Abstract: A method for following the degassing of a component placed in a vacuum chamber, comprises: measuring partial pressures Pi for a set M of reference atomic masses, by means of a mass spectrometer connected to the vacuum chamber; determining a degassing rate ?, at least as a function of the measured partial pressures Pi; and, calculating a slope of the variation in the degassing rate. The degassing rate ? may advantageously be determined by calculation by means of a relationship of the type: ? = ? i ? M ? ? ? i ? P i ? i = 0 N ? ? ? i ? P i ? where M denotes the set of reference atomic masses, Pi denotes the partial pressures for the atomic masses measured by the mass spectrometer, the coefficients ?i denote preset weighting coefficients associated with each partial pressure Pi, and N denotes a maximum atomic mass for which the partial pressure Pi can be measured by the mass spectrometer.

Abstract: A method for following the degassing of a component placed in a vacuum chamber, comprises: measuring partial pressures Pi for a set M of reference atomic masses, by means of a mass spectrometer connected to the vacuum chamber; determining a degassing rate ?, at least as a function of the measured partial pressures Pi; and, calculating a slope of the variation in the degassing rate. The degassing rate ? may advantageously be determined by calculation by means of a relationship of the type: ? = ? i ? M ? ? ? i ? P i ? i = 0 N ? ? ? i ? P i where M denotes the set of reference atomic masses, Pi denotes the partial pressures for the atomic masses measured by the mass spectrometer, the coefficients ?i denote preset weighting coefficients associated with each partial pressure Pi, and N denotes a maximum atomic mass for which the partial pressure Pi can be measured by the mass spectrometer.