Patents by Inventor Alan V. Hayes
Alan V. Hayes has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230282449Abstract: Provided herein are approaches for providing a more uniform ion flux and ion angular distribution across a wafer to minimize etch yield loss resulting from etch profile variations. In some embodiments, a system may include a plasma source operable to generate a plasma within a plasma chamber enclosed by a chamber housing, wherein the plasma source comprises a plasma shaper extending into the plasma chamber from a wall of the chamber housing. The plasma shaper may include a shaper wall coupled to the wall of the chamber housing, and a shaper end wall connected to the shaper wall, the shaper end wall defining an indentation extending towards the wall of the chamber housing.Type: ApplicationFiled: March 3, 2022Publication date: September 7, 2023Applicant: Applied Materials, Inc.Inventors: Alexandre Likhanskii, Peter F. Kurunczi, Alan V. Hayes
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Publication number: 20230125435Abstract: An ion extraction assembly for an ion source is provided. The ion extraction assembly may include a plurality of electrodes, wherein the plurality of electrodes comprises: a plasma-facing electrode, arranged for coupling to a plasma chamber; and a substrate-facing electrode, disposed outside of the plasma-facing electrode. The at least one electrode of the plurality of electrodes may include a grid structure, defining a plurality of holes, wherein the at least one electrode has a non-uniform thickness, wherein a first grid thickness in a middle region of the at least one electrode is different than a second grid thickness, in an outer region of the at least one electrode.Type: ApplicationFiled: October 27, 2021Publication date: April 27, 2023Applicant: Applied Materials, Inc.Inventors: Alexandre Likhanskii, Alan V. Hayes, Dmitry Lubomirsky
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Patent number: 10128083Abstract: The presently disclosed ion sources include one or more electromagnets for changing the distribution of plasma within a discharge space of an ion source. At least one of the electromagnets is oriented about an outer periphery of a tubular sidewall of the ion source and changes a distribution of the plasma in a peripheral region of the discharge space.Type: GrantFiled: June 1, 2016Date of Patent: November 13, 2018Assignee: VEBCO INSTRUMENTS INC.Inventors: Boris Druz, Rustam Yevtukhov, Robert Hieronymi, Alan V. Hayes, Mathew Levoso, Peter Porshnev
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Publication number: 20170352521Abstract: The presently disclosed ion sources include one or more electromagnets for changing the distribution of plasma within a discharge space of an ion source. At least one of the electromagnets is oriented about an outer periphery of a tubular sidewall of the ion source and changes a distribution of the plasma in a peripheral region of the discharge space.Type: ApplicationFiled: June 1, 2016Publication date: December 7, 2017Inventors: Boris Druz, Rustam Yevtukhov, Robert Hieronymi, Alan V. Hayes, Mathew Levoso, Peter Porshnev
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Publication number: 20160071708Abstract: Method and apparatus for processing a substrate with an energetic particle beam. Features on the substrate are oriented relative to the energetic particle beam and the substrate is scanned through the energetic particle beam. The substrate is periodically indexed about its azimuthal axis of symmetry, while shielded from exposure to the energetic particle beam, to reorient the features relative to the major dimension of the beam.Type: ApplicationFiled: November 16, 2015Publication date: March 10, 2016Applicant: Veeco Instruments, Inc.Inventors: Boris L. Druz, Piero Sferlazzo, Roger P. Fremgen, Alan V. Hayes, Viktor Kanarov, Robert Krause, Ira Reiss
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Patent number: 9206500Abstract: Method and apparatus for processing a substrate with an energetic particle beam. Features on the substrate are oriented relative to the energetic particle beam and the substrate is scanned through the energetic particle beam. The substrate is periodically indexed about its azimuthal axis of symmetry, while shielded from exposure to the energetic particle beam, to reorient the features relative to the major dimension of the beam.Type: GrantFiled: September 18, 2008Date of Patent: December 8, 2015Inventors: Boris Druz, Roger P. Fremgen, Jr., Alan V. Hayes, Viktor Kanarov, Robert Krause, Ira Reiss, Piero Sferlazzo
