Patents by Inventor Akitoshi Kumagae
Akitoshi Kumagae has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 6680462Abstract: Disclosed is an apparatus for heating a target substrate by means of light irradiation. The heating apparatus includes a substrate support section for supporting the target substrate, an irradiating light generating section for irradiating the light irradiating regions of the target substrate supported by the substrate support section, and a light irradiating region changing section for changing the light irradiating regions of the target substrate irradiated with the light generated from the irradiating light generation section.Type: GrantFiled: October 29, 2002Date of Patent: January 20, 2004Assignee: Kabushiki Kaisha ToshibaInventors: Hideaki Sakurai, Shinichi Ito, Iwao Higashikawa, Akitoshi Kumagae
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Publication number: 20030052119Abstract: Disclosed is a heat treating method for heating a target substrate by means of light irradiation, in which a light irradiation treatment is applied to the target substrate a plurality of times such that adjacent light irradiated regions on the target substrate partially overlap with each other and that the adjacent light irradiated regions do not overlap with each other in the light irradiating periods.Type: ApplicationFiled: October 29, 2002Publication date: March 20, 2003Applicant: Kabushiki Kaisha ToshibaInventors: Hideaki Sakurai, Shinichi Ito, Iwao Higashikawa, Akitoshi Kumagae
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Patent number: 6495807Abstract: Disclosed is a heat treating method for heating a target substrate by means of light irradiation, in which light irradiation treatment is applied to the target substrate such that the light irradiation regions of the target substrate do not overlap with each other, the light irradiation treatment being performed by using an irradiating light adjusted such that the distribution of the light intensity within the light irradiation region of the target substrate is rendered uniform.Type: GrantFiled: October 25, 2001Date of Patent: December 17, 2002Assignee: Kabushiki Kaisha ToshibaInventors: Hideaki Sakurai, Shinichi Ito, Iwao Higashikawa, Akitoshi Kumagae
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Patent number: 6483083Abstract: A substrate to be processed on which a thin film is formed is supported by a support member. The substrate to be processed is heated by a heating section. The surface temperature is measured by a radiation thermometer, and the heating temperature of the heating section is controlled by a control section, in response to the temperature measured by the radiation thermometer. Further, a blackbody is provided at a position optically symmetrical to the radiation thermometer with respect to the surface of the thin film. The blackbody is set at a constant temperature. The blackbody cuts stray light (noise light) which enters into the radiation thermometer.Type: GrantFiled: June 11, 2001Date of Patent: November 19, 2002Assignee: Kabushiki Kaisha ToshibaInventors: Hideaki Sakurai, Akitoshi Kumagae, Iwao Higashikawa, Shinichi Ito, Tsunetoshi Arikado, Katsuya Okumura
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Publication number: 20020063123Abstract: Disclosed is a heat treating method for heating a target substrate by means of light irradiation, in which a light irradiation treatment is applied to the target substrate a plurality of times such that adjacent light irradiated regions on the target substrate partially overlap with each other and that the adjacent light irradiated regions do not overlap with each other in the light irradiating periods.Type: ApplicationFiled: October 25, 2001Publication date: May 30, 2002Applicant: Kabushiki Kaisha ToshibaInventors: Hideaki Sakurai, Shinichi Ito, Iwao Higashikawa, Akitoshi Kumagae
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Patent number: 6333493Abstract: Disclosed is a heat treating method for heating a target substrate by means of light irradiation, in which a light irradiation treatment is applied to the target substrate a plurality of times such that adjacent light irradiated regions on the target substrate partially overlap with each other and that the adjacent light irradiated regions do not overlap with each other in the light irradiating periods.Type: GrantFiled: September 20, 2000Date of Patent: December 25, 2001Assignee: Kabushiki Kaisha ToshibaInventors: Hideaki Sakurai, Shinichi Ito, Iwao Higashikawa, Akitoshi Kumagae
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Publication number: 20010027971Abstract: A substrate to be processed on which a thin film is formed is supported by a support member. The substrate to be processed is heated by a heating section. The surface temperature is measured by a radiation thermometer, and the heating temperature of the heating section is controlled by a control section, in response to the temperature measured by the radiation thermometer. Further, a blackbody is provided at a position optically symmetrical to the radiation thermometer with respect to the surface of the thin film. The blackbody is set at a constant temperature. The blackbody cuts stray light (noise light) which enters into the radiation thermometer.Type: ApplicationFiled: June 11, 2001Publication date: October 11, 2001Applicant: Kabushiki Kaisha ToshibaInventors: Hideaki Sakurai, Akitoshi Kumagae, Iwao Higashikawa, Shinichi Ito, Tsunetoshi Arikado, Katsuya Okumura
