Patents by Inventor Akira Utsunomiya

Akira Utsunomiya has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6692665
    Abstract: The invention provides a lithium manganese oxide spinel suited as a cathode active material for lithium ion secondary batteries showing excellent high-temperature cycling behavior. The lithium manganese oxide is represented by the following general formula (1): Li1+&agr;Mn2−&agr;−yMyO4−&dgr; wherein O≦&agr;≦0.5, 0.005≦y≦0.5, −0.1≦&dgr;÷0.1, and M represents a metal element other than Li and Mn, and which shows the ratio of a main peak intensity at 5±40 ppm to a main peak intensity at 525+40 ppm (I0ppm/I500ppm), each intensity being obtained by 7Li-NMR measurement according to the following measuring method, falling within the following range: I0ppm/I500ppm≦0.65y+0.02.
    Type: Grant
    Filed: April 30, 2001
    Date of Patent: February 17, 2004
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Koji Shima, Akira Utsunomiya, Yasushi Tsurita
  • Publication number: 20020009645
    Abstract: The invention provides a lithium manganese oxide spinel suited as a cathode active material for lithium ion secondary batteries showing excellent high-temperature cycling behavior.
    Type: Application
    Filed: April 30, 2001
    Publication date: January 24, 2002
    Applicant: MITSUBISHI CHEMICAL CORPORATION
    Inventors: Koji Shima, Akira Utsunomiya, Yasushi Tsurita
  • Patent number: 6225245
    Abstract: A synthetic quartz powder obtained by calcining a powder of silica gel, characterized in that white devitrification spots having sizes of larger than 20 &mgr;m in diameter formed in an ingot obtained by vacuum melting the synthetic quartz powder at a temperature of from 1780 to 1800° C. to form an ingot, followed by maintaining the ingot at a temperature of 1630° C. for 5 hours, are at most 10 spots/50 g.
    Type: Grant
    Filed: November 19, 1997
    Date of Patent: May 1, 2001
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Akira Utsunomiya, Yoshio Katsuro, Akihiro Takazawa, Takashi Moriyama
  • Patent number: 6131409
    Abstract: A method for producing a high purity synthetic quartz powder, characterized by using a tetramethoxysilane having a trimethoxymethylsilane content of at most 0.3 wt %, and converting it to a synthetic quartz by a sol-gel method.
    Type: Grant
    Filed: November 26, 1997
    Date of Patent: October 17, 2000
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Yoshio Katsuro, Takanobu Katsuki, Akihiro Takazawa, Hanako Kato, Akira Utsunomiya
  • Patent number: 6110852
    Abstract: A process for producing synthetic quartz powder which comprises calcining silica gel powder to produce a synthetic quartz glass powder, wherein dry air is used in the calcining process at least in the process of cooling from 800.degree. C. to 200.degree. C. This process enables efficient production of synthetic quartz glass powder on an industrial scale.
    Type: Grant
    Filed: November 4, 1997
    Date of Patent: August 29, 2000
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Yoshio Katsuro, Hozumi Endo, Akira Utsunomiya, Hiroaki Nagai, Toshifumi Yoshikawa, Shoji Oishi, Takashi Yamaguchi
  • Patent number: 6071838
    Abstract: A synthetic quartz glass powder obtained by sol-gel method, wherein the number of black spot particles is at most 5 particles per 50 g, provides a high quality quartz glass shaped product with low bubble content when fused.
    Type: Grant
    Filed: November 4, 1997
    Date of Patent: June 6, 2000
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Hozumi Endo, Yoshio Katsuro, Akira Utsunomiya, Masaru Shimoyama
  • Patent number: 5641884
    Abstract: A spiro-naphtho-oxaine compound having a specific substituent providing red color development which has been unknown in the past, and photosensitive materials containing the compound. Since the compound is superior in fatigue resistance and has a sufficient red color developing density, it is used in plastic articles, optical filters, recording materials, textiles, decoration materials, and toys, which change in color by light irradiation to develop a magenta color.
    Type: Grant
    Filed: December 27, 1994
    Date of Patent: June 24, 1997
    Assignee: Hodogaya Chemical Co., Ltd.
    Inventors: Akira Utsunomiya, Shinichi Sato, Hiroyoshi Yamaga, Nobuo Suzuki
  • Patent number: 5604163
    Abstract: A synthetic silica glass powder obtained by calcining a silica gel powder obtained by hydrolysis of a tetraalkoxysilane, said synthetic silica glass powder containing from 1.times.10.sup.-1 to 1.times.10.sup.-4 ppm of boron and having an internal silanol group concentration of at most 150 ppm and an isolated silanol group concentration of at most 5 ppm.
    Type: Grant
    Filed: July 10, 1995
    Date of Patent: February 18, 1997
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Hozumi Endo, Kazumi Kimura, Akira Utsunomiya
  • Patent number: 5516350
    Abstract: Synthetic quartz glass powder is produced by (a) hydrolyzing an alkoxysilane to form a gel, (b) finely dividing the gel and then drying, or drying the gel and then finely dividing, and (c) calcining the obtained powder, the powder being maintained under an atmosphere with an oxygen concentration of not less than 30 vol % during at least a part of the calcining period at a temperature of not lower than 1,000.degree. C.
    Type: Grant
    Filed: June 14, 1994
    Date of Patent: May 14, 1996
    Assignee: Kimmon Manufacturing Co., Ltd. and Mitsubishi Chemical Corporation
    Inventors: Hajime Onoda, Hiroshi Ota, Kazumi Kimura, Akira Utsunomiya, Masaru Shimoyama
  • Patent number: 5145510
    Abstract: A silica glass powder suitable for the production of a silica glass body product of a low silanol content, which is obtained by baking a dried silica gel powder obtained by a sol-gel method, at a temperature of from 1,000.degree. to 1,400.degree. C., wherein during the baking period, the silica gel powder is baked in a gas atmosphere containing from 10 to 100% by volume of steam for at least 5 hours.
    Type: Grant
    Filed: September 4, 1991
    Date of Patent: September 8, 1992
    Assignee: Mitsubishi Kasei Corporation
    Inventors: Shun Saito, Kazumi Kimura, Akira Utsunomiya
  • Patent number: 5114881
    Abstract: A process for producing a ceramic preform, which comprises mixing an alkoxysilane and fine silica powder, molding the mixture, followed by heating for de-alcoholysis.
    Type: Grant
    Filed: April 15, 1991
    Date of Patent: May 19, 1992
    Assignee: Mitsubishi Kasei Corporation
    Inventors: Tsugio Kaneko, Tsuneo Kimura, Michihiro Ikeda, Akira Utsunomiya, Yuka Ohno
  • Patent number: 4797265
    Abstract: A process for the production of highly concentrated phosphoric acid, comprises improvements in digesting phosphate rock with a mixed acid consisting essentially of sulfuric acid and phosphoric acid to obtain a slurry comprising phosphoric acid and hemihydrate (CaSO.sub.4.1/2H.sub.2 O), then filtering the slurry, taking out highly concentrated phosphoric acid as product acid and subsequently hydrating the hemihydrate to obtain gypsum (dihydrate: CaSO.sub.4.2H.sub.2 O).
    Type: Grant
    Filed: March 12, 1987
    Date of Patent: January 10, 1989
    Assignee: Mitsui Toatsu Chemicals, Inc.
    Inventors: Tadashi Inoue, Akira Ohkoba, Kunio Sakashita, Akira Utsunomiya, Takeki Shinozaki, Minoru Ieda