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Patent number: 8835869Abstract: Ion sources and methods for generating an ion bean with a controllable ion current density distribution. The ion source includes a discharge chamber having an optical grid position proximate at a first end and a re-entrant vessel positioned proximate a second end that opposes the first end. A plasma shaper extends from the re-entrant vessel and into the plasma discharge chamber. A position of the plasma shaper is adjustable relative to the grid-based ion optic such that the plasma shaper may operably change a plasma density distribution within the discharge chamber.Type: GrantFiled: April 16, 2012Date of Patent: September 16, 2014Assignee: Veeco Instruments, Inc.Inventors: Rustam Yevtukhov, Boris L. Druz, Viktor Kanarov, Alan V. Hayes
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Publication number: 20120211166Abstract: Ion sources and methods for generating an ion bean with a controllable ion current density distribution. The ion source includes a discharge chamber having an optical grid position proximate at a first end and a re-entrant vessel positioned proximate a second end that opposes the first end. A plasma shaper extends from the re-entrant vessel and into the plasma discharge chamber. A position of the plasma shaper is adjustable relative to the grid-based ion optic such that the plasma shaper may operably change a plasma density distribution within the discharge chamber.Type: ApplicationFiled: April 16, 2012Publication date: August 23, 2012Applicant: VEECO INSTRUMENTS INC.Inventors: Rustam Yevtukhov, Boris L. Druz, Viktor Kanarov, Alan V. Hayes
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Patent number: 8158016Abstract: Methods of operating an electromagnet of an ion source for generating an ion beam with a controllable ion current density distribution. The methods may include generating plasma in a discharge space of the ion source, generating and shaping a magnetic field in the discharge space by applying a current to an electromagnet that is effective to define a plasma density distribution, extracting an ion beam from the plasma, measuring a distribution profile for the ion beam density, and comparing the actual distribution profile with a desired distribution profile for the ion beam density. Based upon the comparison, the current applied to the electromagnet may be adjusted either manually or automatically to modify the magnetic field in the discharge space and, thereby, alter the plasma density distribution.Type: GrantFiled: February 26, 2008Date of Patent: April 17, 2012Assignee: Veeco Instruments, Inc.Inventors: Alan V. Hayes, Rustam Yevtukhov, Viktor Kanarov, Boris L. Druz
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Publication number: 20110089022Abstract: Method and apparatus for processing a substrate with a beam of energetic particles. The beam is directed from a source through a rectangular aperture in a shield positioned between the source and substrate to a treatment zone in a plane of substrate movement. Features on the substrate are aligned parallel to a major dimension of the rectangular aperture and the substrate is moved orthogonally to the aperture's major dimension. The beam impinges the substrate through the aperture during movement. The substrate may be periodically rotated by approximately 180° to reorient the features relative to the major dimension of the rectangular aperture. The resulting treatment profile is symmetrical about the sides of the features oriented toward the major dimension of the rectangular aperture.Type: ApplicationFiled: December 23, 2010Publication date: April 21, 2011Applicant: VEECO INSTRUMENTS INC.Inventors: Boris Druz, Viktor Kanarov, Hariharakeshave S. Hegde, Alan V. Hayes, Emmanuel Lakios
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Patent number: 7879201Abstract: Method and apparatus for processing a substrate with a beam of energetic particles. The beam is directed from a source through a rectangular aperture in a shield positioned between the source and substrate to a treatment zone in a plane of substrate movement. Features on the substrate are aligned parallel to a major dimension of the rectangular aperture and the substrate is moved orthogonally to the aperture's major dimension. The beam impinges the substrate through the aperture during movement. The substrate may be periodically rotated by approximately 180° to reorient the features relative to the major dimension of the rectangular aperture. The resulting treatment profile is symmetrical about the sides of the features oriented toward the major dimension of the rectangular aperture.Type: GrantFiled: August 11, 2004Date of Patent: February 1, 2011Assignee: Veeco Instruments Inc.Inventors: Boris Druz, Viktor Kanarov, Hariharakeshave S. Hegde, Alan V. Hayes, Emmanuel Lakios
