Abstract: The invention provides an apparatus for separating components of a fluid stream comprising a first centrifugal separator and a further separator; the first centrifugal separator comprising: a support structure and a centrifugal separator unit rotatably mounted on the support structure so as to be rotatable about a rotational axis extending through the centrifugal separator unit; a drive element for driving rotation of the centrifugal separator unit; wherein the centrifugal separator unit comprises a centrifugal separation chamber having an inlet which is connected or connectable to a source of fluid requiring separation, a first outlet for collecting a higher density component of the fluid stream, and a second outlet for collecting a lower density component of the fluid stream; the first outlet being connected or connectable to a first collector for collecting the higher density component and the second outlet being connected or connectable to a second collector for collecting the lower density component.

Abstract: An apparatus for in situ fabrication of multilayer heterostructures is provided comprising a first vacuum chamber adapted for atomic layer deposition and comprising a first stage docking assembly configured to dock a detachable stage configured to support a substrate; a second vacuum chamber adapted for ultra-high vacuum physical or chemical vapor deposition and comprising a second stage docking assembly configured to dock the detachable stage; a load lock vacuum chamber between the first and second vacuum chambers and comprising a third stage docking assembly configured to dock the detachable stage, the load lock vacuum chamber coupled to the first vacuum chamber via a first shared valve and coupled to the second vacuum chamber via a second shared valve; and a substrate transport vacuum chamber comprising a substrate transfer device, the substrate transfer device configured to detachably couple to the detachable stage and to transfer the substrate supported by the detachable stage in situ between the first v

Abstract: An apparatus for in situ fabrication of multilayer heterostructures is provided comprising a first vacuum chamber adapted for atomic layer deposition and comprising a first stage docking assembly configured to dock a detachable stage configured to support a substrate; a second vacuum chamber adapted for ultra-high vacuum physical or chemical vapor deposition and comprising a second stage docking assembly configured to dock the detachable stage; a load lock vacuum chamber between the first and second vacuum chambers and comprising a third stage docking assembly configured to dock the detachable stage, the load lock vacuum chamber coupled to the first vacuum chamber via a first shared valve and coupled to the second vacuum chamber via a second shared valve; and a substrate transport vacuum chamber comprising a substrate transfer device, the substrate transfer device configured to detachably couple to the detachable stage and to transfer the substrate supported by the detachable stage in situ between the first v