Patents by Inventor Alaaeddin Alsbaiee

Alaaeddin Alsbaiee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11578159
    Abstract: The invention relates to the use of low levels of glycols and short chain diols to control air void formation in any polymerization reaction having carbonyl-containing monomers, and preferably carboxylic acid ester monomers, at a level of at least 10% of total monomer, where the monomer has a peak polymerization exotherm temperature of greater than the boiling point of the monomer. The glycols and short chain diols are used in the polymization mixture at levels of 0.5 to 10 weight percent, based on the carboxylic acid ester-containing monomer. It is believed the glycols and short chain diols hydrogen bond with the —(C?O)O— containing monomer to increase the monomer boiling point, and decrease or even eliminate the formation of air voids due to monomer boiling. The invention is especially useful in polymerization of methyl methacrylate polymers and copolymers, either neat, or as a polymer composite system.
    Type: Grant
    Filed: December 13, 2017
    Date of Patent: February 14, 2023
    Assignee: ARKEMA FRANCE
    Inventors: Alaaeddin Alsbaiee, Evan Crocker, Dana Lee Swan
  • Patent number: 11491460
    Abstract: A nucleophilic substitution reaction to crosslink cyclodextrin (CD) polymer with rigid aromatic groups, providing a high surface area, mesoporous CD-containing polymers (P-CDPs). The P-CDPs can be used for removing organic contaminants from water. By encapsulating pollutants to form well-defined host-guest complexes with complementary selectivities to activated carbon (AC) sorbents. The P-CDPs can rapidly sequester pharmaceuticals, pesticides, and other organic micropollutants, achieving equilibrium binding capacity in seconds with adsorption rate constants 15-200 times greater than ACs and nonporous CD sorbents. The CD polymer can be regenerated several times, through a room temperature washing procedure, with no loss in performance.
    Type: Grant
    Filed: October 28, 2020
    Date of Patent: November 8, 2022
    Assignee: CORNELL UNIVERSITY
    Inventors: William R. Dichtel, Alaaeddin Alsbaiee, Brian J. Smith, Juan Hinestroza, Diego Alzate-Sanchez, Leilei Xiao, Yuhan Ling, Damian Helbling
  • Patent number: 10968296
    Abstract: The invention relates to the use of low levels of aliphatic primary and secondary amines to control air void formation in any polymerization reaction having carbonyl groups, and especially carboxylic acid ester group-containing monomers at a level of at least 10% of total monomer, where the monomer has a peak polymerization exotherm temperature of greater than the boiling point of the monomer. The primary or secondary amines are used in the polymerization mixture at levels of 100 to 5000 ppm, based on the carboxylic acid ester group-containing monomer. It is believed the primary and secondary amines hydrogen bond with the —C?O)O— containing monomer to increase the monomer boiling point, and decrease or even eliminate the formation of air voids due to monomer boiling. The invention is especially useful in polymerization of methymethacrylate polymers and copolymers, either neat, or as a polymer composite system.
    Type: Grant
    Filed: December 13, 2017
    Date of Patent: April 6, 2021
    Assignee: Arkema France
    Inventors: Alaaeddin Alsbaiee, Evan Crocker, Dana Lee Swan
  • Publication number: 20210053025
    Abstract: A nucleophilic substitution reaction to crosslink cyclodextrin (CD) polymer with rigid aromatic groups, providing a high surface area, mesoporous CD-containing polymers (P-CDPs). The P-CDPs can be used for removing organic contaminants from water. By encapsulating pollutants to form well-defined host-guest complexes with complementary selectivities to activated carbon (AC) sorbents. The P-CDPs can rapidly sequester pharmaceuticals, pesticides, and other organic micropollutants, achieving equilibrium binding capacity in seconds with adsorption rate constants 15-200 times greater than ACs and nonporous CD sorbents. The CD polymer can be regenerated several times, through a room temperature washing procedure, with no loss in performance.
