Abstract: A photopolymerizable composition comprises a polymerizable compound having at least one ethylenically unsaturated double bond and a photopolymerization initiator, wherein the photopolymerization initiator comprises an onium compound and an acridine derivative represented by the following general formula (I): ##STR1## wherein R.sup.1 represents an unsubstituted or substituted phenyl, alkyl or alkoxy group. The composition has high sensitivity to actinic rays over a wide range of wavelength extending from ultraviolet to visible region and thus can be used for preparing a lithographic printing plate, a resin-letterpress plate, a resist or photomask for making a printed board, a monochromatic and colored sheet for transfer or color-development and a color-developing sheet.

Abstract: A positive working light-sensitive composition comprising (a) a compound capable of generating acids through irradiation of actinic rays or radiant rays, (b) an organic base and (c) an alkali-soluble polymer. The composition is highly sensitive to light in wider wavelength region and highly resistant to aging. It can easily be produced and can hence be easily available.

Abstract: A photopolymerizable composition comprises a photopolymerizable ethylenically unsaturated compound having at least two terminal ethylene groups, a photopolymerization initiator and an organic polymer binder, wherein the photopolymerization initiator is an aromatic sulfonic acid salt of an onium compound. The composition has high sensitivity to actinic rays over a wide range of wavelength extending from ultraviolet to visible region and thus can be used for preparing a lithographic printing plate, a resin-letterpress plate, a resist or photomask for making a printed board, a monochromatic and colored sheet for transfer or color-development and a color-developing sheet.

Abstract: A positive type light-sensitive composition is disclosed, comprising an alkali-soluble high-molecular binder and at least one p-iminoquinonediazido-N-sulfonyl compound. This composition can be used for forming a resist for an IC board, a printing plate, a silver-free, image-forming material, etc.

Abstract: A positive working photosensitive composition comprising a polymeric compound insoluble in water but soluble in an aqueous alkaline solution and an aromatic sulfonic acid salt of an onium compound. The positive working photosensitive composition having high sensitivity and being capable of forming high-contrast images.

Abstract: A positively working resist material is disclosed, comprising a compound having at least one silyl ether group and capable of directly dissociating an Si-O-C bond upon irradiation with far ultraviolet rays, X-rays, an electron beam, or an ion beam. The resist material has high sensitivity to high energy radiation, excellent resistance to dry etching, and can be developed with an alkaline aqueous solution.

Abstract: A photopolymerizable composition containing an addition polymerizable compound having at least one ethylenically unsaturated double bond and a photopolymerization initiator is disclosed, wherein the photopolymerizable composition contains at least one compound represented by following general formula (I) or (II) as the photopolymerization initiator: ##STR1## wherein, R.sub.1, R.sub.2, R.sub.3, R.sub.4, and R.sub.5 each represents a hydrogen atom, an alkyl group, a substituted alkyl group, an aryl group, a substituted aryl group, an allyl group or a substituted allyl group, said R.sub.1 and R.sub.2 may combine with each other to form a ring together with the carbon atoms to which they are bonded; Y represents --O--, --S--, --Se--, --C(CH.sub.3).sub.2 -- or --CH.dbd.CH--; X.sub.1 represents an oxygen atom or a sulfur atom; R.sub.11, R.sub.12, R.sub.17, and R.sub.

Abstract: A photopolymerizable composition is disclosed, comprising a polymerizable compound having at least one ethylenic unsaturated double bond and a photopolymerization initiator, where the photopolymerization initiator is a combination of (A) acridine having a substituted or unsubstituted phenyl group at 9-position and (B) a heterocyclic compound having a thiol group connected to a 5- to 7-membered heterocyclic ring containing at least one nitrogen atom. The photopolymermizable composition is useful for preparation of lithographic plates and photoresists and as an adhesive, printing ink or coating material.

