Patents by Inventor Alan Monk

Alan Monk has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20070269727
    Abstract: Radiation-sensitive negative working element comprising (a) a substrate with a hydrophilic surface and (b) a layer on the hydrophilic surface of the substrate, wherein said layer comprises a modified polymer obtainable by reacting (i) a polymer with —COOH, —SO3H, —P03H2 and/or —PO4H2 in the side chains, wherein the polymer is soluble in aqueous alkaline solutions and the solubility is not changed by IR radiation, and (ii) a salt with an inorganic or organic cation, wherein the modified polymer is soluble in aqueous alkaline solutions and the solubility is not changed by IR radiation, said layer being soluble in aqueous alkaline developer, but is rendered insoluble in aqueous alkaline developer by IR radiation.
    Type: Application
    Filed: June 15, 2005
    Publication date: November 22, 2007
    Applicant: KODAK POLYCHROME GRAPHICS GMBH
    Inventors: Celin Savariar-Hauck, Alan Monk, Rene Ullrich
  • Patent number: 6911296
    Abstract: The present invention also includes an imageable element, comprising a substrate and a thermally imageable composition comprising a thermally sensitive polymer which exhibits an increased solubility in an aqueous developer solution upon heating. The thermally sensitive polymer includes at least one covalently bonded unit and at least one thermally reversible non-covalently bonded unit, which includes a two or more centered H-bond within each of the non-covalently bonded unit. The present invention also includes a method of producing the imaged element. The present invention still further includes a thermally imageable composition comprising comprising a thermally sensitive polymer according to the present invention and a process for preparing the thermally sensitive polymer, which is a supramolecular polymer.
    Type: Grant
    Filed: November 19, 2002
    Date of Patent: June 28, 2005
    Assignee: Kodak Polychrome Graphics LLC
    Inventors: Peter S. Pappas, Alan Monk, Shashikant Saraiya, Jianbing Huang
  • Publication number: 20030129506
    Abstract: The present invention also includes an imageable element, comprising a substrate and a thermally imageable composition comprising a thermally sensitive polymer which exhibits an increased solubility in an aqueous developer solution upon heating. The thermally sensitive polymer includes at least one covalently bonded unit and at least one thermally reversible non-covalently bonded unit, which includes a two or more centered H-bond within each of the non-covalently bonded unit. The present invention also includes a method of producing the imaged element. The present invention still further includes a thermally imageable composition comprising comprising a thermally sensitive polymer according to the present invention and a process for preparing the thermally sensitive polymer, which is a supramolecular polymer.
    Type: Application
    Filed: November 19, 2002
    Publication date: July 10, 2003
    Applicant: Kodak Polychrome Graphics, L.L.C.
    Inventors: Peter S. Pappas, Alan Monk, Shashikant Saraiya, Jianbing Huang
  • Patent number: 6506536
    Abstract: The present invention also includes an imageable element, comprising a substrate and a thermally imageable composition comprising a thermally sensitive polymer which exhibits an increased solubility in an aqueous developer solution upon heating. The thermally sensitive polymer includes at least one covalently bonded unit and at least one thermally reversible non-covalently bonded unit, which includes a two or more centered H-bond within each of the non-covalently bonded unit. The present invention also includes a method of producing the imaged element. The present invention still further includes a thermally imageable composition comprising comprising a thermally sensitive polymer according to the present invention and a process for preparing the thermally sensitive polymer, which is a supramolecular polymer.
    Type: Grant
    Filed: December 29, 2000
    Date of Patent: January 14, 2003
    Assignee: Kodak Polychrome Graphics, LLC
    Inventors: S. Peter Pappas, Alan Monk, Shashikant Saraiya, Jianbing Huang
  • Publication number: 20020150833
    Abstract: The present invention also includes an imageable element, comprising a substrate and a thermally imageable composition comprising a thermally sensitive polymer which exhibits an increased solubility in an aqueous developer solution upon heating. The thermally sensitive polymer includes at least one covalently bonded unit and at least one thermally reversible non-covalently bonded unit, which includes a two or more centered H-bond within each of the non-covalently bonded unit. The present invention also includes a method of producing the imaged element. The present invention still further includes a thermally imageable composition comprising comprising a thermally sensitive polymer according to the present invention and a process for preparing the thermally sensitive polymer, which is a supramolecular polymer.
    Type: Application
    Filed: December 29, 2000
    Publication date: October 17, 2002
    Applicant: KODAK POLYCHROME GRAPHICS, L.L.C.
    Inventors: S. Peter Pappas, Alan Monk, Shashkant Saraiya, Jianbing Huang
  • Patent number: D444198
    Type: Grant
    Filed: January 24, 2000
    Date of Patent: June 26, 2001
    Inventors: Steven Alan Monk, Keith E. Kearns