Patents by Inventor Alan K. Nachtigal
Alan K. Nachtigal has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11492453Abstract: Urea (multi)-(meth)acrylate (multi)-silane precursor compounds, synthesized by reaction of (meth)acrylated materials having isocyanate functionality with aminosilane compounds, either neat or in a solvent, and optionally with a catalyst, such as a tin compound, to accelerate the reaction. Also described are articles including a substrate, a base (co)polymer layer on a major surface of the substrate, an oxide layer on the base (co)polymer layer; and a protective (co)polymer layer on the oxide layer, the protective (co)polymer layer including the reaction product of at least one urea (multi)-(meth)acrylate (multi)-silane precursor compound synthesized by reaction of (meth)acrylated materials having isocyanate functionality with aminosilane compounds. The substrate may be a (co)polymer film or an electronic device such as an organic light emitting device, electrophoretic light emitting device, liquid crystal display, thin film transistor, or combination thereof.Type: GrantFiled: August 3, 2020Date of Patent: November 8, 2022Assignee: 3M Innovative Properties CompanyInventors: Thomas P. Klun, Alan K. Nachtigal, Joseph C. Spagnola, Mark A. Roehrig, Jennifer K. Schnobrich, Guy D. Joly, Christopher S. Lyons
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Publication number: 20220213351Abstract: An oriented heat-treated principal film capable of thermally-induced self-forming, including one or more (co)polymers and exhibiting a relaxation temperature (Tr), the oriented heat-treated principal film having opposed first and second major faces, a land portion on the second major face and one or more modification zones on the second major face. A cross-linked (co)polymeric carrier layer is in contact with the first major face. Each modification zone includes a central closed portion and a rim portion surrounding the central closed portion and being surrounded by a land portion. An average thickness of each rim portion is greater than an average thickness of the land portion surrounding the central closed portion. An average thickness of each central closed portion is less than the average thickness of the land portion surrounding the central portion. Methods for making such films and adhesive articles comprising such films are also disclosed.Type: ApplicationFiled: May 22, 2020Publication date: July 7, 2022Inventors: Joel A. Getschel, Aniruddha A. Upadhye, Mark A. Strobel, Taylor J. Kobe, Steven J. McMan, Alan K. Nachtigal, Kevin M. Hamer
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Patent number: 11192989Abstract: Compositions of matter described as urea (multi)-urethane (meth)acrylate-silanes having the general formula RA—NH—C(O)—N(R4)—R11—[O—C(O)NH—RS]n, or RS—NH—C(O)—N(R4)—R11—[O—C(O)NH—RA]n. Also described are articles including a substrate, a base (co)polymer layer on a major surface of the substrate, an oxide layer on the base (co)polymer layer; and a protective (co)polymer layer on the oxide layer, the protective (co)polymer layer including the reaction product of at least one urea (multi)-urethane (meth)acrylate-silane precursor compound. The substrate may be a (co)polymer film or an electronic device such as an organic light emitting device, electrophoretic light emitting device, liquid crystal display, thin film transistor, or combination thereof. Methods of making such urea (multi)-urethane (meth)acrylate-silane precursor compounds, and their use in composite films and electronic devices are also described.Type: GrantFiled: December 6, 2019Date of Patent: December 7, 2021Assignee: 3M INNOVATIVE PROPERTIES COMPANYInventors: Thomas P. Klun, Alan K. Nachtigal, Joseph C. Spagnola, Mark A. Roehrig, Jennifer K. Schnobrich, Guy D. Joly, Christopher S. Lyons