Abstract: A photo-polymerizable dispersion composition is disclosed. The dispersion composition includes a silver halide which is dispersed within a polyfunctional vinyl monomer and a high molecular binder. The binder is obtained by vinyl polymerization and contains a water insoluble polymer having amide groups and carboxyl group. The resulting dispersion composition can be utilized to form high polymer images having a good oleophilic property which exhibit less swelling even if developed in an aqueous developing solution.

Abstract: A photopolymerizable composition is described, comprising a polymerizable compound having an ethylenically unsaturated bond and a photopolymerization initiator represented by formula (I) ##STR1## wherein Z represents a non-metallic atomic group forming a nitrogen-containing heterocyclic ring; and R represents a substituted or unsubstituted aryl group or a substituted or unsubstituted heterocyclic ring. The photopolymerization initiator (I) greatly improves the sensitivity of the composition.

Abstract: A photopolymerizable composition is described, which comprises a polymerizable compound containing at least one ethylenically unsaturated double bond and a photopolymerization initiator wherein the photopolymerization initiator is a combination of a 3-keto-substituted cumarin compound and an active halogeno compound. This composition can be easily cured by irradiation with radiation and, therefore, is very useful in the preparation of light-sensitive materials.

Abstract: A photopolymerizable composition having an improved sensitivity, which comprises a polymerizable compound having an ethylenically unsaturated bond and a photopolymerization initiator, wherein said photopolymerization initiator comprises a compound represented by general formula I ##STR1## wherein R.sup.1 and R.sup.2 each represents a hydrogen atom, an alkyl group, a substituted alkyl group, an aryl group, a substituted aryl group, or an aralkyl group; X represents a substituent having a Hammett's value of not more than 0.7; and Y represents a hydrogen atom, an alkyl group, a substituted alkyl group, an aryl group, a substituted aryl group, an aralkyl group, an acyl group, or an alkoxycarbonyl group and a 1,3,5-triazine compound represented by general formula II ##STR2## wherein R.sup.3, R.sup.4, and R.sup.

Abstract: A photoconductive composition containing as essential components a photoconductive polymer and 1,4-bis(.beta.-cyano-.beta.-alkoxycarbonylvinyl)benzene represented by the following formula (I) ##STR1## wherein R represents a methyl group, an ethyl group, a propyl group or an isopropyl group, present in an amount of about 0.02 mol to 0.5 mol per mol of a .pi.-electron system-containing constitutional repeating unit present in the photoconductive polymer, and which forms a charge transfer complex with the photoconductive polymer through the .pi.-electron system having optical sensitivities in the ultraviolet to visible regions; and an electrophotographic light-sensitive material incorporating the aforesaid photoconductive composition in a layer on a support having a conductive surface.

Abstract: In a photopolymerizable composition comprising, as essential components, (A) a compound having at least one ethylenically unsaturated double bond capable of undergoing addition polymerization and (B) a photopolymerization initiator, the improvement which comprises that the photopolymerization initiator comprising a combination of (a) a 5-[(arenooxazol-2-ylidene)ethylidene]-2-thiohydantoin compound represented by the general formula (I) (a 5-[(substituted benzoxazol-2'-ylidene)ethylidene]-2-thiohydantoin compound) or (II) (a 5-[substituted naphthol(1,2-D)oxazol-2-ylidene)ethylidene]-2-thiohydantoin compound) and (b) a 2,4,6-substituted-1,3,5-triazine compound represented by the formula (III): ##STR1## wherein X represents a hydrogen atom, an alkyl group, a substituted alkyl group, an alkoxy group, an aryl group, a substituted aryl group, an aryloxy group, an aralkyl group or a halogen atom; R.sup.1, R.sup.2 and R.sup.

Abstract: A photopolymerizable composition comprising, as essential components,(1) a polymerizable compound having at least one ethylenically unsaturated double bond and(2) a photopolymerization initiator, the photopolymerization initiator being a combination of (a) an aromatic carbonyl compound and (b) a p-dialkylamino aromatic carbonyl compound.

