Patents by Inventor Alain Duvallet

Alain Duvallet has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210005709
    Abstract: FET designs that exhibit low leakage in the presence of the edge transistor phenomenon. Embodiments includes nFET designs in which the work function ?MF of the gate structure overlying the edge transistors of the nFET is increased by forming extra P+ implant regions within at least a portion of the gate structure, thereby increasing the Vt of the edge transistors to a level that may exceed the Vt of the central conduction channel of the nFET. In some embodiments, the gate structure of the nFET is modified to increase or “flare” the effective channel length of the edge transistors relative to the length of the central conduction channel of the FET. Other methods of changing the work function ?MF of the gate structure overlying the edge transistors are also disclosed. The methods may be adapted to fabricating pFETs by reversing or substituting material types.
    Type: Application
    Filed: July 15, 2020
    Publication date: January 7, 2021
    Inventors: Abhijeet Paul, Simon Edward Willard, Alain Duvallet
  • Publication number: 20200335522
    Abstract: Structures and fabrication methods for transistors having low parasitic capacitance, the transistors including an insulating low dielectric constant first or second handle wafer. In one embodiment, a Single Layer Transfer technique is used to position an insulating LDC handle wafer proximate the metal interconnect layers of an SOI transistor/metal layer stack in lieu of the silicon substrate of conventional designs. In another embodiment, a Double Layer Transfer technique is used to replace the silicon substrate of prior art structures with an insulating LDC substrate. In some embodiments, the insulating LDC handle wafer includes at least one air cavity, which reduces the effective dielectric constant of material surrounding an RF FET. An insulating LDC handle wafer reduces insertion loss and non-linearity, increases isolation, provides for more ideal voltage division of stacked transistors, enables a higher Q factor due to lower coupling losses, and otherwise mitigates various parasitic effects.
    Type: Application
    Filed: July 7, 2020
    Publication date: October 22, 2020
    Inventors: Abhijeet Paul, Simon Edward Willard, Alain Duvallet, Ronald Eugene Reedy
  • Patent number: 10770480
    Abstract: Systems, methods and apparatus for coexistence of high voltage and low voltage devices and circuits on a same integrated circuit fabricated in silicon-on-insulator (SOI) technology are described. In particular, techniques for mitigating back gate effects are described, including using of resistive and/or capacitive couplings to control surface potentials at regions of a substrate used for the SOI fabrication proximate the high voltage and low voltage devices and circuits. In one case, an N-type implant is used to provide a high potential differential with respect to a substrate potential.
    Type: Grant
    Filed: May 24, 2019
    Date of Patent: September 8, 2020
    Assignee: pSemi Corporation
    Inventors: Buddhika Abesingha, Simon Edward Willard, Alain Duvallet, Merlin Green, Sivakumar Kumarasamy
  • Patent number: 10763257
    Abstract: Systems, methods, and apparatus for an improved protection from charge injection into layers of a device using resistive structures are described. Such resistive structures, named s-contacts, can be made using simpler fabrication methods and less fabrication steps. In a case of metal-oxide-semiconductor (MOS) field effect transistors (FETs), s-contacts can be made with direct connection, or resistive connection, to all regions of the transistors, including the source region, the drain region and the gate.
    Type: Grant
    Filed: September 24, 2019
    Date of Patent: September 1, 2020
    Assignee: pSemi Corporation
    Inventors: Befruz Tasbas, Simon Edward Willard, Alain Duvallet, Sinan Goktepeli
  • Patent number: 10756166
    Abstract: FET designs that exhibit low leakage in the presence of the edge transistor phenomenon. Embodiments includes nFET designs in which the work function ?MF of the gate structure overlying the edge transistors of the nFET is increased by forming extra P+ implant regions within at least a portion of the gate structure, thereby increasing the Vt of the edge transistors to a level that may exceed the Vt of the central conduction channel of the nFET. In some embodiments, the gate structure of the nFET is modified to increase or “flare” the effective channel length of the edge transistors relative to the length of the central conduction channel of the FET. Other methods of changing the work function ?MF of the gate structure overlying the edge transistors are also disclosed. The methods may be adapted to fabricating pFETs by reversing or substituting material types.
    Type: Grant
    Filed: July 30, 2018
    Date of Patent: August 25, 2020
    Assignee: pSemi Corporation
    Inventors: Abhijeet Paul, Simon Edward Willard, Alain Duvallet
  • Publication number: 20200227447
    Abstract: FET IC structures that enable formation of integrated capacitors in a “flipped” SOI IC structure made using a back-side access process, such as a “single layer transfer” (SLT) process, and which eliminate or mitigate unwanted parasitic couplings to a handle wafer. In some embodiments, a conductive interconnect layer may be patterned, pre-SLT, to form an isolated first capacitor plate. In other embodiments, pre-SLT, a conductive region of the active layer of an IC may be patterned to form an isolated first capacitor plate, with one or more interconnect layers being fabricated in position to form an electrical contact to the first capacitor plate. In either case, a post-SLT top-side layer of conductive material may be patterned to form a second capacitor plate.