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Patent number: 11174361Abstract: Compositions of matter described as urea (multi)-urethane (meth)acrylate-silanes having the general formula RA—NH—C(O)—N(R4)—R11—[O—C(O)NH—RS]n, or RS—NH—C(O)—N(R4)—R11—[O—C(O)NH—RA]n. Also described are articles including a substrate, a base (co)polymer layer on a major surface of the substrate, an oxide layer on the base (co)polymer layer; and a protective (co)polymer layer on the oxide layer, the protective (co)polymer layer including the reaction product of at least one urea (multi)-urethane (meth)acrylate-silane precursor compound. The substrate may be a (co)polymer film or an electronic device such as an organic light emitting device, electrophoretic light emitting device, liquid crystal display, thin film transistor, or combination thereof. Methods of making such urea (multi)-urethane (meth)acrylate-silane precursor compounds, and their use in composite films and electronic devices are also described.Type: GrantFiled: December 5, 2019Date of Patent: November 16, 2021Assignee: 3M INNOVATIVE PROPERTIES COMPANYInventors: Thomas P. Klun, Alan K. Nachtigal, Joseph C. Spagnola, Mark A. Roehrig, Jennifer K. Schnobrich, Guy D. Joly, Christopher S. Lyons
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Patent number: 11130849Abstract: A process for making a barrier film having a substrate, a base polymer layer applied to the substrate, an oxide layer applied to the base polymer layer, and a top coat polymer layer applied to the oxide layer is provided. An optional inorganic layer can be applied over the top coat polymer layer. The top coat polymer layer is formed by vapor depositing and curing cyclic aza-silane and acrylate monomer. The use of a silane co-deposited with an acrylate to form the top coat layer of the barrier films provide for enhanced resistance to moisture and improved peel strength adhesion of the top coat layer to the underlying barrier stack layers.Type: GrantFiled: January 24, 2019Date of Patent: September 28, 2021Assignee: 3M INNOVATIVE PROPERTIES COMPANYInventors: Mark A. Roehrig, Alan K. Nachtigal, Mark D. Weigel
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Patent number: 10947618Abstract: A barrier film including a substrate; a base polymer layer adjacent to the substrate; an oxide layer adjacent to the base polymer layer; a adhesion-modifying layer adjacent to the oxide layer; and a top coat polymer layer adjacent to the adhesion-modifying layer. An optional inorganic layer can be applied over the top coat polymer layer. The inclusion of a adhesion-modifying layer provides for enhanced resistance to moisture and improved peel strength adhesion of the top coat polymer layer to the underlying barrier stack layers.Type: GrantFiled: February 4, 2019Date of Patent: March 16, 2021Assignee: 3M INNOVATIVE PROPERTIES COMPANYInventors: Joseph C. Spagnola, Mark A. Roehrig, Thomas P. Klun, Alan K. Nachtigal, Christopher S. Lyons, Guy D. Joly
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Publication number: 20200362190Abstract: Urea (multi)-(meth)acrylate (multi)-silane precursor compounds, synthesized by reaction of (meth)acrylated materials having isocyanate functionality with aminosilane compounds, either neat or in a solvent, and optionally with a catalyst, such as a tin compound, to accelerate the reaction. Also described are articles including a substrate, a base (co)polymer layer on a major surface of the substrate, an oxide layer on the base (co)polymer layer; and a protective (co)polymer layer on the oxide layer, the protective (co)polymer layer including the reaction product of at least one urea (multi)-(meth)acrylate (multi)-silane precursor compound synthesized by reaction of (meth)acrylated materials having isocyanate functionality with aminosilane compounds. The substrate may be a (co)polymer film or an electronic device such as an organic light emitting device, electrophoretic light emitting device, liquid crystal display, thin film transistor, or combination thereof.Type: ApplicationFiled: August 3, 2020Publication date: November 19, 2020Inventors: Thomas P. Klun, Alan K. Nachtigal, Joseph C. Spagnola, Mark A. Roehrig, Jennifer K. Schnobrich, Guy D. Joly, Christopher S. Lyons
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Patent number: 10804419Abstract: Encapsulated device including a photovoltaic cell and a composite film overlaying at least a portion of the photovoltaic cell, the composite film further including a substrate, a base (co)polymer layer on a major surface of the substrate, an oxide layer on the base (co)polymer layer, and a protective (co)polymer layer derived from a silane precursor compound on the oxide layer.Type: GrantFiled: January 15, 2018Date of Patent: October 13, 2020Assignee: 3M INNOVATIVE PROPERTIES COMPANYInventors: Thomas P. Klun, Alan K. Nachtigal, Joseph C. Spagnola, Mark A. Roehrig, Jennifer K. Schnobrich, Guy D. Joly
