Patents by Inventor Alan B. Harker

Alan B. Harker has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9266733
    Abstract: A layered construction for application to a device or substrate or placement in an enclosed space for use in decontaminating the underlying surface or enclosed space comprises a cathode, an electrolyte layer, an anode and a protective surface layer. A compound that can be electrically decomposed to release on demand and over an extended period of time, an oxidant is included in the layered structure, preferably in the electrolyte layer. Preferred compounds are those which can release halogen ions which react with various different chemical or biological contaminants which may contact the protective layer, destroying, or devitalizing the contaminants.
    Type: Grant
    Filed: September 30, 2005
    Date of Patent: February 23, 2016
    Assignee: TELEDYNE SCIENTIFIC & IMAGING, LLC
    Inventors: Martin W. Kendig, Young J. Chung, Alan B. Harker, Dennis R. Strauss
  • Patent number: 8834687
    Abstract: A layered construction for use in decontaminating a surface or enclosed space is described. The construction is an electrochemical cell which includes a cathode, an electrolyte layer, an anode and a protective surface layer. A precursor compound that can be electrically decomposed to release an oxidant, on demand and over an extended period of time, is included in the layered structure, preferably in the electrolyte layer. The oxidant compounds react with various different chemical or biological contaminants in contact the protective layer, thereby deactivating, destroying or devitalizing the contaminants. The layered construction is suitable for application to a device or substrate, or placement in an enclosed space, and can be used on sensitive surfaces such as electronic components and human skin.
    Type: Grant
    Filed: September 28, 2006
    Date of Patent: September 16, 2014
    Assignee: Teledyne Licensing, LLC
    Inventors: Martin W. Kendig, Young J. Chung, Alan B. Harker, Dennis R. Strauss, Walther Ellis, Linda S. Powers
  • Publication number: 20120111719
    Abstract: A layered construction for use in decontaminating a surface or enclosed space is described. The construction is an electrochemical cell which includes a cathode, an electrolyte layer, an anode and a protective surface layer. A precursor compound that can be electrically decomposed to release an oxidant, on demand and over an extended period of time, is included in the layered structure, preferably in the electrolyte layer. The oxidant compounds react with various different chemical or biological contaminants in contact the protective layer, thereby deactivating, destroying or devitalizing the contaminants. The layered construction is suitable for application to a device or substrate, or placement in an enclosed space, and can be used on sensitive surfaces such as electronic components and human skin.
    Type: Application
    Filed: September 28, 2006
    Publication date: May 10, 2012
    Inventors: Martin W. Kendig, Young J. Chung, Alan B. Harker, Dennis R. Strauss, Walther Ellis, Linda S. Powers
  • Patent number: 7256943
    Abstract: A variable focus liquid-filled lens or microlens array is formed with an elastomer membrane and filled with a polyphenyl ether (PPE) liquid. PPE provides approximately twice the refractive power of water and exhibits better absorption/evaporation properties than water.
    Type: Grant
    Filed: August 24, 2006
    Date of Patent: August 14, 2007
    Assignee: Teledyne Licensing, LLC
    Inventors: Paul H. Kobrin, Alan B. Harker
  • Patent number: 7108819
    Abstract: A tool for embossing high aspect ratio microstructures is provided, wherein the microstructures provide decreased surface reflection and increased transmission through an optical component even at high incident angles. The tool is fabricated by a process that comprises anisotropic etching of columnar pits in a silicon substrate using inductively coupled plasma, followed by isotropic reactive ion etching of the columnar pits to create relatively pointed obelisks. The silicon substrate is then preferably rinsed to remove remaining photoresist prior to vapor depositing a conductive layer thereon. Finally, a metal is electroformed over the conductive layer to form the embossing tool. The embossing tool is then pressed against an optical coating, for example a polymer sheet, to create microstructures having aspect ratios from 1 to 5.
    Type: Grant
    Filed: May 16, 2003
    Date of Patent: September 19, 2006
    Assignee: The Boeing Company
    Inventors: Alan B Harker, Jeffrey F DeNatale, Dennis R Strauss
  • Publication number: 20030201249
    Abstract: A tool for embossing high aspect ratio microstructures is provided, wherein the microstructures provide decreased surface reflection and increased transmission through an optical component even at high incident angles. The tool is fabricated by a process that comprises anisotropic etching of columnar pits in a silicon substrate using inductively coupled plasma, followed by isotropic reactive ion etching of the columnar pits to create relatively pointed obelisks. The silicon substrate is then preferably rinsed to remove remaining photoresist prior to vapor depositing a conductive layer thereon. Finally, a metal is electroformed over the conductive layer to form the embossing tool. The embossing tool is then pressed against an optical coating, for example a polymer sheet, to create microstructures having aspect ratios from 1 to 5.