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Patent number: 7557362Abstract: Ion sources and methods for generating an ion beam with a controllable ion current density distribution. The ion source includes a discharge chamber and an electromagnet adapted to generate a magnetic field for changing a density distribution of the plasma inside the discharge chamber and, thereby, to change the ion current density distribution.Type: GrantFiled: February 26, 2007Date of Patent: July 7, 2009Assignee: Veeco Instruments Inc.Inventors: Rustam Yevtukhov, Alan V. Hayes, Viktor Kanarov, Boris L. Druz
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Publication number: 20090098306Abstract: Method and apparatus for processing a substrate with an energetic particle beam. Features on the substrate are oriented relative to the energetic particle beam and the substrate is scanned through the energetic particle beam. The substrate is periodically indexed about its azimuthal axis of symmetry, while shielded from exposure to the energetic particle beam, to reorient the features relative to the major dimension of the beam.Type: ApplicationFiled: September 18, 2008Publication date: April 16, 2009Applicant: Veeco Instruments Inc.Inventors: Boris Druz, Roger P. Fremgen, JR., Alan V. Hayes, Viktor Kanarov, Robert Krause, Ira Reiss, Piero Sferlazzo
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Patent number: 7414355Abstract: A charged particle apparatus, with multiple electrically conducting semispheric grid electrodes, the grid electrodes mounted in a dielectric mounting ring, with hidden areas or regions to maintain electrical isolation between the grid electrodes as sputter deposits form on the grid electrodes and mounting ring. The grid electrodes are mounted to the mounting ring with slots and fastening pins that allow sliding thermal expansion and contraction between the grid electrodes and mounting ring while substantially maintaining alignment of grid openings and spacing between the grid electrodes. Asymmetric fastening pins facilitate the sliding thermal expansion while restraining the grid electrodes. Electrical contactors supply and maintain electrical potentials of the grid electrodes with spring loaded sliding contacts, without substantially affecting the thermal characteristics of the grid electrodes.Type: GrantFiled: August 18, 2005Date of Patent: August 19, 2008Assignee: Veeco Instruments, Inc.Inventors: Viktor Kanarov, Alan V. Hayes, Rustam Yevtukhov, Daniel Yakovlevitch
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Publication number: 20080179284Abstract: Methods of operating an electromagnet of an ion source for generating an ion beam with a controllable ion current density distribution. The methods may include generating plasma in a discharge space of the ion source, generating and shaping a magnetic field in the discharge space by applying a current to an electromagnet that is effective to define a plasma density distribution, extracting an ion beam from the plasma, measuring a distribution profile for the ion beam density, and comparing the actual distribution profile with a desired distribution profile for the ion beam density. Based upon the comparison, the current applied to the electromagnet may be adjusted either manually or automatically to modify the magnetic field in the discharge space and, thereby, alter the plasma density distribution.Type: ApplicationFiled: February 26, 2008Publication date: July 31, 2008Applicant: VEECO INSTRUMENTS INC.Inventors: Alan V. Hayes, Rustam Yevtukhov, Viktor Kanarov, Boris L. Druz
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Patent number: 7183716Abstract: A charged particle source utilizes a novel plasma processing chamber, RF coil and ion optics, to achieve high uniformity. The plasma processing chamber has a re-entrant vessel which is movable, and which includes extensions of adjustable shape or position, to make more uniform the plasma contained within the chamber. One or more magnets, which may be static or moving, may be included within the re-entrant vessel. The ion optics include a grid with a number of apertures, and tuning features each surrounding an aperture. These tuning features either reduce the diameter of the associated aperture, or increase the length of that aperture, to create more uniform beamlets emerging from the grid. The RF coil includes a flux concentrator positioned adjacent to the winding in at least one angular region thereof to tune the magnetic field produced thereby.Type: GrantFiled: February 4, 2004Date of Patent: February 27, 2007Assignee: Veeco Instruments, Inc.Inventors: Viktor Kanarov, Alan V. Hayes, Rustam Yevtukhov, Ira Reiss, Roger P. Fremgen, Jr., Adrian Celaru, Kurt E. Williams, Carlos Fernando de Mello Borges, Boris L. Druz, Renga Rajan, Hari Hegde
