Abstract: A tetrakis(ether-substituted formylphenyl) expressed by General Formula (1): wherein R1 represents an alkyl group with 1 to 8 carbon atoms or alkoxyl group with 1 to 8 carbon atoms, or aromatic hydrocarbon group or saturated hydrocarbon group with 1 to 8 carbon atoms having an aromatic hydrocarbon group, n represents 0 or an integer of 1 to 3, R2 represents a divalent monocyclic or fused-ring aromatic hydrocarbon group with 6 to 15 carbon atoms or divalent aliphatic hydrocarbon group with 1 to 8 carbon atoms that may have a monocyclic or fused-ring aromatic hydrocarbon group with 6 to 15 carbon atoms, R3 represents a hydrogen atom or alkyl group with 1 to 6 carbon atoms, A represents a tetravalent carbon atom group or tetravalent saturated hydrocarbon group with 2 or more carbon atoms, where, if A is a tetravalent saturated hydrocarbon group with 2 or more carbon atoms, the two carbon atoms in the A group are bonded with two phenyl groups, respectively.

Abstract: A tetrakis(ether-substituted formylphenyl) expressed by General Formula (1): wherein R1 represents an alkyl group with 1 to 8 carbon atoms or alkoxyl group with 1 to 8 carbon atoms, or aromatic hydrocarbon group or saturated hydrocarbon group with 1 to 8 carbon atoms having an aromatic hydrocarbon group, n represents 0 or an integer of 1 to 3, R2 represents a divalent monocyclic or fused-ring aromatic hydrocarbon group with 6 to 15 carbon atoms or divalent aliphatic hydrocarbon group with 1 to 8 carbon atoms that may have a monocyclic or fused-ring aromatic hydrocarbon group with 6 to 15 carbon atoms, R3 represents a hydrogen atom or alkyl group with 1 to 6 carbon atoms, A represents a tetravalent carbon atom group or tetravalent saturated hydrocarbon group with 2 or more carbon atoms, where, if A is a tetravalent saturated hydrocarbon group with 2 or more carbon atoms, the two carbon atoms in the A group are bonded with two phenyl groups, respectively.

Abstract: A trisphenol compound is expressed by formula (1), wherein R represents an alkyl group or alkoxyl group with 1 to 8 carbon atoms, phenyl group or hydroxyl group; R1 represents an alkyl group or alkoxyl group with 1 to 8 carbon atoms, or phenyl group; R2 represents an alkyl group or alkoxyl group with 1 to 8 carbon atoms; R3 represents a hydrogen atom or alkyl group with 1 to 8 carbon atoms; a represents 0, 1, 2, or 3; b represents 1 or 2; and c and d represent 0, 1, 2, 3, or 4; where the sum of b and c is 5 or less; R's may be either the same or different when a is 2 or more; R1's may be either the same or different when c is 2 or more; and R2's may be either the same or different when d is 2 or more.

Abstract: A bis(formylphenyl) compound expressed by general formula (2) is useful as a photo-sensitive resist material:

Abstract: A bis(formylphenyl) compound expressed by general formula (2) is useful as a photo-sensitive resist material:

Abstract: A trisphenol compound is expressed by formula (1), wherein R represents an alkyl group or alkoxyl group with 1 to 8 carbon atoms, phenyl group or hydroxyl group; R1 represents an alkyl group or alkoxyl group with 1 to 8 carbon atoms, or phenyl group; R2 represents an alkyl group or alkoxyl group with 1 to 8 carbon atoms; R3 represents a hydrogen atom or alkyl group with 1 to 8 carbon atoms; a represents 0, 1, 2, or 3; b represents 1 or 2; and c and d represent 0, 1, 2, 3, or 4; where the sum of b and c is 5 or less; R's may be either the same or different when a is 2 or more; R1's may be either the same or different when c is 2 or more; and R2's may be either the same or different when d is 2 or more.

Abstract: Disclosed are tetrakis(ether-substituted formylphenyl) expressed by General Formula (1), as well as polynuclear polyphenol derived from such tetrakis(ether-substituted formylphenyl): (In the formula, R1 represents an alkyl group with 1 to 8 carbon atoms or alkoxyl group with 1 to 8 carbon atoms, or aromatic hydrocarbon group or saturated hydrocarbon group with 1 to 8 carbon atoms having an aromatic hydrocarbon group, n represents 0 or an integer of 1 to 3, R2 represents a divalent monocyclic or fused-ring aromatic hydrocarbon group with 6 to 15 carbon atoms or divalent aliphatic hydrocarbon group with 1 to 8 carbon atoms that may have a monocyclic or fused-ring aromatic hydrocarbon group with 6 to 15 carbon atoms, R3 represents a hydrogen atom or alkyl group with 1 to 6 carbon atoms, A represents a tetravalent carbon atom group or tetravalent saturated hydrocarbon group with 2 or more carbon atoms, where, if A is a tetravalent saturated hydrocarbon group with 2 or more carbon atoms, the two carbon atoms i

Abstract: A bis(formylphenyl) compound expressed by general formula (1) is manufactured by, for example, using a corresponding bis(hydroxy-formylphenyl) compound as the direct material and causing it to react with a halogenated alkoxycarbonyl hydrocarbon in the presence of a base according to a known phenylether manufacturing method.

Abstract: Manufacture a novel bis(formylphenyl)alkane according to General Formula (1), as well as a novel polynuclear phenol derived therefrom, by causing a bis(hydroxymethyl-hydroxyphenyl)alkane to react with hexamethylene tetramine in the presence of an acid and hydrolyzing the reaction product, and then using the obtained bis(hydroxy-formylphenyl)alkane as a direct material and causing this material to react with halogenated alkoxycarbonyl hydrocarbon in the presence of a base.