    Type: Application
    Filed: May 16, 2003
    Publication date: October 30, 2003
    Inventors: Alan B. Harker, Jeffrey F. DeNatale, Dennis R. Strauss
  • Publication number: 20030201241
    Abstract: A tool for embossing high aspect ratio microstructures is provided, wherein the microstructures provide decreased surface reflection and increased transmission through an optical component. The tool is fabricated by a process that comprises etching columnar pits in a silicon substrate using inductively coupled plasma, followed by reactive ion etching of the columnar pits to create relatively pointed obelisks. The silicon substrate is then preferably rinsed prior to vapor depositing a conductive layer thereon. Finally, a metal is electroformed over the conductive layer to form the embossing tool. The embossing tool is then pressed against an optical coating, for example a polymer sheet, to create microstructures having aspect ratios from 1 to 5.
    Type: Application
    Filed: May 16, 2003
    Publication date: October 30, 2003
    Inventors: Alan B. Harker, Jeffrey F. DeNatale, Dennis R. Strauss
  • Publication number: 20030038033
    Abstract: A process for embossing high aspect ratio microstructures is provided, wherein the microstructures provide decreased surface reflection and increased transmission through an optical component. The process comprises etching columnar pits in a silicon substrate using inductively coupled plasma, followed by reactive ion etching of the columnar pits to create relatively pointed obelisks. The silicon substrate is then preferably rinsed prior to vapor depositing a conductive layer thereon. Further, a metal is electroformed over the conductive layer to form an embossing tool. The embossing tool is then used to form microstructures, for example in a polymer sheet, having aspect ratios greater than 5 to 1.
    Type: Application
    Filed: August 27, 2001
    Publication date: February 27, 2003
    Inventors: Alan B. Harker, Jeffrey F. DeNatale, Dennis Strauss
  • Publication number: 20030038105
    Abstract: A tool for embossing high aspect ratio microstructures is provided, wherein the microstructures provide decreased surface reflection and increased transmission through an optical component. The tool is fabricated by a process that comprises etching columnar pits in a silicon substrate using inductively coupled plasma, followed by reactive ion etching of the columnar pits to create relatively pointed obelisks. The silicon substrate is then preferably rinsed prior to vapor depositing a conductive layer thereon. Finally, a metal is electroformed over the conductive layer to form the embossing tool. The embossing tool is then pressed against an optical coating, for example a polymer sheet, to create microstructures having aspect ratios greater than 5 to 1.
    Type: Application
    Filed: August 27, 2001
    Publication date: February 27, 2003
    Inventors: Alan B. Harker, Jeffrey F. DeNatale, Dennis Strauss
  • Patent number: 5936150
    Abstract: A miniature chemical sensor using a thin film acoustic resonator coated with a chemically sensitive sorbent coating. The thin film acoustic resonator has electrodes separated by a thin piezoelectric layer and is supported by a multilayer resonant acoustic isolator. The resonant acoustic isolator has alternating layers of high and low acoustic impedance material, each layer being one quarter acoustic wavelength thick or an odd multiple thereof at the resonant frequency. The resonant acoustic isolator is solidly mounted on a substrate but provides acoustic isolation between the thin film acoustic resonator and the substrate at a resonant frequency.
    Type: Grant
    Filed: April 13, 1998
    Date of Patent: August 10, 1999
    Assignee: Rockwell Science Center, LLC
    Inventors: Paul H. Kobrin, Charles W. Seabury, Alan B. Harker, Ronald P. O'Toole
  • Patent number: 5349154
    Abstract: A swirl flow microwave plasma torch is provided for the growth of diamond films. The swirl flow torch incorporates an injection nozzle that directs reactant gases into a cylindrical flow tube extending through the center of a tuned microwave cavity. The outer surface of the nozzle comprises a contoured, conical shape that causes inert gas, directed tangentially against the outer surface of the nozzle, to swift in a helical path that surrounds and confines the reactant gas emerging from the nozzle. The tuned cavity is coupled to a microwave energy source to generate a highly localized plasma in the reactant gas in the center of the sheathing swirl of inert gas. The swirl of inert gas contains the plasma in a well-defined shape, prevents in-diffusion of undesirable gases, forms a boundary layer to prevent plasma migration, and provides flow tube cooling. The reactant gas flow forces the plasma out of the flow tube to form a plasma flame that can be impinged on a substrate to induce diamond growth.
