Patents by Inventor Alain Sismondi

Alain Sismondi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20060154001
    Abstract: The present invention refers to an ink-jet recording material having at least one porous ink receiving layer comprising alumina particles, a binder resin, boric acid or borate, and a color fading inhibitor compound of the following Formula (I) wherein R1 to R10, being the same or different, each is an alkyl group having from 1 to 5 carbon atoms; X is a divalent linking group; m and n, equal or different, are 0, 1 or 2; Z is Y or is an alkyl group having from 1 to 12 carbon atoms, and Y is represented by formula (II), wherein R11, and R12 each being an alkyl group having from 1 to 6 carbon atoms, said ink-jet recording material being substantially free of thiocyanate compounds. The invention also revers to the use of an ink-jet recording material as described above, to improve the gas resistance, of the images recorded on it.
    Type: Application
    Filed: January 12, 2004
    Publication date: July 13, 2006
    Applicant: Fitra Investimenti S.p.A.
    Inventor: Alain Sismondi
  • Patent number: 5066672
    Abstract: The invention relates to compounds of the polyfluoroalkyl acetate, thioacetate or acetamide type, which can be denoted by the general formula: ##STR1## in which Rf denotes a perfluoroalkyl radical, m is an integer ranging from 1 to 4, Q denotes an oxygen or sulphur atom or an NH group, X.sup.- denotes an anion, R.sub.1 denotes an alkyl radical containing from 1 to 3 carbon atoms, R.sub.2 denotes the allyl radical or an alkyl radical containing from 1 to 18 carbon atoms, and R.sub.3 denotes an alkyl radical containing from 7 to 18 carbon atoms or one of the following radicals: ##STR2## wherein n is an integer from 2 to 4, R is hydrogen or methyl, and Y denotes C.sub.2 -C.sub.8 alkylene bridge optionally interrupted by an oxygen atom.These compounds can be used as surface-active agents or an monomers for developing artificial vesicles.
    Type: Grant
    Filed: December 27, 1989
    Date of Patent: November 19, 1991
    Assignee: Societe Atochem
    Inventors: Alain Sismondi, Parfait Abenin, Aime Cambon