Abstract: The invention relates to the deposition of material onto surfaces of a substrate, typically respective concave and convex surfaces and provides a system whereby the substrates are held in a mutually sealed relationship by a carrier during the deposition of material onto respective surfaces thereby preventing or minimising the problem of lack of adhesion of the material on the surfaces

Abstract: The invention relates to apparatus for use in the coating of surfaces of substrates by Physical Vapor Deposition systems (PVD) wherein the deposition in material is applied onto the said surfaces by the sputtering of the same using the PVD system. The invention provides means for preventing sputtering material from applying or landing onto surfaces other than which is desired to be coated in the said coating process. The masking means allow the prevention and/or removal of such material which is known as backscattered material and the invention described claims protection for several embodiments and methods of achieving this thereby improving subsequent adhesion propertied and optical quantities, if applicable, of the coating.

Abstract: The invention relates to apparatus for depositing of materials onto at least one substrate mounted on a substrate carrier provided for rotation in a material depositing zone in a vacuum chamber and causing a reaction of the said material to form a coating having desired properties. In a first aspect of the invention there is provided a loading chamber in selective interconnection with the vacuum chamber whilst maintaining a vacuum therein and in a second aspect the carrier and/or the vacuum chamber walls are provided with linear protrusions to restrict the flow of reactive gases in the chamber and thereby reduce the occurrence of arcing and both aspects allowing the dimensions of the coating apparatus to be reduced in comparison to conventional coating apparatus.