Abstract: Processes for monitoring the levels of oxygen and/or nitrogen in a substantially oxygen and nitrogen-free plasma ashing process generally includes monitoring the plasma using optical emission. An effect produced by the low levels of oxygen and/or nitrogen species present on other species generally abundant in the plasma is monitored and correlated to amounts of oxygen and nitrogen present in the plasma. This so-called “effect detection” process monitors perturbations in the spectra specifically associated with species other than nitrogen and/or oxygen due to the presence of trace amounts of oxygen and/or nitrogen species and is used to quantitatively determine the amount of oxygen and/or nitrogen at a sensitivity on the order of 1 part per million and potentially 1 part per billion.

Abstract: A plasma ashing process for removing photoresist material and post etch residues from a substrate comprising carbon, hydrogen, or a combination of carbon and hydrogen, wherein the substrate comprises a low k dielectric layer, the process comprising forming a plasma from an essentially oxygen free and nitrogen free gas mixture; introducing the plasma into a process chamber, wherein the process chamber comprises a baffle plate assembly in fluid communication with the plasma; flowing the plasma through the baffle plate assembly and removing photoresist material, post etch residues, and volatile byproducts from the substrate; periodically cleaning the process chamber by introducing an oxygen plasma into the process chamber; and cooling the baffle plate assembly by flowing a cooling gas over the baffle plate assembly.

Abstract: A non-contact capacitance sensor having a base and an array disposed on the base is provided. The array has a first electrode and a second electrode disposed opposite one another so that the array senses a change in capacitance between the first and second electrodes.

Abstract: The present invention relates to a wrap around booster (10), and more specifically, the present invention relates to a wrap around booster (10) for use with a high temperature dishwashing machine (40). The wrap around booster (10) heats the water of the dishwashing machine (40) from approximately 110-140° F. to at least 150° F. in the wash tank (11) and at least 180° F. in the rinse tank (26). This is accomplished by keeping a relatively constant volume of water in the rinse tank (26) containing the wrap around booster (10), which maintains the rinse tank water at least 180° F. The rinse tank water surrounds the wash tank (11). The warmer water in the rinse tank (26) surrounding the wash tank (11) therefore heats the water contained in the wash tank (11) through convection. Therefore, one heating system does the work of two heating systems.