    Type: Grant
    Filed: December 17, 1992
    Date of Patent: September 20, 1994
    Assignee: Rockwell International Corporation
    Inventors: Alan B. Harker, Ira B. Goldberg
  • Patent number: 5334342
    Abstract: A high temperature resist process is combined with microlithographic patterning for the production of materials, such as diamond films, that require a high temperature deposition environment. For diamond films, a high temperature silicon nitride resist can be used for microlithographic patterning of a silicon substrate to provide a uniform distribution of diamond nucleation sites and to improve diamond film adhesion to the substrate. A fine-grained nucleation geometry, established at the nucleation sites, is maintained as the diamond film is deposited over the entire substrate after the silicon nitride resist is removed. The process can be extended to form surface relief features, such as "moth eye" surfaces, and microstructures of fine-grained polycrystalline diamond, such as rotatable microgears and surface relief patterns, that have the desirable characteristics of hardness, wear resistance, thermal conductivity, chemical inertness, anti-reflectance, and a low coefficient of friction.
    Type: Grant
    Filed: May 4, 1993
    Date of Patent: August 2, 1994
    Assignee: Rockwell International Corporation
    Inventors: Alan B. Harker, Jeffrey F. DeNatale, Patrick J. Hood, John F. Flintoff
  • Patent number: 5242711
    Abstract: A high temperature resist process is combined with microlithographic patterning for the production of materials, such as diamond films, that require a high temperature deposition environment. A conventional polymeric resist process may be used to deposit a pattern of high temperature resist material. With the high temperature resist in place and the polymeric resist removed, a high temperature deposition process may proceed without degradation of the resist pattern. After a desired film of material has been deposited, the high temperature resist is removed to leave the film in the pattern defined by the resist. For diamond films, a high temperature silicon nitride resist can be used for microlithographic patterning of a silicon substrate to provide a uniform distribution of diamond nucleation sites and to improve diamond film adhesion to the substrate.
    Type: Grant
    Filed: August 16, 1991
    Date of Patent: September 7, 1993
    Assignee: Rockwell International Corp.
    Inventors: Jeffrey D. DeNatale, John F. Flintoff, Alan B. Harker, Patrick J. Hood, Gerald D. Robinson
  • Patent number: 4423623
    Abstract: A meter and a method are provided for measuring the composition and flow rate of a coal slurry and other similar mixtures. The meter is a waveguide through which the mixture flows. Microwaves are propagated in the waveguide from a transmitter probe. A detector probe spaced from the transmitter probe receives signals from the microwaves. Those signals are processed to determine a characteristic frequency of the waveguide or the wavelength of the propagating microwave, which are related to the composition of the mixture within the waveguide. A second transmitter and detector pair determines these properties for another portion of the waveguide. Differences in the frequencies resulting from inhomogenuities in the mixture are cross correlated to determine the flow rate of the mixture.
    Type: Grant
    Filed: August 24, 1981
    Date of Patent: January 3, 1984
    Assignee: Rockwell International Corporation
    Inventors: William W. Ho, Alan B. Harker, Ira B. Goldberg, Kwang E. Chung
  • Patent number: 4049383
    Abstract: A method for the detection and quantitative analysis of certain selected constituent parts of a gas stream. A gas stream containing the selected constituent is introduced into a reaction zone and contacted with metastable mercury (6.sup.3 P.sub.o) atoms to form an excited complex of the selected constituent and the metastable mercury atom, which decomposes emitting light. The intensity of the light emission is measured and directly correlatable to the concentration of the constituent in the gas stream. The method of the present invention is particularly applicable to the measurement of ambient air containing selected constituents in an amount or concentration in the 1-100 ppb range. The method can be used to measure trace amounts of numerous selected constituents contained in a gaseous stream including such constituents as ammonia, hydrazine, water vapor, alcohols and various amines.
    Type: Grant
    Filed: January 6, 1977
    Date of Patent: September 20, 1977
    Assignee: Rockwell International Corporation
    Inventors: C. Shepherd Burton, Alan B. Harker, William W. Ho