Abstract: Systems, methods, and computer programs for providing a force opposed to inertial forces present on a patterning device during imaging operations of a photolithographic system include a means for providing coarse positioning of a pusher in combination with a short-stroke actuator and pushing tip configured to engage an edge of the patterning device. In an embodiment, the coarse positioning is provided by providing a guide along which the short-stroke actuator may be translated, and a locking mechanism is configured to selectively hold the actuator in place relative to the patterning device. In an embodiment, the coarse positioning is provided by a long-stroke actuator, for example an eccentric linear drive actuator.

Abstract: Apparatus for and method of removing a contaminant from a working surface of a lithography support such as a reticle or wafer stage in an EUV or a DUV photolithography system in which a cleaning substrate provided with a coating made a selected material and configuration is pressed against the working surface so that the contaminant is transferred from the working surface to the coating.