Abstract: A photopolymerizable composition comprising (1) an addition-polymerizable compound having at least one ethylenically unsaturated double bond and (2) a photopolymerization initiator as essential components, the improvement which comprises the photopolymerization initiator comprising a combination of (a) a 5-isoxazolone represented by the general formula (1) and (b) an aromatic carbonyl compound, a dialkylamino aromatic carbonyl compound represented by any of formulae (2) to (5), a compound represented by the formula (6) or 2-(.alpha.-thioxophenetylidene)-3-methylnaphtho[1,2-d][1,3]-thiazoline: ##STR1## wherein in the formula (1), A.sup.1 and A.sup.2 each represent an alkyl group, an alkylcarbonyl group, an alkoxycarbonyl group, an aryl group, an arylcarbonyl group or a hydrogen atom and may be the same or different; in the formulae (2) to (5) R.sup.1 and R.sup.2 each represent an alkyl group and may be the same or different, R.sup.

Abstract: A photopolymerizable composition is described comprising (1) an addition-polymerizable compound having at least one ethylenically unsaturated double bond, (2) a photopolymerization initiator, and (3) a post-exposure polymerization inhibitor compound including a thioureylene group, such as a compound selected from the group consisting of thiourea and thiourea derivatives represented by the general formula (I), thiosemicarbazide and thiosemicarbazide derivatives represented by the general formula (II), and thiosemicarbazone derivatives represented by the general formula (III): ##STR1## wherein: R.sup.1 and R.sup.2, which may be the same or different each represents a hydrogen atom, an alkyl group having from 1 to 6 carbon atoms, a substituted alkyl group having from 1 to 6 carbon atoms, a phenyl group, a naphthyl group, a substituted phenyl group or a monovalent group derived from an O-, S- or N-containing 5- or 6-member heterocyclic nucleus,R.sup.

Abstract: In a photopolymerizable composition comprising (1) an addition-polymerizable compound having at least one ethylenically unsaturated double bond and (2) a photopolymerization initiator as essential components, the improvement which comprises that said photopolymerization initiator is a combination of (a) p-dialkylamino aromatic carbonyl compounds represented by the general formulae (1) to (4), (b) 5-isoxazolones represented by the general formula (5) and (c) 2,4,6-substituted-1,3,5-triazines represented by the general formula (6): ##STR1## where R.sup.1, R.sup.2 and R.sup.3 each represents an alkyl group or a substituted alkyl group, which may be the same or different from one another, X represents a substituent having a Hammett's .sigma. value in the range from -0.9 to 0.7, m represents 1 or 2, A.sup.1 and A.sup.

Abstract: A photopolymerizable composition comprising, as essential components, (A) at least one compound having one or more addition polymerizable ethylenically unsaturated double bonds and (B) a photopolymerization initiator composition comprising (i) a combination of at least one compound (a) and at least one compound (b), (ii) a combination of at least one compound (a) and at least one compound (c) or (iii) a combination of at least one compound (a), at least one compound (b) and at least one compound (c);Wherein compound (a) is a benzoylmethylenebenzothiazolylidenethiazolidone compound selected from the group consisting of 2-benzoylmethylene-5-benzothiazolylidenethiazolidin-4-one and the substituted derivatives thereof represented by the following general formula (I): ##STR1## wherein R.sup.1, R.sup.2 and X are as defined in the specification; COMPOUND (B) IS A TERTIARY OR POLYAMINE COMPOUND SELECTED FROM THE GROUP CONSISTING OF TERTIARY AMINES REPRESENTED BY THE FOLLOWING GENERAL FORMULA (II): ##STR2## wherein R.

Abstract: Light sensitive high molecular weight compounds containing furanacrylate groups in the molecule, which can be suitably used for the preparation of photopolymerizable compositions used in light sensitive materials such as, e.g., a photoresist, a method for forming images using the high molecular weight compounds which undergo a change in solubility or are rendered in soluble upon irradiation and a method for preparing the high molecular weight compounds containing the novel structure by homo- or copolymerization of a monomeric vinyl ether or epoxy compound containing a furanacrylate group in the molecule.