Patents by Inventor Alaaeldin A. M. Amin

Alaaeldin A. M. Amin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5455793
    Abstract: A novel nonvolatile memory cell structure is provided using a non-self aligned CMOS process with two independent N+ implants using a two or a three polysilicon layer technology that allows in-circuit electrical erase and reprogramming together with reduction in cell size requirement. The novel memory cell is implemented with a merged transistor structure having an access transistor and a programmable transistor. The memory cell is constructed by having the control gate, formed of a first polysilicon layer, covering a portion of the channel length between drain and source to form the access portion of the merged transistors, and a floating gate formed of a second polysilicon layer overlapping a second portion of the channel length to form the programmable transistor portion of the merged transistor. Such merged transistor structure is equivalent to two transistors in series, a programmable transistor in series with an access transistor.
    Type: Grant
    Filed: November 17, 1994
    Date of Patent: October 3, 1995
    Assignee: National Semiconductor Corp.
    Inventors: Alaaeldin A. M. Amin, James Brennan, Jr.
  • Patent number: 5293328
    Abstract: A novel nonvolatile memory cell structure is provided using a non-self aligned CMOS process with two independent N+ implants using a two or a three polysilicon layer technology that allows in-circuit electrical erase and reprogramming together with reduction in cell size requirement. The novel memory cell is implemented with a merged transistor structure having an access transistor and a programmable transistor. The memory cell is constructed by having the control gate, formed of a first polysilicon layer, covering a portion of the channel length between drain and source to form the access portion of the merged transistors, and a floating gate formed of a second polysilicon layer overlapping a second portion of the channel length to form the programmable transistor portion of the merged transistor. Such merged transistor structure is equivalent to two transistors in series, a programmable transistor in series with an access transistor.
    Type: Grant
    Filed: January 15, 1992
    Date of Patent: March 8, 1994
    Assignee: National Semiconductor Corporation
    Inventors: Alaaeldin A. M. Amin, James Brennan, Jr.
  • Patent number: 5117394
    Abstract: A memory circuit incorporates a differential sense amplifier to be utilized in conjunction with a memory array comprised of a plurality of memory cells each containing a single transistor. A high slew rate differential input signal is applied to the sense amplifier based upon the binary data stored in an addressed memory cell. This is accomplished by pre-charging the selected bit line and a reference bit line, and then selecting the word line of the memory cell to be read, while causing the reference memory cell to conduct. The differential voltage between the selected bit line and the reference bit line is then sensed to determine the state of the data stored in the selected memory cell. The ratio of currents through the selected bit line and the reference bit line is selected to be other than one, in order to achieve a rapid differential voltage swing, and rapid reading of the data stored within the selected memory cell.
    Type: Grant
    Filed: May 6, 1991
    Date of Patent: May 26, 1992
    Assignee: National Semiconductor Corporation
    Inventors: Alaaeldin A. M. Amin, Bernard Emoto