    Type: Application
    Filed: January 8, 2020
    Publication date: July 16, 2020
    Inventors: Abhijeet Paul, Hiroshi Yamada, Alain Duvallet
  • Patent number: 10672806
    Abstract: FET IC structures that enable formation of high-Q inductors in a “flipped” SOI IC structure made using a back-side access process, such as an single layer transfer (SLT) process. Essentially, the interconnect layer superstructure of an IC is split into two parts, a “lower” superstructure and an “upper” superstructure. In various embodiments, one or more low-resistance interconnect layers are fabricated within an upper superstructure formed after the application of a back-side access process, allowing fabrication of inductors in one or more low-resistance interconnect layer. A significant advantage of such IC structures is that the low-resistance interconnect layer or layers are relocated from being near the handle wafer of a conventional SLT IC to being spaced away from the handle wafer by intervening structures. Fabricating inductors in such spaced low-resistance interconnect layer or layers reduces electromagnetic coupling with the handle wafer and thus increases the Q factor of the inductors.
    Type: Grant
    Filed: July 19, 2018
    Date of Patent: June 2, 2020
    Assignee: pSemi Corporation
    Inventors: Abhijeet Paul, Hiroshi Yamada, Alain Duvallet
  • Patent number: 10658386
    Abstract: A FET IC structure made using a back-side access process that mitigates or eliminates thermal conductivity problems. In some embodiments, electrically-isolated thermal paths are formed adjacent the FET and configured to conduct heat laterally away from the FET to generally orthogonal thermal pathways, and thence to thermal pads externally accessible at the “top” of the completed IC. In some embodiments having a thermally-conductive handle wafer, electrically-isolated thermal paths are formed adjacent a FET and configured to conduct heat laterally away from the FET. Thermal vias are formed sufficiently so as to be in thermal contact with the handle wafer and with the conventional metallization layers of the device superstructure, at least one of which is in thermal contact with the lateral thermal paths. In some embodiments, the lateral thermal paths may use dummy gates configured to conduct heat laterally away from a FET to generally orthogonal thermal pathways.
    Type: Grant
    Filed: July 19, 2018
    Date of Patent: May 19, 2020
    Assignee: pSemi Corporation
    Inventors: Abhijeet Paul, Richard James Dowling, Hiroshi Yamada, Alain Duvallet, Ronald Eugene Reedy
  • Publication number: 20200091148
    Abstract: Systems, methods, and apparatus for an improved protection from charge injection into layers of a device using resistive structures are described. Such resistive structures, named s-contacts, can be made using simpler fabrication methods and less fabrication steps. In a case of metal-oxide-semiconductor (MOS) field effect transistors (FETs), s-contacts can be made with direct connection, or resistive connection, to all regions of the transistors, including the source region, the drain region and the gate.
    Type: Application
    Filed: September 24, 2019
    Publication date: March 19, 2020
    Inventors: Befruz Tasbas, Simon Edward Willard, Alain Duvallet, Sinan Goktepeli
  • Patent number: 10580903
    Abstract: Semiconductor-on-insulator field effect transistor (FET) integrated circuit (IC) structures and fabrication processes that mitigate or eliminate the problems caused by the secondary parasitic back-channel FET of conventional semiconductor-on-insulator FET IC structures. Embodiments enable full control of the secondary parasitic back-channel FET of semiconductor-on-insulator IC primary FETs. Embodiments include taking partially fabricated ICs made using a process which allows access to the back side of the FET, such as “single layer transfer” process, and then fabricating a conductive aligned supplemental (CAS) gate structure relative to the insulating layer juxtaposed to a primary FET such that a control voltage applied to the CAS gate can regulate the electrical characteristics of the regions of the primary FET adjacent the insulating layer. The IC structures present as a four or five terminal device: source S, drain D, primary gate G, CAS gate, and, optionally, a body contact.
