Abstract: A capacitor including: a first electrode; a second electrode; and a dielectric material situated between the first electrode and the second electrode, where the dielectric material is a self-assembled block-copolymer film with a periodic morphology. The self-assembled block-copolymer film may have a lamellar morphology that is horizontally oriented into layers of copolymer parallel to the first electrode and second electrode.

Abstract: Directionally oriented block copolymer films and zone annealing processes for producing directionally oriented block films are provided. The zone annealing processes include methods of inducing horizontally oriented block copolymers through a soft sheer process and methods of inducing vertically oriented block copolymers via sharp dynamic zone annealing. The zone annealing processes are capable of both small and large scale production of directionally oriented block films. The cold zone annealing processes are also capable of being combined with graphoepitaxy methods.

Abstract: A polymer nanocomposite includes a polymer matrix with nanoparticle assemblies and free polymer chains. The nanoparticle assemblies have a size larger than the radius of gyration of the free polymer chains. The polymer nanocomposite includes patterns having nanoparticle assemblies selectively migrated therein. A method of making the polymer nanocomposite includes positioning a patterned object on a nanoparticle assembly-containing film.

Abstract: A capacitor including: a first electrode; a second electrode; and a dielectric material situated between the first electrode and the second electrode, where the dielectric material is a self-assembled block-copolymer film with a periodic morphology. The self-assembled block-copolymer film may have a lamellar morphology that is horizontally oriented into layers of copolymer parallel to the first electrode and second electrode.

Abstract: Directionally oriented block copolymer films and zone annealing processes for producing directionally oriented block films are provided. The zone annealing processes include methods of inducing horizontally oriented block copolymers through a soft sheer process and methods of inducing vertically oriented block copolymers via sharp dynamic zone annealing. The zone annealing processes are capable of both small and large scale production of directionally oriented block films. The cold zone annealing processes are also capable of being combined with graphoepitaxy methods.

Abstract: A method for producing a patterned polymer film on a substrate includes the steps of coating a substrate with a polymer film; placing a patterned mask onto the surface of the polymer film, the patterned mask having at least one pattern section of dimensions less than the capillary wavelength of the polymer film; annealing the polymer film by either solvent annealing or temperature-based annealing, which involves raising the temperature of the polymer film above its glass transition temperature, the step of annealing causing the polymer film to conform to the dimensions of the at least one pattern section of dimensions less than the capillary wavelength of the polymer film, thereby forming a patterned polymer film; and removing the patterned mask from the patterned polymer film.