Patents by Inventor Alan G. Baillie

Alan G. Baillie has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4435498
    Abstract: In the course of manufacturing a wafer-scale integrated circuit, the metalization for interconnection both within each cell and between cells is achieved by the etching of a single metal layer, photoresist being deposited on the layer and exposed using a step-and-repeat mask for those areas within each cell and using a whole-wafer reticle mask for the areas of interconnection between the cells.
    Type: Grant
    Filed: December 7, 1981
    Date of Patent: March 6, 1984
    Assignee: Burroughs Corporation
    Inventor: Alan G. Baillie