    Type: Grant
    Filed: March 13, 2018
    Date of Patent: March 3, 2020
    Assignee: pSemi Corporation
    Inventors: Hiroshi Yamada, Abhijeet Paul, Alain Duvallet
  • Patent number: 10573674
    Abstract: FET IC structures that enable formation of integrated capacitors in a “flipped” SOI IC structure made using a back-side access process, such as a “single layer transfer” (SLT) process, and which eliminate or mitigate unwanted parasitic couplings to a handle wafer. In some embodiments, a conductive interconnect layer may be patterned, pre-SLT, to form an isolated first capacitor plate. In other embodiments, pre-SLT, a conductive region of the active layer of an IC may be patterned to form an isolated first capacitor plate, with one or more interconnect layers being fabricated in position to form an electrical contact to the first capacitor plate. In either case, a post-SLT top-side layer of conductive material may be patterned to form a second capacitor plate. Couplings to the resulting capacitor structures include only external connections, only internal connections, or both internal and external connections.
    Type: Grant
    Filed: July 19, 2018
    Date of Patent: February 25, 2020
    Assignee: pSemi Corporation
    Inventors: Abhijeet Paul, Hiroshi Yamada, Alain Duvallet
  • Publication number: 20200043946
    Abstract: Structures and fabrication methods for transistors having low parasitic capacitance, the transistors including an insulating low dielectric constant first or second handle wafer. In one embodiment, a Single Layer Transfer technique is used to position an insulating LDC handle wafer proximate the metal interconnect layers of an SOI transistor/metal layer stack in lieu of the silicon substrate of conventional designs. In another embodiment, a Double Layer Transfer technique is used to replace the silicon substrate of prior art structures with an insulating LDC substrate. In some embodiments, the insulating LDC handle wafer includes at least one air cavity, which reduces the effective dielectric constant of material surrounding an RF FET. An insulating LDC handle wafer reduces insertion loss and non-linearity, increases isolation, provides for more ideal voltage division of stacked transistors, enables a higher Q factor due to lower coupling losses, and otherwise mitigates various parasitic effects.
    Type: Application
    Filed: January 9, 2019
    Publication date: February 6, 2020
    Inventors: Abhijeet Paul, Simon Edward Willard, Alain Duvallet, Ronald Eugene Reedy
  • Publication number: 20200027898
    Abstract: A FET IC structure made using a back-side access process that mitigates or eliminates thermal conductivity problems. In some embodiments, electrically-isolated thermal paths are formed adjacent the FET and configured to conduct heat laterally away from the FET to generally orthogonal thermal pathways, and thence to thermal pads externally accessible at the “top” of the completed IC. In some embodiments having a thermally-conductive handle wafer, electrically-isolated thermal paths are formed adjacent a FET and configured to conduct heat laterally away from the FET. Thermal vias are formed sufficiently so as to be in thermal contact with the handle wafer and with the conventional metallization layers of the device superstructure, at least one of which is in thermal contact with the lateral thermal paths. In some embodiments, the lateral thermal paths may use dummy gates configured to conduct heat laterally away from a FET to generally orthogonal thermal pathways.
    Type: Application
    Filed: July 19, 2018
    Publication date: January 23, 2020
    Inventors: Abhijeet Paul, Richard James Dowling, Hiroshi Yamada, Alain Duvallet, Ronald Eugene Reedy
  • Publication number: 20200027907
    Abstract: FET IC structures that enable formation of integrated capacitors in a “flipped” SOI IC structure made using a back-side access process, such as a “single layer transfer” (SLT) process, and which eliminate or mitigate unwanted parasitic couplings to a handle wafer. In some embodiments, a conductive interconnect layer may be patterned, pre-SLT, to form an isolated first capacitor plate. In other embodiments, pre-SLT, a conductive region of the active layer of an IC may be patterned to form an isolated first capacitor plate, with one or more interconnect layers being fabricated in position to form an electrical contact to the first capacitor plate. In either case, a post-SLT top-side layer of conductive material may be patterned to form a second capacitor plate.
    Type: Application
    Filed: July 19, 2018
    Publication date: January 23, 2020
    Inventors: Abhijeet Paul, Hiroshi Yamada, Alain Duvallet
  • Publication number: 20200027908
    Abstract: FET IC structures that enable formation of high-Q inductors in a “flipped” SOI IC structure made using a back-side access process, such as an single layer transfer (SLT) process. Essentially, the interconnect layer superstructure of an IC is split into two parts, a “lower” superstructure and an “upper” superstructure. In various embodiments, one or more low-resistance interconnect layers are fabricated within an upper superstructure formed after the application of a back-side access process, allowing fabrication of inductors in one or more low-resistance interconnect layer. A significant advantage of such IC structures is that the low-resistance interconnect layer or layers are relocated from being near the handle wafer of a conventional SLT IC to being spaced away from the handle wafer by intervening structures. Fabricating inductors in such spaced low-resistance interconnect layer or layers reduces electromagnetic coupling with the handle wafer and thus increases the Q factor of the inductors.
