosure relates to a semiconductor device, a manufacturing method therefor, and an electronic apparatus by which film stress generated due to heat treatment can be reduced. The semiconductor device includes a through-via on which a connection electrical conductor is formed via an insulation film, the through-via being provided on a side wall of a through-hole formed in a semiconductor substrate, in which the connection electrical conductor includes a thin film portion with a smaller film thickness and a thick film portion with a larger film thickness. The present disclosure can be applied to, for example, a solid-state image pickup apparatus and the like.Type: ApplicationFiled: December 1, 2022Publication date: January 16, 2025Inventors: KATSUNORI TOZAWA, TOSHIAKI SHIRAIWA, MASANAGA FUKASAWA, SEIYA TANIKAWA, TOMOHIRO SUGIYAMA, AKIRA MAEHARA
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Patent number: 6387506Abstract: A resin composition for paper-coating, which comprises (A) a cross-linked amine compound which is a reaction product of (a) an aliphatic amine, (b) a glycidyl compound having at least two glycidyl groups in the molecule and (c) a compound selected from &agr;,&bgr;-unsaturated carbonyl compounds, &agr;,&bgr;-unsaturated nitrile compounds and &agr;-halocarboxylic acid groups; and (B) at least one selected from a group consisting of (B1) non-polymer nonvolatile substances and (B2) polyhydric alcohols, is provided, and the resin composition for paper-coating can realize high quality of coated paper by being mixed with a pigment and an aqueous binder and being coated on paper, which does not cause generation of formaldehyde and which does not tend to produce disadvantages such as thickening and deterioration in flowing property, and for paper using the resin composition and a coated paper produced by using the coating composition are also provided.Type: GrantFiled: November 26, 1999Date of Patent: May 14, 2002Assignee: Sumitomo Chemical Company, LimitedInventors: Akira Kawamura, Akira Tanikawa, Toshiyuki Hasegawa, Yutaka Shibata, Toshishige Hamaguchi
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Patent number: 6039799Abstract: A paper coating composition which comprises:(I) a pigment,(II) an aqueous binder, and(III) a crosslinked amine compound obtainable by reacting a heterocyclic amine (a) and a glycidyl compound (b) having at least two glycidyl groups in the molecule,and a method for preparing the paper coating composition.Type: GrantFiled: August 25, 1998Date of Patent: March 21, 2000Assignee: Sumitomo Chemical Company LimitedInventors: Akira Kawamura, Toshiyuki Hasegawa, Akira Tanikawa
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Patent number: 5849856Abstract: A water soluble resin obtainable by reacting at least two reactants comprising a polyamine and a urea compound, or at least four reactants comprising a polyamine, a urea compound, a dibasic carboxylic acid compound and a lactam; and then reacting the reaction product with at least one compound selected from among epihalohydrins, .alpha.,.gamma.-dihalo-.beta.-hydrins, glycidyl compounds and isocyanates. The resultant the water soluble resin is useful for making a paper coating composition, such as by being mixing that resin with a pigment and an aqueous binder. The paper coating composition does not generate formaldehyde and can be used to manufacture coated papers exhibiting improved properties including excellent water resistance.Type: GrantFiled: April 11, 1997Date of Patent: December 15, 1998Assignee: Sumitomo Chemical Company LimitedInventors: Akira Kawamura, Akira Tanikawa, Toshiyuki Hasegawa, Sonoe Sato
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Patent number: 5654359Abstract: A paper coating composition comprising (I) a pigment, (II) an aqueous binder, and (III) a water-soluble resin obtainable by the reaction of at least (a) an alkylenediamine or a polyalkylenepolyamine, (b) an urea compound, and (c) a compound selected from aldehydes, epihalohydrins and is further improved by incorporating therein, (IV) a compound selected from the group consisting of (f) amines selected from the group consisting of monoamines, diamines and their salts each having at least 4 carbon atoms, (g) quaternary organic ammonium salts, and (h) polyamides obtainable by the reaction between a dibasic carboxylic compound and a polyamine. The water-soluble resin of the component (III) may be further allowed to react with a dibasic carboxylic compound, an alicyclic amine and/or an alicyclic epoxy compound in addition to the above three ingredients. Paper coated by using the above composition is especially excellent in ink receptivity and water resistance.Type: GrantFiled: February 28, 1996Date of Patent: August 5, 1997Assignee: Sumitomo Chemical Company, LimitedInventors: Toshiyuki Hasegawa, Yoshifumi Yoshida, Akira Tanikawa, Fujiko Kumei
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Patent number: 5573591Abstract: A monocrystal pulling apparatus according to the Czochralski technique, provided with a flow controller which guides a carrier gas supplied from the top of a pulling cheer to the surface of a melt of a material forming the monocrystal and exhausts the silicon oxide vaporizing from the surface of the melt to the outside of the pulling chamber and which surrounds the pulled monocrystal near the surface of the melt and is provided partially inside a crucible, wherein the flow controller has a tubular portion which has an outer diameter smaller than the inner diameter of the crucible and extends substantially perpendicularly along the direction of downward flow of the carrier gas, a constricted diameter portion which constricts in diameter from the bottom end of the tubular portion and forms a bottom gap with the pulled monocrystal, and an engagement portion which projects out from the top of the tubular portion and forms a top gap at the outer circumference of the tubular portion of the flow controller by supporType: GrantFiled: April 20, 1995Date of Patent: November 12, 1996Assignees: Mitsubishi Materials Silicon Corporation, Mitsubishi Materials CorporationInventors: Kazuhiro Ikezawa, Hiroshi Yasuda, Akira Tanikawa, Hiroyuki Kojima, Koji Hosoda, Yoshifumi Kobayashi
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Patent number: 5476065Abstract: A monocrystal pulling apparatus according to the Czochralski technique, provided with a flow controller which guides a carrier gas supplied from the top of a pulling chamber to the surface of a melt of a material forming the monocrystal and exhausts the silicon oxide vaporizing from the surface of the melt to the outside of the pulling chamber and which surrounds the pulled monocrystal near the surface of the melt and is provided partially inside a crucible, wherein the flow controller has a tubular portion which has an outer diameter smaller than the inner diameter of the crucible and extends substantially perpendicularly along the direction of downward flow of the carrier gas, a constricted diameter portion which constricts in diameter from the bottom end of the tubular portion and forms a bottom gap with the pulled monocrystal, and an engagement portion which projects out from the top of the tubular portion and forms a top gap at the outer circumference of the tubular portion of the flow controller by suppType: GrantFiled: January 28, 1994Date of Patent: December 19, 1995Assignees: Mitsubishi Materials Silicon Corp., Mitsubishi Materials Corp.Inventors: Kazuhiro Ikezawa, Hiroshi Yasuda, Akira Tanikawa, Hiroyuki Kojima, Koji Hosoda, Yoshifumi Kobayashi
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Patent number: D719924Type: GrantFiled: September 24, 2013Date of Patent: December 23, 2014Assignee: Hokuriku Electric Industry Co., Ltd.Inventors: Satoshi Ueno, Seiji Maeda, Akira Tanikawa
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Patent number: D741819Type: GrantFiled: September 24, 2013Date of Patent: October 27, 2015Assignee: HOKURIKU ELECTRIC INDUSTRY CO., LTD.Inventors: Satoshi Ueno, Seiji Maeda, Akira Tanikawa