Patents by Inventor Alan Ritzer

Alan Ritzer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5391227
    Abstract: Siloxane fluids containing novel siloxane polymers prepared from mixtures of disilanes, disiloxanes and silylmethylenes, and a method for recovering fully alkylated linear and cyclic siloxanes with disilane, disiloxane and silylmethylene bonds, such as from methylchlorosilane residue cleavage bottoms, are disclosed.
    Type: Grant
    Filed: December 30, 1993
    Date of Patent: February 21, 1995
    Assignee: General Electric Company
    Inventors: Robert G. Stank, Luisito A. Tolentino, Alan Ritzer, Frank J. Traver
  • Patent number: 5321149
    Abstract: A method is provided for passivating spent silicon contact mass by heating the spent silicon contact mass at a temperature in the range of from 200.degree. C. to 800.degree. C. in an oxygen containing atmosphere.
    Type: Grant
    Filed: December 9, 1992
    Date of Patent: June 14, 1994
    Assignee: General Electric Company
    Inventors: Steven W. Webb, Alan Ritzer, John D. Neely
  • Patent number: 5312946
    Abstract: Siloxane fluids containing novel siloxane polymers prepared from mixtures of disilanes, disiloxanes and silylmethylenes, and a method for recovering fully alkylated linear and cyclic siloxanes with disilane, disiloxane and silylmethylene bonds, such as from methylchlorosilane residue cleavage bottoms, are disclosed.
    Type: Grant
    Filed: April 13, 1992
    Date of Patent: May 17, 1994
    Assignee: General Electric Company
    Inventors: Robert G. Stank, Luisito A. Tolentino, Alan Ritzer, Frank J. Traver
  • Patent number: 5274158
    Abstract: A method is provided for passivating spent silicon contact mass by treating the spent silicon contact mass at a temperature in range of from 900.degree. C. to 1500.degree. C. in an inert atmosphere.
    Type: Grant
    Filed: April 13, 1992
    Date of Patent: December 28, 1993
    Assignee: General Electric Company
    Inventors: Steven W. Webb, Alan Ritzer, John D. Neely
  • Patent number: 5243061
    Abstract: A method for making organohalosilanes is provided utilizing spent contact mass generated during the production of organohalosilanes by the direct method which has been treated in an oxygen containing atmosphere to render it non-pyrophoric in air.
    Type: Grant
    Filed: December 9, 1992
    Date of Patent: September 7, 1993
    Assignee: General Electric Company
    Inventors: Steven W. Webb, Alan Ritzer, John D. Neely
  • Patent number: 5239102
    Abstract: A method for making organohalosilanes is provided utilizing a spent contact mass generated during the production of organohalosilanes by the direct method which has been thermally treated to render it non-reactive in air.
    Type: Grant
    Filed: April 13, 1992
    Date of Patent: August 24, 1993
    Assignee: General Electric Company
    Inventors: Steven W. Webb, Alan Ritzer, John D. Neely
  • Patent number: 5126203
    Abstract: Residual silicone from direct process manufacture of chlorosilanes is stabilized for transportation and disposal by pelletizing finely divided particles of finely divided residual silicon powder contaminated with chlorine, hydrogen, and oxygen and highly reactive and exothermic upon exposure to moisture, and impregnating the pellets with an organic binder.
    Type: Grant
    Filed: September 3, 1991
    Date of Patent: June 30, 1992
    Assignee: General Electric Company
    Inventors: Alan Ritzer, George P. Moloney, Jr., Jack C. Leunig
  • Patent number: 4892694
    Abstract: Residual silicone from direct process manufacture of chlorosilanes is stabilized for transportation and disposal.
    Type: Grant
    Filed: January 13, 1989
    Date of Patent: January 9, 1990
    Assignee: General Electric Company
    Inventors: Alan Ritzer, George P. Moloney, Jr., Jack C. Leunig
  • Patent number: 4554370
    Abstract: The use of fumed silica in a mixture of powdered silicon and cuprous chloride has been found to reduce agglomeration in a fluid bed reactor during the production of alkylhalosilane under continuous conditions.
    Type: Grant
    Filed: October 29, 1984
    Date of Patent: November 19, 1985
    Assignee: General Electric Company
    Inventors: William J. Ward, III, Alan Ritzer, Heine Lapidot
  • Patent number: 4500724
    Abstract: A method is provided for making alkylhalosilanes by effecting reaction between an alkyl halide, such as methyl chloride and powdered silicon in the presence of a copper-zinc-tin catalyst. Significant improvements in reaction rate and product selectivity are achieved when copper is employed at a critical weight percent relative to silicon and critical weight ratios of tin and zinc are employed relative to copper.
