Abstract: An in-situ (result-directed/predictive) MR stripe height calibration method capable of operating on the fly during lapping operation. The method involves utilization of an interval sampling technique, which provides a high number of data points. The data provided are filtered and averaged at each kerf location to provide a much higher calibration accuracy than previously available. The primary advantage is to create an accurate relationship between MR element resistance and its stripe height while the MR element is being lapped. The method thus provides the ability to target either resistance or stripe height or a combination of both during the lapping process. Finally, the system is completely self-contained and does not required wafer data.

Abstract: An in-situ (result-directed/predictive) MR stripe height calibration method capable of operating on the fly during lapping operation. The method involves utilization of an interval sampling technique, which provides a high number of data points. The data provided are filtered and averaged at each kerf location to provide a much higher calibration accuracy than previously available. The primary advantage is to create an accurate relationship between MR element resistance and its stripe height while the M element is being lapped. The method thus provides the ability to target either resistance or stripe height or a combination of both during the lapping process. Finally, the system is completely self-contained and does not required wafer data.