Patents by Inventor Alan Blacklock

Alan Blacklock has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10781140
    Abstract: The invention encompasses equipment used to condition a recirculating gas stream in order to cure a CO2 Composite Material (CCM) and processes that use such equipment to cure the CCM. The gas conditioning equipment allows for a process that controls, reduces or eliminates the rate-limiting steps associated with water removal during the curing of a composite material. The equipment may include, but will not be limited to, control over the temperature, relative humidity, flow rate, pressure, and carbon dioxide concentration within the system; which includes the conditioning equipment, any vessel containing the CCM, and the material itself. Flow rate control can be used as a means to achieve uniformity in both gas velocity and composition.
    Type: Grant
    Filed: August 5, 2015
    Date of Patent: September 22, 2020
    Assignee: SOLIDIA TECHNOLOGIES, INC.
    Inventors: Devin Patten, Vahit Atakan, Daniel Castoro, Deepak Ravikumar, John Kuppler, Steven Jensen, Mark Scantlebury, Kenneth Michael Smith, Jorge Mora, Emanuel Rojas, Tom Schuler, Alan Blacklock
  • Publication number: 20150336852
    Abstract: The invention encompasses equipment used to condition a recirculating gas stream in order to cure a CO2 Composite Material (CCM) and processes that use such equipment to cure the CCM. The gas conditioning equipment allows for a process that controls, reduces or eliminates the rate-limiting steps associated with water removal during the curing of a composite material. The equipment may include, but will not be limited to, control over the temperature, relative humidity, flow rate, pressure, and carbon dioxide concentration within the system; which includes the conditioning equipment, any vessel containing the CCM, and the material itself. Flow rate control can be used as a means to achieve uniformity in both gas velocity and composition.
    Type: Application
    Filed: August 5, 2015
    Publication date: November 26, 2015
    Inventors: Devin Patten, Vahit Atakan, Daniel Castoro, Deepak Ravikumar, John Kuppler, Steven Jensen, Mark Scantlebury, Kenneth Michael Smith, Jorge Mora, Emanuel Rojas, Tom Schuler, Alan Blacklock