    Type: Grant
    Filed: July 28, 1983
    Date of Patent: February 19, 1985
    Assignee: General Electric Company
    Inventors: William J. Ward, III, Alan Ritzer, Kenneth M. Carroll, John W. Flock
  • Patent number: 4487950
    Abstract: A process is provided for making methylchlorosilanes based on the reaction of methylchloride and particulated silicon, which has been contacted with a mixture of partially oxidized copper catalyst and copper formate. A reduction is achieved in the percent by weight of residue which are the silicon products in the methylchlorosilane crude having boiling points exceeding 70.degree. C. at atmospheric pressure, while the weight percent of disilane in such residue cleavable to useful chlorosilane monomer is not adversely affected.
    Type: Grant
    Filed: January 7, 1983
    Date of Patent: December 11, 1984
    Assignee: General Electric Company
    Inventors: William J. Ward, III, George L. Gaines, Jr., Alan Ritzer
  • Patent number: 4450282
    Abstract: An improved direct process for producing organohalosilanes and particularly diorganodihalosilanes from silicon metal and an organohalide comprising contacting the two reactants in the presence of a partially oxidized copper catalyst having a surface area of at least 3.5 m.sup.2 /gm and wherein 100% of the particles are less than 35 microns in size and wherein 100% of the particles are over 0.7 microns in size.
    Type: Grant
    Filed: July 29, 1981
    Date of Patent: May 22, 1984
    Assignee: General Electric Company
    Inventors: Alan Ritzer, Heine Lapidot
  • Patent number: 4393229
    Abstract: A process is described for converting the alkyl-rich disilanes in the residue obtained from the manufacture of alkylhalosilanes to halogen-rich polysilanes with alkyltrihalosilanes and simultaneously converting the alkyltrihalosilanes to dialkyldihalosilanes by reacting the alkyl-rich polysilanes in the residue and the alkyltrihalosilanes at an elevated temperature in the presence of a suitable catalyst and a catalytic amount of a hydrosilane reaction promoter. In a preferred embodiment, the residue containing alkyl-rich disilanes is treated with methyltrichlorosilane at a temperature of about 100.degree. C. to about 250.degree. C. in the presence of aluminum trichloride catalyst and a catalytic amount of methyldichlorosilane.
    Type: Grant
    Filed: April 28, 1982
    Date of Patent: July 12, 1983
    Assignee: General Electric Company
    Inventors: Alan Ritzer, Abraham L. Hajjar, Harry R. McEntee, Ray W. Shade
  • Patent number: 4390510
    Abstract: Improved yields of monohydrogentrihalosilanes are achieved by contacting the residual silicon obtained from the preparation of organohalosilanes by a metal-catalyzed direct process by contacting the residual silicon simultaneously with gaseous hydrogen halide and with gaseous alkyl halide to form a residual silicon contact mass; selecting a temperature between about 200.degree. C. and about 350.degree. C. at which alkylation of the silicon contact mass in inhibited and at which hydrohalogenation of the silicon contact mass occurs; and heating the silicon contact mass at the selected temperature. The silicon reacts with the gaseous alkyl halide and the gaseous hydrogen halide at the selected temperature to produce improved yields of the monohydrogentrihalosilane.
    Type: Grant
    Filed: February 16, 1982
    Date of Patent: June 28, 1983
    Assignee: General Electric Company
    Inventors: Alan Ritzer, Bakulesh Shah, Daniel E. Sliva
  • Patent number: 4307242
    Abstract: A process for recovering and recycling elementary silicon from a direct process organohalosilane reactor system is provided, comprising the steps of analyzing a portion of effluent contact mass, such as the silicon fines from a secondary cyclone with a particle size distribution analyzer, determing the fines fractions containing the relatively greatest amounts of impurities and segregating a relatively impure fine fraction from a purer coarse fraction with the aid of an aerodynamic centrifugal classifier.
    Type: Grant
    Filed: November 24, 1980
    Date of Patent: December 22, 1981
    Assignee: General Electric Company
    Inventors: Bakulesh N. Shah, Alan Ritzer
  • Patent number: RE33452
    Abstract: A method is provided for making alkylhalosilanes by effecting reaction between an alkyl halide, such as methyl chloride and powdered silicon in the presence of a copper-zinc-tin catalyst. Significant improvements in reaction rate and product selectivity are achieved when copper is employed at a critical weight percent relative to silicon and critical weight ratios of tin and zinc are employed relative to copper.
    Type: Grant
    Filed: September 25, 1986
    Date of Patent: November 20, 1990
    Assignee: General Electric Company
    Inventors: William J. Ward, III, Alan Ritzer, Kenneth M. Carroll, John W. Flock