Abstract: A device comprises an image sensor having a group of pixels, wherein each pixel of the group of pixels comprises a microlens located on top of the pixel, the microlens being configured to transmit light to the pixel. The device further comprises at least one optical element, wherein each pixel of the group of pixels is covered with an optical element. The optical element comprises two transparent electrode layers aligned with the covered pixels, and a material between the two transparent electrode layers, the material being configured to change its refractive index when a voltage is applied over it, wherein the device is configured to control the transmission of the light to the covered pixels by varying the voltage of the electrode layer being aligned with the covered pixels. The invention also relates to a method and to a method for manufacturing an image sensor.