    Type: Application
    Filed: July 19, 2018
    Publication date: January 23, 2020
    Inventors: Abhijeet Paul, Hiroshi Yamada, Alain Duvallet
  • Patent number: 10438950
    Abstract: Systems, methods, and apparatus for an improved protection from charge injection into layers of a device using resistive structures are described. Such resistive structures, named s-contacts, can be made using simpler fabrication methods and less fabrication steps. In a case of metal-oxide-semiconductor (MOS) field effect transistors (FETs), s-contacts can be made with direct connection, or resistive connection, to all regions of the transistors, including the source region, the drain region and the gate.
    Type: Grant
    Filed: April 14, 2017
    Date of Patent: October 8, 2019
    Assignee: pSemi Corporation
    Inventors: Befruz Tasbas, Simon Edward Willard, Alain Duvallet, Sinan Goktepeli
  • Publication number: 20190288006
    Abstract: Semiconductor-on-insulator field effect transistor (FET) integrated circuit (IC) structures and fabrication processes that mitigate or eliminate the problems caused by the secondary parasitic back-channel FET of conventional semiconductor-on-insulator FET IC structures. Embodiments enable full control of the secondary parasitic back-channel FET of semiconductor-on-insulator IC primary FETs. Embodiments include taking partially fabricated ICs made using a process which allows access to the back side of the FET, such as “single layer transfer” process, and then fabricating a conductive aligned supplemental (CAS) gate structure relative to the insulating layer juxtaposed to a primary FET such that a control voltage applied to the CAS gate can regulate the electrical characteristics of the regions of the primary FET adjacent the insulating layer. The IC structures present as a four or five terminal device: source S, drain D, primary gate G, CAS gate, and, optionally, a body contact.
    Type: Application
    Filed: March 8, 2019
    Publication date: September 19, 2019
    Inventors: Abhijeet Paul, Simon Edward Willard, Hiroshi Yamada, Alain Duvallet
  • Publication number: 20190288119
    Abstract: Semiconductor-on-insulator field effect transistor (FET) integrated circuit (IC) structures and fabrication processes that mitigate or eliminate the problems caused by the secondary parasitic back-channel FET of conventional semiconductor-on-insulator FET IC structures. Embodiments enable full control of the secondary parasitic back-channel FET of semiconductor-on-insulator IC primary FETs. Embodiments include taking partially fabricated ICs made using a process which allows access to the back side of the FET, such as “single layer transfer” process, and then fabricating a conductive aligned supplemental (CAS) gate structure relative to the insulating layer juxtaposed to a primary FET such that a control voltage applied to the CAS gate can regulate the electrical characteristics of the regions of the primary FET adjacent the insulating layer. The IC structures present as a four or five terminal device: source S, drain D, primary gate G, CAS gate, and, optionally, a body contact.
    Type: Application
    Filed: March 13, 2018
    Publication date: September 19, 2019
    Inventors: Hiroshi Yamada, Abhijeet Paul, Alain Duvallet
  • Publication number: 20190288113
    Abstract: A high-voltage switching device that can be fabricated in a standard low-voltage process, such as CMOS, and more specifically SOI CMOS. Embodiments include integrated circuits that combine, in a unitary structure, a FET device and an integrated, co-fabricated modulated resistance region (MRR) controlled by one or more Voltage-Drop Modulation Gates (VDMGs). The VDMGs are generally biased independently of the gate of the FET device, and in such a way as to protect each VDMG from excessive and potentially destructive voltages. In a first embodiment, an integrated circuit high voltage switching device includes a transistor structure including a source, a gate, and an internal drain; an MRR connected to the internal drain of the transistor structure; at least one VDMG that controls the resistance of the MRR; and a drain electrically connected to the MRR. Each VDMG at least partially depletes the MRR upon application of a bias voltage.
    Type: Application
    Filed: June 4, 2019
    Publication date: September 19, 2019
    Inventors: Abhijeet Paul, Simon Edward Willard, Alain Duvallet
  • Publication number: 20190280011
    Abstract: Systems, methods and apparatus for coexistence of high voltage and low voltage devices and circuits on a same integrated circuit fabricated in silicon-on-insulator (SOI) technology are described. In particular, techniques for mitigating back gate effects are described, including using of resistive and/or capacitive couplings to control surface potentials at regions of a substrate used for the SOI fabrication proximate the high voltage and low voltage devices and circuits. In one case, an N-type implant is used to provide a high potential differential with respect to a substrate potential.
    Type: Application
    Filed: May 24, 2019
    Publication date: September 12, 2019
    Inventors: Buddhika Abesingha, Simon Edward Willard, Alain Duvallet, Merlin Green, Sivakumar Kumarasamy