Patents by Inventor Akito HIRO

Akito HIRO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210311391
    Abstract: The present photosensitive resin composition includes a polymer (A) having a structural unit (a1) represented by a formula (a1), a structural unit (a2) represented by a formula (a2), and a structural unit (a3) represented by a formula (a3) and a photoacid generator (B). In the formulae (a1) to (a3), R11, R21, and R31 each independently represent a hydrogen atom, a substituted or non-substituted alkyl group having 1 to 10 carbon atom or a halogen atom; R12 and R32 each independently represent a divalent organic group; R22 represents a substituted or non-substituted alkanediyl group having 2 to 10 carbon atoms; R13 represents an acid dissociable group having an alicyclic structure; R23 represents an alkyl group having 1 to 10 carbon atoms; R33 represents a hydroxyaryl group; and 1, m and n each independently represent an integer from 0 to 10.
    Type: Application
    Filed: July 1, 2019
    Publication date: October 7, 2021
    Applicant: JSR CORPORATION
    Inventors: Takuhiro TANIGUCHI, Naoki NISHIGUCHI, Tomoyuki MATSUMOTO, Hirokazu SAKAKIBARA, Akito HIRO, Hisanori AKIMARU
  • Publication number: 20130012618
    Abstract: Provided are a resin composition capable of forming a cured film excellent in elongation properties; a polymer suitable as a component contained in the composition; a cured film formed from the composition; and an electronic part including the cured film. The resin composition includes (A) a polymer containing a structural unit represented by the formula (a1) and a structural unit represented by the formula (a2); and (F) a solvent, wherein in the formula (a1), R1s are each independently a hydrogen atom or hydroxyl group, provided that at least one R1 is hydroxyl group; and R2 is a hydrogen atom or a C1-4 alkyl group; and in the formula (a2), R3s are each independently a group having a cationic polymerizable group, or a hydrogen atom, provided that at least one R3 is a group having a cationic polymerizable group; and R4 is a hydrogen atom or a C1-4 alkyl group.
    Type: Application
    Filed: July 3, 2012
    Publication date: January 10, 2013
    Applicant: JSR Corporation
    Inventors: Akito HIRO, Masaaki HANAMURA, Futoshi YAMATO, Yuuji SHIMOYAMA, Jun MUKAWA, Hikaru MIZUNO, Akari SAKO, Tomohiko SAKURAI
  • Publication number: 20120296053
    Abstract: A photosensitive composition capable of forming a cured film having small internal stress; a cured film formed from the composition; and an electronic part including the cured film. The photosensitive composition includes: an alkali soluble resin (A), which includes at least 80% by mass of a novolak resin; a photosensitive compound (B); and a crosslinking agent (C), which includes at least a compound represented by the following formula (C1): wherein R1 is an alkyl group having 1 to 6 carbon atoms or the like; R2 is hydroxyl group or the like; R3 is a (a+1)valent hydrocarbon group or the like; R5 is a (c+1)valent hydrocarbon group or the like; R4 is a single bond or the like; a and c are each independently integers of 1 to 3, wherein the sum a+c is an integer of 3 to 6; and b is an integer of 0 or more.
    Type: Application
    Filed: April 18, 2012
    Publication date: November 22, 2012
    Applicant: JSR CORPORATION
    Inventors: Masaaki HANAMURA, Futoshi YAMATO, Akito HIRO, Akari SAKO, Jun MUKAWA