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Patent number: 10784455Abstract: A barrier film including a substrate, a base (co)polymer layer applied on a major surface of the substrate, an oxide layer applied on the base (co)polymer layer, and a protective (co)polymer layer applied on the oxide layer. The protective (co)polymer layer is formed as the reaction product of a first (meth)acryloyl compound and a (meth)acryl-silane compound derived from a Michael reaction between a second (meth)acryloyl compound and an aminosilane. The first and second (meth)acryloyl compounds may be the same. In some embodiments, a multiplicity of alternating layers of the oxide layer and the protective (co)polymer layer may be used. An oxide layer can be applied over the top protective (co)polymer layer. The barrier films provide, in some embodiments, enhanced resistance to moisture and improved peel strength adhesion of the protective (co)polymer layer(s) to the underlying layers. A process of making, and methods of using the barrier film are also described.Type: GrantFiled: January 15, 2018Date of Patent: September 22, 2020Assignee: 3M INNOVATIVE PROPERTIES COMPANYInventors: Thomas P. Klun, Suresh Iyer, Alan K. Nachtigal, Joseph C. Spagnola, Mark A. Roehrig
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Patent number: 10774236Abstract: Urea (multi)-(meth)acrylate (multi)-silane precursor compounds, synthesized by reaction of (meth)acrylated materials having isocyanate functionality with aminosilane compounds, either neat or in a solvent, and optionally with a catalyst, such as a tin compound, to accelerate the reaction. Also described are articles including a substrate, a base (co)polymer layer on a major surface of the substrate, an oxide layer on the base (co)polymer layer; and a protective (co)polymer layer on the oxide layer, the protective (co)polymer layer including the reaction product of at least one urea (multi)-(meth)acrylate (multi)-silane precursor compound synthesized by reaction of (meth)acrylated materials having isocyanate functionality with aminosilane compounds. The substrate may be a (co)polymer film or an electronic device such as an organic light emitting device, electrophoretic light emitting device, liquid crystal display, thin film transistor, or combination thereof.Type: GrantFiled: April 17, 2018Date of Patent: September 15, 2020Assignee: 3M INNOVATIVE PROPERTIES, COMPANYInventors: Thomas P. Klun, Alan K. Nachtigal, Joseph C. Spagnola, Mark A. Roehrig, Jennifer K. Schnobrich, Guy D. Joly, Christopher S. Lyons
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Patent number: 10693024Abstract: An assembly that includes a barrier film interposed between a first polymeric film substrate and a first major surface of a pressure sensitive adhesive layer is provided. The first polymeric film substrate has a first coefficient of thermal expansion that is, in some embodiments, up to 50 parts per million per Kelvin. The pressure sensitive adhesive layer has a second major surface opposite the first major surface that is disposed on a second polymeric film substrate. The second polymeric film substrate is typically resistant to degradation by ultraviolet light. In some embodiments, the second polymeric film substrate has a second coefficient of thermal expansion that is at least 40 parts per million per Kelvin higher than the first coefficient of thermal expansion. The assembly is transmissive to visible and infrared light.Type: GrantFiled: June 25, 2018Date of Patent: June 23, 2020Assignee: 3M INNOVATIVE PROPERTIES COMPANYInventors: Mark D. Weigel, Mark A. Roehrig, Alan K. Nachtigal, Samuel Kidane, Andrew J. Henderson
