Patents by Inventor Alan W. Berg

Alan W. Berg has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7189224
    Abstract: A method and system for improved material processing using a laser beam. The method and system includes directing a laser beam above, at or below the surface of the material in one or more preferred patterns and with preferred laser pulse characteristics specific to the material to reduce or mitigate the accumulation or effects of gas, debris, fluid, or other by-products of photodisruption either at the location where additional laser pulses are being placed or in other sensitive locations in the material.
    Type: Grant
    Filed: March 18, 2005
    Date of Patent: March 13, 2007
    Assignee: Intralase Corp.
    Inventors: Ronald M. Kurtz, Tibor Juhasz, Peter Goldstein, Imre Hegedus, Christopher Horvath, Gordon Scott Scholler, Alan W. Berg
  • Patent number: 6902561
    Abstract: A method and system for improved material processing using a laser beam. The method and system includes directing a laser beam above, at or below the surface of the material in one or more preferred patterns and with preferred laser pulse characteristics specific to the material to reduce or mitigate the accumulation or effects of gas, debris, fluid, or other by-products of photodisruption either at the location where additional laser pulses are being placed or in other sensitive locations in the material.
    Type: Grant
    Filed: March 21, 2003
    Date of Patent: June 7, 2005
    Assignee: Intralase Corp.
    Inventors: Ronald M. Kurtz, Tibor Juhasz, Peter Goldstein, Imre Hegedus, Christopher Horvath, Gordon S. Scholler, Alan W. Berg
  • Publication number: 20030212387
    Abstract: A method and system for improved material processing using a laser beam. The method and system includes directing a laser beam above, at or below the surface of the material in one or more preferred patterns and with preferred laser pulse characteristics specific to the material to reduce or mitigate the accumulation or effects of gas, debris, fluid, or other by-products of photodisruption either at the location where additional laser pulses are being placed or in other sensitive locations in the material.
    Type: Application
    Filed: March 21, 2003
    Publication date: November 13, 2003
    Applicant: INTRALASE CORP.
    Inventors: Ronald M. Kurtz, Tibor Juhasz, Peter Goldstein, Imre Hegedus, Christopher Horvath, Gordon S. Scholler, Alan W. Berg