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Patent number: 7005782Abstract: A charged particle apparatus, with multiple electrically conducting semispheric grid electrodes, the grid electrodes mounted in a dielectric mounting ring, with hidden areas or regions to maintain electrical isolation between the grid electrodes as sputter deposits form on the grid electrodes and mounting ring. The grid electrodes are mounted to the mounting ring with slots and fastening pins that allow sliding thermal expansion and contraction between the grid electrodes and mounting ring while substantially maintaining alignment of grid openings and spacing between the grid electrodes. Asymmetric fastening pins facilitate the sliding thermal expansion while restraining the grid electrodes. Electrical contactors supply and maintain electrical potentials of the grid electrodes with spring loaded sliding contacts, without substantially affecting the thermal characteristics of the grid electrodes.Type: GrantFiled: May 27, 2004Date of Patent: February 28, 2006Assignee: VEECO Instruments, Inc.Inventors: Viktor Kanarov, Alan V. Hayes, Rustam Yevtukhov, Daniel Yakovlevitch
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Publication number: 20040212288Abstract: A charged particle apparatus, with multiple electrically conducting semispheric grid electrodes, the grid electrodes mounted in a dielectric mounting ring, with hidden areas or regions to maintain electrical isolation between the grid electrodes as sputter deposits form on the grid electrodes and mounting ring. The grid electrodes are mounted to the mounting ring with slots and fastening pins that allow sliding thermal expansion and contraction between the grid electrodes and mounting ring while substantially maintaining alignment of grid openings and spacing between the grid electrodes. Asymmetric fastening pins facilitate the sliding thermal expansion while restraining the grid electrodes. Electrical contactors supply and maintain electrical potentials of the grid electrodes with spring loaded sliding contacts, without substantially affecting the thermal characteristics of the grid electrodes.Type: ApplicationFiled: May 27, 2004Publication date: October 28, 2004Inventors: Viktor Kanarov, Alan V. Hayes, Rustam Yevtukhov, Daniel Yakovlevitch
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Publication number: 20040163766Abstract: A charged particle source utilizes a novel plasma processing chamber, RF coil and ion optics, to achieve high uniformity. The plasma processing chamber has a re-entrant vessel which is movable, and which includes extensions of adjustable shape or position, to make more uniform the plasma contained within the chamber. One or more magnets, which may be static or moving, may be included within the re-entrant vessel. The ion optics include a grid with a number of apertures, and tuning features each surrounding an aperture. These tuning features either reduce the diameter of the associated aperture, or increase the length of that aperture, to create more uniform beamlets emerging from the grid. The RF coil includes a flux concentrator positioned adjacent to the winding in at least one angular region thereof to tune the magnetic field produced thereby.Type: ApplicationFiled: February 4, 2004Publication date: August 26, 2004Applicant: Veeco Instruments Inc.Inventors: Viktor Kanarov, Alan V. Hayes, Rustam Yevtukhov, Ira Reiss, Roger P. Fremgen, Adrian Celaru, Kurt E. Williams, Carlos Fernando de Mello Borges, Boris L. Druz, Renga Rajan, Hari Hegde
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Patent number: 6774550Abstract: A charged particle apparatus, with multiple electrically conducting semispheric grid electrodes, the grid electrodes mounted in a dielectric mounting ring, with hidden areas or regions to maintain electrical isolation between the grid electrodes as sputter deposits form on the grid electrodes and mounting ring. The grid electrodes are mounted to the mounting ring with slots and fastening pins that allow sliding thermal expansion and contraction between the grid electrodes and mounting ring while substantially maintaining alignment of grid openings and spacing between the grid electrodes. Asymmetric fastening pins facilitate the sliding thermal expansion while restraining the grid electrodes. Electrical contactors supply and maintain electrical potentials of the grid electrodes with spring loaded sliding contacts, without substantially affecting the thermal characteristics of the grid electrodes.Type: GrantFiled: April 14, 2003Date of Patent: August 10, 2004Assignee: Veeco Instruments, Inc.Inventors: Viktor Kanarov, Alan V. Hayes, Rustam Yevtukhov, Daniel Yakovlevitch