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Patent number: 10636920Abstract: A barrier film that includes a substrate, a first polymer layer on a major surface of the substrate, an oxide layer on the first polymer layer, and a second polymer layer on the oxide layer. At least one of the first or second polymer layers includes a siloxane reaction product of a secondary or tertiary amino-functional silane having at least two silane groups. A method of making the barrier film and articles and a barrier assembly including the barrier film are also disclosed.Type: GrantFiled: August 8, 2013Date of Patent: April 28, 2020Assignee: 3M Innovative Properties CompanyInventors: Joseph C. Spagnola, Mark A. Roehrig, Thomas P. Klun, Alan K. Nachtigal, Jennifer K. Schnobrich, Guy D. Joly
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Publication number: 20200115586Abstract: Compositions of matter described as urea (multi)-urethane (meth)acrylate-silanes having the general formula RA—NH—C(O)—N(R4)—R11—[O—C(O)NH—RS]n, or RS—NH—C(O)—N(R4)—R11—[O—C(O)NH—RA]n. Also described are articles including a substrate, a base (co)polymer layer on a major surface of the substrate, an oxide layer on the base (co)polymer layer; and a protective (co)polymer layer on the oxide layer, the protective (co)polymer layer including the reaction product of at least one urea (multi)-urethane (meth)acrylate-silane precursor compound. The substrate may be a (co)polymer film or an electronic device such as an organic light emitting device, electrophoretic light emitting device, liquid crystal display, thin film transistor, or combination thereof. Methods of making such urea (multi)-urethane (meth)acrylate-silane precursor compounds, and their use in composite films and electronic devices are also described.Type: ApplicationFiled: December 6, 2019Publication date: April 16, 2020Inventors: Thomas P. Klun, Alan K. Nachtigal, Joseph C. Spagnola, Mark A. Roehrig, Jennifer K. Schnobrich, Guy D. Joly, Christopher S. Lyons
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Publication number: 20200109309Abstract: Compositions of matter described as urea (multi)-urethane (meth)acrylate-silanes having the general formula RA—NH—C(O)—N(R4)—R11—[O—C(O)NH—Rs]n, or RS—NH—C(O)—N(R4)—R11—[O—C(O)NH—RA]n. Also described are articles including a substrate, a base (co)polymer layer on a major surface of the substrate, an oxide layer on the base (co)polymer layer; and a protective (co)polymer layer on the oxide layer, the protective (co)polymer layer including the reaction product of at least one urea (multi)-urethane (meth)acrylate-silane precursor compound. The substrate may be a (co)polymer film or an electronic device such as an organic light emitting device, electrophoretic light emitting device, liquid crystal display, thin film transistor, or combination thereof. Methods of making such urea (multi)-urethane (meth)acrylate-silane precursor compounds, and their use in composite films and electronic devices are also described.Type: ApplicationFiled: December 5, 2019Publication date: April 9, 2020Inventors: Thomas P. Klun, Alan K. Nachtigal, Joseph C. Spagnola, Mark A. Roehrig, Jennifer K. Schnobrich, Guy D. Joly, Christopher S. Lyons
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Patent number: 10533111Abstract: Compositions of matter described as urea (multi)-urethane (meth)acrylate-silanes having the general formula RA—NH—C(O)—N(R4)—R11—[O—C(O)NH—RS]n, or RS—NH—C(O)—N(R4)—R11—[O—C(O)NH—RA]n. Also described are articles including a substrate, a base (co)polymer layer on a major surface of the substrate, an oxide layer on the base (co)polymer layer; and a protective (co)polymer layer on the oxide layer, the protective (co)polymer layer including the reaction product of at least one urea (multi)-urethane (meth)acrylate-silane precursor compound. The substrate may be a (co)polymer film or an electronic device such as an organic light emitting device, electrophoretic light emitting device, liquid crystal display, thin film transistor, or combination thereof. Methods of making such urea (multi)-urethane (meth)acrylate-silane precursor compounds, and their use in composite films and electronic devices are also described.Type: GrantFiled: January 15, 2018Date of Patent: January 14, 2020Assignee: 3M INNOVATIVE PROPERTIES COMPANYInventors: Thomas P. Klun, Alan K. Nachtigal, Joseph C. Spagnola, Mark A. Roehrig, Jennifer K. Schnobrich, Guy D. Joly, Christopher S. Lyons