Abstract: A new tris(formylphenyl) of the following general formula and polynuclear phenol derived therefrom:

Abstract: Produce the target substance, or a polynuclear poly(formylphenol) expressed by General Formula (2), in an industrial setting with ease and at high purity by causing a polynuclear poly(hydroxymethylphenol) or polynuclear poly(alkoxymethylphenol) to react with hexamethylene tetramine in the presence of an acid and then hydrolyzing the obtained reaction product.

Abstract: A novel tris(formylphenyl) according to the following general formula and polynuclear phenol derived therefrom, which are useful as a material for heat resistant materials, material for photosensitive resist compositions, epoxy resin material or hardener, developer or anti-fade agent for thermosensitive recording materials, or sterilizer, fungicide, antioxidant, etc: In the formula, Y represents a hydrogen atom or —R2COOR3 group, R2 represents a monocyclic or condensed cyclic aromatic hydrocarbon group with a carbon atom number of 6 to 15 or an aliphatic hydrocarbon group with a carbon atom number of 1 to 8 that may have in its main chain a monocyclic or condensed cyclic aromatic hydrocarbon group with a carbon atom number of 6 to 15, and R3 represents a hydrogen atom or alkyl group with a carbon atom number of 1 to 6. R1s may be the same or different and respectively represent a hydrogen atom, alkyl group with a carbon atom number of 1 to 8 or alkoxyl group with a carbon atom number of 1 to 8.

Abstract: Manufacture a novel bis(formylphenyl)alkane according to General Formula (1), as well as a novel polynuclear phenol derived therefrom, by causing a bis(hydroxymethyl-hydroxyphenyl)alkane to react with hexamethylene tetramine in the presence of an acid and hydrolyzing the reaction product, and then using the obtained bis(hydroxy-formylphenyl)alkane as a direct material and causing this material to react with halogenated alkoxycarbonyl hydrocarbon in the presence of a base.

Abstract: Provide a new bis-(hydroxybenzaldehyde) compound, as well as a new polynuclear polyphenol compound derived therefrom, suitable for use as component materials for photosensitive resist compositions, component materials and hardeners for epoxy resins, developers and anti-fading agents used in thermosensitive recording materials, bactericides, fungicides, antioxidants and other functional chemical products or component materials thereof, wherein such bis-(hydroxybenzaldehyde) compound is produced by reacting in the presence of trihalogenated acetic acid catalyst or phosphoric acid catalyst a 2,6-di(hydroxymethyl)-4-alkylphenol with a hydroxybenzaldehyde expressed by general formula (14).

Abstract: Produce the target substance, or a polynuclear poly(formylphenol) expressed by General Formula (2), in an industrial setting with ease and at high purity by causing a polynuclear poly(hydroxymethylphenol) or polynuclear poly(alkoxymethylphenol) to react with hexamethylene tetramine in the presence of an acid and then hydrolyzing the obtained reaction product.

Abstract: Provide a new bis-(hydroxybenzaldehyde) compound, as well as a new polynuclear polyphenol compound derived therefrom, suitable for use as component materials for photosensitive resist compositions, component materials and hardeners for epoxy resins, developers and anti-fading agents used in thermosensitive recording materials, bactericides, fungicides, antioxidants and other functional chemical products or component materials thereof, wherein such bis-(hydroxybenzaldehyde) compound is produced by reacting in the presence of trihalogenated acetic acid catalyst or phosphoric acid catalyst a 2,6-di(hydroxymethyl)-4-alkylphenol with a hydroxybenzaldehyde expressed by general formula (14).

Abstract: A new 1,3-bis(3-formyl-4-hydroxyphenyl)adamantane, which provides a material offering excellent properties such as heat resistance and mechanical strength for use as an intermediate material for adamantanebisphenol derivatives or use in photosensitive resist materials, epoxy resins and other synthetic resins, thermosensitive recording materials, and the like, can be obtained through an industrial process in an easy manner at a good yield and high purity by producing a Schiff base from a 1,3-bis(4-hydroxyphenyl)adamantane by causing it to react with a hexamethylenetetramine or other substance in the presence of an acid, and then hydrolyzing the obtained Schiff base using an acid. A new polynuclear polyphenol is also provided that may be derived from the same.

Abstract: A new 1,3-bis(3-formyl-4-hydroxyphenyl)adamantane, which provides a material offering excellent properties such as heat resistance and mechanical strength for use as an intermediate material for adamantanebisphenol derivatives or use in photosensitive resist materials, epoxy resins and other synthetic resins, thermosensitive recording materials, and the like, can be obtained through an industrial process in an easy manner at a good yield and high purity by producing a Schiff base from a 1,3-bis(4-hydroxyphenyl)adamantane by causing it to react with a hexamethylenetetramine or other substance in the presence of an acid, and then hydrolyzing the obtained Schiff base using an acid. A new polynuclear polyphenol is also provided that may be derived from the same.

Abstract: A polynuclear polyphenol compound is constituted by, as a main skeleton, a 4,4?-methylene bis phenol structure where tris phenol skeletons of tris phenyl methane type are mutually bonded by methylene groups, wherein the reactivity of two hydroxyl groups bonded to the central skeleton of 4,4?-methylene bis phenol is significantly different from the reactivity of hydroxyl groups respectively bonded to the four phenyl groups of the two diphenyl methyl substituted groups.

Abstract: Produce the target substance, or a polynuclear poly(formylphenol) expressed by General Formula (2), in an industrial setting with ease and at high purity by causing a polynuclear poly(hydroxymethylphenol) or polynuclear poly(alkoxymethylphenol) to react with hexamethylene tetramine in the presence of an acid and then hydrolyzing the obtained reaction product.