Patents by Inventor Alan B. Liu

Alan B. Liu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7561015
    Abstract: A magnet encapsulated within a canister formed from two cans into a laminated structure particularly useful in plasma processing reactors. Each can includes an end wall and a cylindrical sidewall. One can additionally includes an annular lip that slidably fits outside the sidewall of the other can with a small gap therebetween. The magnet is inserted into the two cans together with a flowable and curable adhesive such as epoxy. The cans are slid together and compressed to cause the adhesive to flow between the magnet and the two cans and between the lip of one can and the sidewall of the other. The adhesive is cured to bond the magnet to the cans and to bond the cans together and to also hermetically seal the structure. The cans may be deep drawn from non-magnetic stainless steel with wall thicknesses of less than 0.064 mm.
    Type: Grant
    Filed: December 2, 2003
    Date of Patent: July 14, 2009
    Assignee: Applied Materials, Inc.
    Inventors: Anthony Vesci, Alan B. Liu, Donny Young, Joe F. Sommers, Kevin Hughes
  • Patent number: 6933508
    Abstract: A method and system for providing a texture to a surface of a workpiece is provided. The method comprises providing a workpiece to a texturizing chamber and scanning a beam of electromagnetic energy across the surface of the workpiece to form a plurality of features thereon. The features formed are generally depressions, protuberances, and combinations thereof. Also provided is a method of reducing contamination in a process chamber. The method comprises scanning a beam of electromagnetic energy across a surface of one or more process chamber components to form a plurality of features thereon, positioning the one or more chamber components into a process chamber, and initiating a process sequence within the process chamber.
    Type: Grant
    Filed: March 13, 2002
    Date of Patent: August 23, 2005
    Assignee: Applied Materials, Inc.
    Inventors: Alan R. Popiolkowski, Shannon M. Hart, Marc O. Schweitzer, Alan B. Liu, Jennifer L. Watia
  • Patent number: 6812471
    Abstract: A method and system for providing a texture to a surface of a workpiece, such as a chamber component is provided. The method comprises providing a workpiece to a texturizing chamber and scanning a beam of electromagnetic energy across the surface of the workpiece to form a plurality of features thereon. The features formed are generally depressions, protuberances, and combinations thereof. The chamber components may include, for example, a chamber shield and related assembly, a target, a shadow ring, a contact ring, a substrate support or other component disposable within a processing chamber. Also provided is a method of reducing contamination in a process chamber. The method comprises scanning a beam of electromagnetic energy across a surface of one or more process chamber components to form a plurality of features thereon, positioning the one or more chamber components into a process chamber, and initiating a process sequence within the process chamber.
    Type: Grant
    Filed: July 17, 2003
    Date of Patent: November 2, 2004
    Assignee: Applied Materials, Inc.
    Inventors: Alan R Popiolkowski, Shannon M. Hart, Marc O. Schweitzer, Alan B. Liu, Jennifer L. Watia, Brian West, Mark Menzie
  • Patent number: 6730174
    Abstract: An apparatus for replacing consumables of a vacuum chamber. A unitary removable shield assembly is provided to quickly replace consumables such as a shield. The shield assembly can include an upper adapter assembly, at least one shield member, a cover ring and an insulator member. The shield assembly is designed so that the consumables can be replaced in one step and allows the chamber to continue with its maintenance cycle.
    Type: Grant
    Filed: March 6, 2002
    Date of Patent: May 4, 2004
    Assignee: Applied Materials, Inc.
    Inventors: Alan B. Liu, Ilya Lavitsky, Michael Rosenstein
  • Publication number: 20040056211
    Abstract: A method and system for providing a texture to a surface of a workpiece, such as a chamber component is provided. The method comprises providing a workpiece to a texturizing chamber and scanning a beam of electromagnetic energy across the surface of the workpiece to form a plurality of features thereon. The features formed are generally depressions, protuberances, and combinations thereof. The chamber components may include, for example, a chamber shield and related assembly, a target, a shadow ring, a contact ring, a substrate support or other component disposable within a processing chamber. Also provided is a method of reducing contamination in a process chamber. The method comprises scanning a beam of electromagnetic energy across a surface of one or more process chamber components to form a plurality of features thereon, positioning the one or more chamber components into a process chamber, and initiating a process sequence within the process chamber.
    Type: Application
    Filed: July 17, 2003
    Publication date: March 25, 2004
    Applicant: Applied Materials, Inc.
    Inventors: Alan R. Popiolkowski, Shannon M. Hart, Marc O. Schweitzer, Alan B. Liu, Jennifer L. Watia, Brian West, Mark Menzie
  • Publication number: 20030173526
    Abstract: A method and system for providing a texture to a surface of a workpiece is provided. The method comprises providing a workpiece to a texturizing chamber and scanning a beam of electromagnetic energy across the surface of the workpiece to form a plurality of features thereon. The features formed are generally depressions, protuberances, and combinations thereof. Also provided is a method of reducing contamination in a process chamber. The method comprises scanning a beam of electromagnetic energy across a surface of one or more process chamber components to form a plurality of features thereon, positioning the one or more chamber components into a process chamber, and initiating a process sequence within the process chamber.
    Type: Application
    Filed: March 13, 2002
    Publication date: September 18, 2003
    Applicant: Applied Materials, Inc.
    Inventors: Alan R. Popiolkowski, Shannon M. Hart, Marc O. Schweitzer, Alan B. Liu, Jennifer L. Watia
  • Publication number: 20030168168
    Abstract: An apparatus for replacing consumables of a vacuum chamber. A unitary removable shield assembly is provided to quickly replace consumables such as a shield. The shield assembly can include an upper adapter assembly, at least one shield member, a cover ring and an insulator member. The shield assembly is designed so that the consumables can be replaced in one step and allows the chamber to continue with its maintenance cycle.
    Type: Application
    Filed: March 6, 2002
    Publication date: September 11, 2003
    Applicant: Applied Materials, Inc.
    Inventors: Alan B. Liu, Ilya Lavitsky, Michael Rosenstein