    Type: Application
    Filed: October 28, 2020
    Publication date: February 25, 2021
    Inventors: William R. Dichtel, Alaaeddin Alsbaiee, Brian J. Smith, Juan Hinestroza, Diego Alzate-Sanchez, Leilei Xiao, Yuhan Ling, Damian Helbling
  • Publication number: 20210009785
    Abstract: Accelerator solutions containing transition metal complexes based on organic ligands having one or more S—C—N, S—C—C—N, or S—C(?S)—S moieties are useful for accelerating the peroxide cure of resins such as unsaturated polyester resins.
    Type: Application
    Filed: February 11, 2019
    Publication date: January 14, 2021
    Inventors: Alaaeddin Alsbaiee, Evan Crocker
  • Patent number: 10882023
    Abstract: A nucleophilic substitution reaction to crosslink cyclodextrin (CD) polymer with rigid aromatic groups, providing a high surface area, mesoporous CD-containing polymers (P-CDPs). The P-CDPs can be used for removing organic contaminants from water. By encapsulating pollutants to form well-defined host-guest complexes with complementary selectivities to activated carbon (AC) sorbents. The P-CDPs can rapidly sequester pharmaceuticals, pesticides, and other organic micropollutants, achieving equilibrium binding capacity in seconds with adsorption rate constants 15-200 times greater than ACs and nonporous CD sorbents. The CD polymer can be regenerated several times, through a room temperature washing procedure, with no loss in performance.
    Type: Grant
    Filed: August 24, 2018
    Date of Patent: January 5, 2021
    Assignee: Cornell University
    Inventors: William R. Dichtel, Alaaeddin Alsbaiee, Brian J. Smith, Juan Hinestroza, Diego Alzate-Sanchez, Leilei Xiao, Yuhan Ling, Damian Helbling
  • Publication number: 20200071431
    Abstract: The invention relates to the use of low levels of aliphatic short-chain saturated esters to control air void formation in any exothermic polymerization reaction in which the exotherm exceeds the boiling point of the monomer. One such polymerization is the bulk polymerization of one or more monomers having carboxylic acid ester monomers, at a level of at least 10% of total monomer. The aliphatic short-chain saturated esters are used in the polymerization mixture at levels of 0.5 to 10 weight percent, based on the carboxyl-containing monomer. The invention is especially useful in polymerization of methylmethacrylate polymers and copolymers, either neat, or as a polymer composite system.
    Type: Application
    Filed: December 13, 2017
    Publication date: March 5, 2020
    Inventors: Alaaeddin Alsbaiee, Evan CROCKER, Dana Lee SWAN
  • Publication number: 20190389986
    Abstract: The invention relates to the use of low levels of aliphatic primary and secondary amines to control air void formation in any polymerization reaction having carbonyl groups, and especially carboxylic acid ester group-containing monomers at a level of at least 10% of total monomer, where the monomer has a peak polymerization exotherm temperature of greater than the boiling point of the monomer. The primary or secondary amines are used in the polymerization mixture at levels of 100 to 5000 ppm, based on the carboxylic acid ester group-containing monomer. It is believed the primary and secondary amines hydrogen bond with the —C?O)O— containing monomer to increase the monomer boiling point, and decrease or even eliminate the formation of air voids due to monomer boiling. The invention is especially useful in polymerization of methymethacrylate polymers and copolymers, either neat, or as a polymer composite system.
    Type: Application
    Filed: December 13, 2017
    Publication date: December 26, 2019
    Inventors: Alaaeddin ALSBAIEE, Evan CROCKER, Dana Lee SWAN
  • Publication number: 20190330446
    Abstract: The invention relates to the use of low levels of glycols and short chain diols to control air void formation in any polymerization reaction having carbonyl-containing monomers, and preferably carboxylic acid ester monomers, at a level of at least 10% of total monomer, where the monomer has a peak polymerization exotherm temperature of greater than the boiling point of the monomer. The glycols and short chain diols are used in the polymization mixture at levels of 0.5 to 10 weight percent, based on the carboxylic acid ester-containing monomer. It is believed the glycols and short chain diols hydrogen bond with the —(C?O)O— containing monomer to increase the monomer boiling point, and decrease or even eliminate the formation of air voids due to monomer boiling. The invention is especially useful in polymerization of methyl methacrylate polymers and copolymers, either neat, or as a polymer composite system.
