Patents by Inventor Alan Ritzer
Alan Ritzer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 5391227Abstract: Siloxane fluids containing novel siloxane polymers prepared from mixtures of disilanes, disiloxanes and silylmethylenes, and a method for recovering fully alkylated linear and cyclic siloxanes with disilane, disiloxane and silylmethylene bonds, such as from methylchlorosilane residue cleavage bottoms, are disclosed.Type: GrantFiled: December 30, 1993Date of Patent: February 21, 1995Assignee: General Electric CompanyInventors: Robert G. Stank, Luisito A. Tolentino, Alan Ritzer, Frank J. Traver
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Patent number: 5321149Abstract: A method is provided for passivating spent silicon contact mass by heating the spent silicon contact mass at a temperature in the range of from 200.degree. C. to 800.degree. C. in an oxygen containing atmosphere.Type: GrantFiled: December 9, 1992Date of Patent: June 14, 1994Assignee: General Electric CompanyInventors: Steven W. Webb, Alan Ritzer, John D. Neely
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Patent number: 5312946Abstract: Siloxane fluids containing novel siloxane polymers prepared from mixtures of disilanes, disiloxanes and silylmethylenes, and a method for recovering fully alkylated linear and cyclic siloxanes with disilane, disiloxane and silylmethylene bonds, such as from methylchlorosilane residue cleavage bottoms, are disclosed.Type: GrantFiled: April 13, 1992Date of Patent: May 17, 1994Assignee: General Electric CompanyInventors: Robert G. Stank, Luisito A. Tolentino, Alan Ritzer, Frank J. Traver
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Patent number: 5274158Abstract: A method is provided for passivating spent silicon contact mass by treating the spent silicon contact mass at a temperature in range of from 900.degree. C. to 1500.degree. C. in an inert atmosphere.Type: GrantFiled: April 13, 1992Date of Patent: December 28, 1993Assignee: General Electric CompanyInventors: Steven W. Webb, Alan Ritzer, John D. Neely
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Patent number: 5243061Abstract: A method for making organohalosilanes is provided utilizing spent contact mass generated during the production of organohalosilanes by the direct method which has been treated in an oxygen containing atmosphere to render it non-pyrophoric in air.Type: GrantFiled: December 9, 1992Date of Patent: September 7, 1993Assignee: General Electric CompanyInventors: Steven W. Webb, Alan Ritzer, John D. Neely
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Patent number: 5239102Abstract: A method for making organohalosilanes is provided utilizing a spent contact mass generated during the production of organohalosilanes by the direct method which has been thermally treated to render it non-reactive in air.Type: GrantFiled: April 13, 1992Date of Patent: August 24, 1993Assignee: General Electric CompanyInventors: Steven W. Webb, Alan Ritzer, John D. Neely
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Patent number: 5126203Abstract: Residual silicone from direct process manufacture of chlorosilanes is stabilized for transportation and disposal by pelletizing finely divided particles of finely divided residual silicon powder contaminated with chlorine, hydrogen, and oxygen and highly reactive and exothermic upon exposure to moisture, and impregnating the pellets with an organic binder.Type: GrantFiled: September 3, 1991Date of Patent: June 30, 1992Assignee: General Electric CompanyInventors: Alan Ritzer, George P. Moloney, Jr., Jack C. Leunig
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Patent number: 4892694Abstract: Residual silicone from direct process manufacture of chlorosilanes is stabilized for transportation and disposal.Type: GrantFiled: January 13, 1989Date of Patent: January 9, 1990Assignee: General Electric CompanyInventors: Alan Ritzer, George P. Moloney, Jr., Jack C. Leunig
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Patent number: 4554370Abstract: The use of fumed silica in a mixture of powdered silicon and cuprous chloride has been found to reduce agglomeration in a fluid bed reactor during the production of alkylhalosilane under continuous conditions.Type: GrantFiled: October 29, 1984Date of Patent: November 19, 1985Assignee: General Electric CompanyInventors: William J. Ward, III, Alan Ritzer, Heine Lapidot
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Patent number: 4500724Abstract: A method is provided for making alkylhalosilanes by effecting reaction between an alkyl halide, such as methyl chloride and powdered silicon in the presence of a copper-zinc-tin catalyst. Significant improvements in reaction rate and product selectivity are achieved when copper is employed at a critical weight percent relative to silicon and critical weight ratios of tin and zinc are employed relative to copper.Type: GrantFiled: July 28, 1983Date of Patent: February 19, 1985Assignee: General Electric CompanyInventors: William J. Ward, III, Alan Ritzer, Kenneth M. Carroll, John W. Flock