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Patent number: 6265696Abstract: A substrate to be processed on which a thin film is formed is supported by a support member. The substrate to be processed is heated by a heating section. The surface temperature is measured by a radiation thermometer, and the heating temperature of the heating section is controlled by a control section, in response to the temperature measured by the radiation thermometer. Further, a blackbody is provided at a position optically symmetrical to the radiation thermometer with respect to the surface of the thin film. The blackbody is set at a constant temperature. The blackbody cuts stray light (noise light) which enters into the radiation thermometer.Type: GrantFiled: August 11, 1999Date of Patent: July 24, 2001Assignee: Kabushiki Kaisha ToshibaInventors: Hideaki Sakurai, Akitoshi Kumagae, Iwao Higashikawa, Shinichi Ito, Tsunetoshi Arikado, Katsuya Okumura
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Patent number: 5969428Abstract: An alignment mark formed on a surface of substrate for aligning with a mask through an irradiation of alignment light, which comprises a step formed with a concave portion and a convex portion and a metallic film deposited along the concave portion and the convex portion. A light absorption layer is formed over at least one of the concave portion and the convex portion reflecting the step, the light absorption layer lying over the concave portion having a different thickness from that of the light absorption layer lying over the convex portion when the light absorption layer is formed over both the concave portion and the convex portion, the light absorption layer comprising a material capable of absorbing at least a portion of wavelength region of the alignment light. The light absorption layer is desirably formed in a larger thickness on the convex portion of the step as compared with that on the concave portion.Type: GrantFiled: May 29, 1998Date of Patent: October 19, 1999Assignee: Kabushiki Kaisha ToshibaInventors: Hiroshi Nomura, Iwao Higashikawa, Akitoshi Kumagae
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Patent number: 5847468Abstract: An alignment mark formed on a surface of substrate for aligning with a mask through an irradiation of alignment light, which comprises a step formed with a concave portion and a convex portion and a metallic film deposited along the concave portion and the convex portion. A light absorption layer is formed over at least one of the concave portion and the convex portion reflecting the step, the light absorption layer lying over the concave portion having a different thickness from that of the light absorption layer lying over the convex portion when the light absorption layer is formed over both the concave portion and the convex portion, the light absorption layer comprising a material capable of absorbing at least a portion of wavelength region of the alignment light. The light absorption layer is desirably formed in a larger thickness on the convex portion of the step as compared with that on the concave portion.Type: GrantFiled: June 12, 1997Date of Patent: December 8, 1998Assignee: Kabushiki Kaisha ToshibaInventors: Hiroshi Nomura, Iwao Higashikawa, Akitoshi Kumagae
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Patent number: 5326675Abstract: A radiation-sensitive layer comprising as a main component a radiation-sensitive composition containing a compound capable of generating an acid when exposed to a chemical radiation and a compound having at least one linkage decomposable by an acid is formed on a substrate. An acidic coating layer is formed on the radiation-sensitive layer. The radiation-sensitive layer and the acidic coating layer are pattern-exposed to a chemical radiation. The radiation-sensitive layer and the acidic coating layer are baked and developed by using an aqueous alkaline solution to obtain a pattern comprising lines and spaces, each having a predetermined width. A fine pattern of a rectangular sectional shape can be formed without producing eaves caused by a surface inhibition layer layer, which is produced on the film surface.Type: GrantFiled: December 9, 1992Date of Patent: July 5, 1994Assignee: Kabushiki Kaisha ToshibaInventors: Hirokazu Niki, Rumiko Hayase, Naohiko Oyasato, Yasunobu Onishi, Akitoshi Kumagae, Kazuo Sato, Masataka Miyamura, Yoshihito Kobayashi
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Patent number: 5169740Abstract: Resist containing novolak prepared by condensating halogenated phenol represented by the following formula (III) and one or more phenol derivatives selected from the group consisting of cresol, xylenol, tet-butylphenol and propenylphenol, with a carbonyl compound ##STR1## wherein R.sub.3 is an halogen atom selected from the group consisting of F, Cl, and Br. If the resist is used as a positive-type one, it further contains a photo-sensitive agent, and R.sub.3 in the formula (III) is either F or Br. If the resist is used as a negative-type one, it further contains a photosensitive agent and/or a sensitizer, and R.sub.3 in the formula (III) is either Cl or Br.Type: GrantFiled: March 29, 1990Date of Patent: December 8, 1992Assignee: Kabushiki Kaisha ToshibaInventors: Toru Ushirogouchi, Tsukasa Tada, Akitoshi Kumagae
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Patent number: RE35821Abstract: A radiation-sensitive layer comprising as a main component a radiation-sensitive composition containing a compound capable of generating an acid when exposed to a chemical radiation and a compound having at least one linkage decomposable by an acid is formed on a substrate. An acidic coating layer is formed on the radiation-sensitive layer. The radiation-sensitive layer and the acidic coating layer are pattern-exposed to a chemical radiation. The radiation-sensitive layer and the acidic coating layer are baked and developed by using an aqueous alkaline solution to obtain a pattern comprising lines and spaces, each having a predetermined width. A fine pattern of a rectangular sectional shape can be formed without producing eaves caused by a surface inhibition layer layer, which is produced on the film surface.Type: GrantFiled: April 29, 1996Date of Patent: June 9, 1998Assignee: Kabushiki Kaisha ToshibaInventors: Hirokazu Niki, Rumiko Hayase, Naohiko Oyasato, Yasunobu Onishi, Akitoshi Kumagae, Kazuo Sato, Masataka Miyamura, Yoshihito Kobayashi