    Type: Application
    Filed: December 13, 2017
    Publication date: October 31, 2019
    Inventors: Alaaeddin ALSBAIEE, Evan CROCKER, Dana Lee SWAN
  • Publication number: 20190060868
    Abstract: A nucleophilic substitution reaction to crosslink cyclodextrin (CD) polymer with rigid aromatic groups, providing a high surface area, mesoporous CD-containing polymers (P-CDPs). The P-CDPs can be used for removing organic contaminants from water. By encapsulating pollutants to form well-defined host-guest complexes with complementary selectivities to activated carbon (AC) sorbents. The P-CDPs can rapidly sequester pharmaceuticals, pesticides, and other organic micropollutants, achieving equilibrium binding capacity in seconds with adsorption rate constants 15-200 times greater than ACs and nonporous CD sorbents. The CD polymer can be regenerated several times, through a room temperature washing procedure, with no loss in performance.
    Type: Application
    Filed: August 24, 2018
    Publication date: February 28, 2019
    Inventors: William R. Dichtel, Alaaeddin Alsbaiee, Brian J. Smith, Juan Hinestroza, Diego Alzate-Sanchez, Leilei Xiao, Yuhan Ling, Damian Helbling
  • Patent number: 10086360
    Abstract: A nucleophilic substitution reaction to crosslink cyclodextrin (CD) polymer with rigid aromatic groups, providing a high surface area, mesoporous CD-containing polymers (P-CDPs). The P-CDPs can be used for removing organic contaminants from water. By encapsulating pollutants to form well-defined host-guest complexes with complementary selectivities to activated carbon (AC) sorbents. The P-CDPs can rapidly sequester pharmaceuticals, pesticides, and other organic micropollutants, achieving equilibrium binding capacity in seconds with adsorption rate constants 15-200 times greater than ACs and nonporous CD sorbents. The CD polymer can be regenerated several times, through a room temperature washing procedure, with no loss in performance.
    Type: Grant
    Filed: November 27, 2017
    Date of Patent: October 2, 2018
    Assignee: Cornell University
    Inventors: William R. Dichtel, Alaaeddin Alsbaiee, Brian J. Smith, Juan Hinestroza, Diego Alzate-Sanchez, Leilei Xiao, Yuhan Ling, Damian Helbling
  • Publication number: 20180093252
    Abstract: A nucleophilic substitution reaction to crosslink cyclodextrin (CD) polymer with rigid aromatic groups, providing a high surface area, mesoporous CD-containing polymers (P-CDPs). The P-CDPs can be used for removing organic contaminants from water. By encapsulating pollutants to form well-defined host-guest complexes with complementary selectivities to activated carbon (AC) sorbents. The P-CDPs can rapidly sequester pharmaceuticals, pesticides, and other organic micropollutants, achieving equilibrium binding capacity in seconds with adsorption rate constants 15-200 times greater than ACs and nonporous CD sorbents. The CD polymer can be regenerated several times, through a room temperature washing procedure, with no loss in performance.
    Type: Application
    Filed: November 27, 2017
    Publication date: April 5, 2018
    Inventors: William R. Dichtel, Alaaeddin Alsbaiee, Brian J. Smith, Juan Hinestroza, Diego Alzate-Sanchez, Leilei Xiao, Yuhan Ling, Damian Helbling
  • Patent number: 9855545
    Abstract: A nucleophilic substitution reaction to crosslink cyclodextrin (CD) polymer with rigid aromatic groups, providing a high surface area, mesoporous CD-containing polymers (P-CDPs). The P-CDPs can be used for removing organic contaminants from water. By encapsulating pollutants to form well-defined host-guest complexes with complementary selectivities to activated carbon (AC) sorbents. The P-CDPs can rapidly sequester pharmaceuticals, pesticides, and other organic micropollutants, achieving equilibrium binding capacity in seconds with adsorption rate constants 15-200 times greater than ACs and nonporous CD sorbents. The CD polymer can be regenerated several times, through a room temperature washing procedure, with no loss in performance.