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Patent number: 4487950Abstract: A process is provided for making methylchlorosilanes based on the reaction of methylchloride and particulated silicon, which has been contacted with a mixture of partially oxidized copper catalyst and copper formate. A reduction is achieved in the percent by weight of residue which are the silicon products in the methylchlorosilane crude having boiling points exceeding 70.degree. C. at atmospheric pressure, while the weight percent of disilane in such residue cleavable to useful chlorosilane monomer is not adversely affected.Type: GrantFiled: January 7, 1983Date of Patent: December 11, 1984Assignee: General Electric CompanyInventors: William J. Ward, III, George L. Gaines, Jr., Alan Ritzer
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Patent number: 4450282Abstract: An improved direct process for producing organohalosilanes and particularly diorganodihalosilanes from silicon metal and an organohalide comprising contacting the two reactants in the presence of a partially oxidized copper catalyst having a surface area of at least 3.5 m.sup.2 /gm and wherein 100% of the particles are less than 35 microns in size and wherein 100% of the particles are over 0.7 microns in size.Type: GrantFiled: July 29, 1981Date of Patent: May 22, 1984Assignee: General Electric CompanyInventors: Alan Ritzer, Heine Lapidot
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Patent number: 4393229Abstract: A process is described for converting the alkyl-rich disilanes in the residue obtained from the manufacture of alkylhalosilanes to halogen-rich polysilanes with alkyltrihalosilanes and simultaneously converting the alkyltrihalosilanes to dialkyldihalosilanes by reacting the alkyl-rich polysilanes in the residue and the alkyltrihalosilanes at an elevated temperature in the presence of a suitable catalyst and a catalytic amount of a hydrosilane reaction promoter. In a preferred embodiment, the residue containing alkyl-rich disilanes is treated with methyltrichlorosilane at a temperature of about 100.degree. C. to about 250.degree. C. in the presence of aluminum trichloride catalyst and a catalytic amount of methyldichlorosilane.Type: GrantFiled: April 28, 1982Date of Patent: July 12, 1983Assignee: General Electric CompanyInventors: Alan Ritzer, Abraham L. Hajjar, Harry R. McEntee, Ray W. Shade
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Patent number: 4390510Abstract: Improved yields of monohydrogentrihalosilanes are achieved by contacting the residual silicon obtained from the preparation of organohalosilanes by a metal-catalyzed direct process by contacting the residual silicon simultaneously with gaseous hydrogen halide and with gaseous alkyl halide to form a residual silicon contact mass; selecting a temperature between about 200.degree. C. and about 350.degree. C. at which alkylation of the silicon contact mass in inhibited and at which hydrohalogenation of the silicon contact mass occurs; and heating the silicon contact mass at the selected temperature. The silicon reacts with the gaseous alkyl halide and the gaseous hydrogen halide at the selected temperature to produce improved yields of the monohydrogentrihalosilane.Type: GrantFiled: February 16, 1982Date of Patent: June 28, 1983Assignee: General Electric CompanyInventors: Alan Ritzer, Bakulesh Shah, Daniel E. Sliva
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Patent number: 4307242Abstract: A process for recovering and recycling elementary silicon from a direct process organohalosilane reactor system is provided, comprising the steps of analyzing a portion of effluent contact mass, such as the silicon fines from a secondary cyclone with a particle size distribution analyzer, determing the fines fractions containing the relatively greatest amounts of impurities and segregating a relatively impure fine fraction from a purer coarse fraction with the aid of an aerodynamic centrifugal classifier.Type: GrantFiled: November 24, 1980Date of Patent: December 22, 1981Assignee: General Electric CompanyInventors: Bakulesh N. Shah, Alan Ritzer
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Patent number: RE33452Abstract: A method is provided for making alkylhalosilanes by effecting reaction between an alkyl halide, such as methyl chloride and powdered silicon in the presence of a copper-zinc-tin catalyst. Significant improvements in reaction rate and product selectivity are achieved when copper is employed at a critical weight percent relative to silicon and critical weight ratios of tin and zinc are employed relative to copper.Type: GrantFiled: September 25, 1986Date of Patent: November 20, 1990Assignee: General Electric CompanyInventors: William J. Ward, III, Alan Ritzer, Kenneth M. Carroll, John W. Flock