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Patent number: 10450332Abstract: Compounds having hindered amine and oxyalkyl amine light stabilizers can mitigate the adverse effects of actinic radiation, such as visible and ultraviolet light, in particular on substrates such as glass or ceramic substrates. Polymers derived from such compounds. Nanoparticles, substrates, such as glass or ceramic substrates, or both nanoparticles and substrates, having such compounds affixed thereto. Articles containing at least one of such polymers, nanoparticles, substrates, or compounds.Type: GrantFiled: August 28, 2018Date of Patent: October 22, 2019Assignee: 3M Innovative Properties CompanyInventors: Thomas P. Klun, Mark A. Roehrig, Joseph C. Spagnola, Alan K. Nachtigal, Charles J. Hoy, Richard J. Pokorny, William J. Hunt, Jason T. Petrin, Paul B. Armstrong, Suresh S. Iyer
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Publication number: 20190180968Abstract: A barrier film including a substrate; a base polymer layer adjacent to the substrate; an oxide layer adjacent to the base polymer layer; a adhesion-modifying layer adjacent to the oxide layer; and a top coat polymer layer adjacent to the adhesion-modifying layer. An optional inorganic layer can be applied over the top coat polymer layer. The inclusion of a adhesion-modifying layer provides for enhanced resistance to moisture and improved peel strength adhesion of the top coat polymer layer to the underlying barrier stack layers.Type: ApplicationFiled: February 4, 2019Publication date: June 13, 2019Inventors: JOSEPH C. SPAGNOLA, MARK A. ROEHRIG, THOMAS P. KLUN, ALAN K. NACHTIGAL, CHRISTOPHER S. LYONS, GUY D. JOLY
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Publication number: 20190153586Abstract: A process for making a barrier film having a substrate, a base polymer layer applied to the substrate, an oxide layer applied to the base polymer layer, and a top coat polymer layer applied to the oxide layer is provided. An optional inorganic layer can be applied over the top coat polymer layer. The top coat polymer layer is formed by vapor depositing and curing cyclic aza-silane and acrylate monomer. The use of a silane co-deposited with an acrylate to form the top coat layer of the barrier films provide for enhanced resistance to moisture and improved peel strength adhesion of the top coat layer to the underlying barrier stack layers.Type: ApplicationFiled: January 24, 2019Publication date: May 23, 2019Inventors: Mark A. Roehrig, Alan K. Nachtigal, Mark D. Weigel
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Patent number: 10227688Abstract: A barrier film having a substrate, a base polymer layer applied to the substrate, an oxide layer applied to the base polymer layer, and a top coat polymer layer applied to the oxide layer. An optional inorganic layer can be applied over the top coat polymer layer. The top coat polymer includes a silane and an acrylate co-deposited to form the top coat layer. The use of a silane co-deposited with an acrylate to form the top coat layer of the barrier films provide for enhanced resistance to moisture and improved peel strength adhesion of the top coat layer to the underlying barrier stack layers.Type: GrantFiled: January 4, 2016Date of Patent: March 12, 2019Assignee: 3M INNOVATIVE PROPERTIES COMPANYInventors: Mark A. Roehrig, Alan K. Nachtigal, Mark D. Weigel
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Publication number: 20180362553Abstract: Compounds having hindered amine and oxyalkyl amine light stabilizers can mitigate the adverse effects of actinic radiation, such as visible and ultraviolet light, in particular on substrates such as glass or ceramic substrates. Polymers derived from such compounds. Nanoparticles, substrates, such as glass or ceramic substrates, or both nanoparticles and substrates, having such compounds affixed thereto. Articles containing at least one of such polymers, nanoparticles, substrates, or compounds.Type: ApplicationFiled: August 28, 2018Publication date: December 20, 2018Inventors: Thomas P. Klun, Mark A. Roehrig, Joseph C. Spagnola, Alan K. Nachtigal, Charles J. Hoy, Richard J. Pokorny, William J. Hunt, Jason T. Petrin, Paul B. Armstrong, Suresh S. Iyer