    Type: Grant
    Filed: March 3, 2017
    Date of Patent: January 2, 2018
    Assignee: Cornell University
    Inventors: William R. Dichtel, Alaaeddin Alsbaiee, Brian J. Smith, Juan Hinestroza, Diego Alzate-Sanchez, Leilei Xiao, Yuhan Ling, Damian Helbling
  • Publication number: 20170173560
    Abstract: A nucleophilic substitution reaction to crosslink cyclodextrin (CD) polymer with rigid aromatic groups, providing a high surface area, mesoporous CD-containing polymers (P-CDPs). The P-CDPs can be used for removing organic contaminants from water. By encapsulating pollutants to form well-defined host-guest complexes with complementary selectivities to activated carbon (AC) sorbents. The P-CDPs can rapidly sequester pharmaceuticals, pesticides, and other organic micropollutants, achieving equilibrium binding capacity in seconds with adsorption rate constants 15-200 times greater than ACs and nonporous CD sorbents. The CD polymer can be regenerated several times, through a room temperature washing procedure, with no loss in performance.
    Type: Application
    Filed: March 3, 2017
    Publication date: June 22, 2017
    Inventors: William R. Dichtel, Alaaeddin Alsbaiee, Brian J. Smith, Juan Hinestroza, Diego Alzate-Sanchez, Leilei Xiao, Yuhan Ling, Damian Helbling
  • Patent number: 9624314
    Abstract: A nucleophilic substitution reaction to crosslink cyclodextrin (CD) polymer with rigid aromatic groups, providing a high surface area, mesoporous CD-containing polymers (P-CDPs). The P-CDPs can be used for removing organic contaminants from water. By encapsulating pollutants to form well-defined host-guest complexes with complementary selectivities to activated carbon (AC) sorbents. The P-CDPs can rapidly sequester pharmaceuticals, pesticides, and other organic micropollutants, achieving equilibrium binding capacity in seconds with adsorption rate constants 15-200 times greater than ACs and nonporous CD sorbents. The CD polymer can be regenerated several times, through a room temperature washing procedure, with no loss in performance.
    Type: Grant
    Filed: April 20, 2016
    Date of Patent: April 18, 2017
    Assignee: Cornell University
    Inventors: William R. Dichtel, Alaaeddin Alsbaiee, Brian J. Smith, Juan Hinestroza, Diego Alzate-Sanchez, Leilei Xiao, Yuhan Ling, Damian Helbling
  • Publication number: 20160304630
    Abstract: A nucleophilic substitution reaction to crosslink cyclodextrin (CD) polymer with rigid aromatic groups, providing a high surface area, mesoporous CD-containing polymers (P-CDPs). The P-CDPs can be used for removing organic contaminants from water. By encapsulating pollutants to form well-defined host-guest complexes with complementary selectivities to activated carbon (AC) sorbents. The P-CDPs can rapidly sequester pharmaceuticals, pesticides, and other organic micropollutants, achieving equilibrium binding capacity in seconds with adsorption rate constants 15-200 times greater than ACs and nonporous CD sorbents. The CD polymer can be regenerated several times, through a room temperature washing procedure, with no loss in performance.
    Type: Application
    Filed: April 20, 2016
    Publication date: October 20, 2016
    Inventors: William R. Dichtel, Alaaeddin Alsbaiee, Brian J. Smith, Juan Hinestroza, Diego Alzate-Sanchez, Leilei Xiao, Yuhan Ling, Damian Helbling