Patents by Inventor Albert Archwamety

Albert Archwamety has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11825211
    Abstract: The present invention includes a system and method for obtaining high-resolution images of objects such as electrical components. The system includes a monochrome camera and three light sources of different wavelengths (e.g. a red light source, a blue light source and a green light source). The camera successively captures a red light image, a blue light image and a green light image of the object. A processor combines the red light image, the blue light image and the green light image into a single high-resolution true color image. Because each image is obtained from an independent light source, the resolution is not limited by the Bayer (RGB) color model. The system is well suited for materials composed of different materials that may react differently to light sources based on its wavelength.
    Type: Grant
    Filed: March 21, 2019
    Date of Patent: November 21, 2023
    Assignee: MIT SEMICONDUCTOR (TIAN JIN) CO., LTD
    Inventors: Kok Weng Wong, Albert Archwamety, Jun Kang Ng, Chee Chye Lee
  • Publication number: 20220159182
    Abstract: The present invention includes a system and method for obtaining high-resolution images of objects such as electrical components. The system includes a monochrome camera and three light sources of different wavelengths (e.g. a red light source, a blue light source and a green light source). The camera successively captures a red light image, a blue light image and a green light image of the object. A processor combines the red light image, the blue light image and the green light image into a single high-resolution true color image. Because each image is obtained from an independent light source, the resolution is not limited by the Bayer (RGB) color model. The system is well suited for materials composed of different materials that may react differently to light sources based on its wavelength.
    Type: Application
    Filed: March 21, 2019
    Publication date: May 19, 2022
    Inventors: Kok Weng WONG, Albert ARCHWAMETY, Jun Kang NG, Chee Chye LEE
  • Publication number: 20220107174
    Abstract: The invention includes a system and method for obtaining high-resolution 3D images of objects. The system includes three cameras and three light sources that have different wavelengths (e.g. a red light source, a blue light source and a green light source). Each camera simultaneously captures a color image of the object. A processor separates each of the red light images, the blue light images and the green light images into separate monochrome images using each of the red light source, blue light source and green light source. The quality of the images are not subject to limited resolution of conventional RBG images. Because three different wavelengths of light are used, the surface can be accurately imaged, regardless of its characteristics (e.g. reflectivity and transparency). The system is well suited for industrial uses that require a high volume of objects, particularly those of mixed material, to be rapidly inspected for defects as small as a few microns.
    Type: Application
    Filed: February 1, 2019
    Publication date: April 7, 2022
    Inventors: Kok Weng WONG, Albert ARCHWAMETY, Jun Kang NG, Chee Chye LEE
  • Patent number: 10151580
    Abstract: The present disclosure provides a system and method to convert three-dimensional data into a two-dimensional height displacement map and extract the three-dimensional features and dimensions of a three-dimensional object using a two-dimensional image processing technique. An illumination source of the system scans across the workspace using a line laser and generates a two-dimensional height displacement map of the workspace. The individual pixel location represents an actual workspace sampled location. The pixel gray scale intensity represents the Z displacement height at the pixel location. A processing device processes the features and dimensions within two-dimensional image as a gray scale using two-dimensional image processing such as pattern match, blob, convolution and edge detection.
    Type: Grant
    Filed: April 29, 2015
    Date of Patent: December 11, 2018
    Assignee: GENERIC POWER PTD LTD
    Inventors: Kok Weng Wong, Albert Archwamety, Han Cheng Ge, Ruini Cao
  • Publication number: 20170254639
    Abstract: The present disclosure provides a system and method to convert three-dimensional data into a two-dimensional height displacement map and extract the three-dimensional features and dimensions of a three-dimensional object using a two-dimensional image processing technique. An illumination source of the system scans across the workspace using a line laser and generates a two-dimensional height displacement map of the workspace. The individual pixel location represents an actual workspace sampled location. The pixel gray scale intensity represents the Z displacement height at the pixel location. A processing device processes the features and dimensions within two-dimensional image as a gray scale using two-dimensional image processing such as pattern match, blob, convolution and edge detection.
    Type: Application
    Filed: April 29, 2015
    Publication date: September 7, 2017
    Applicant: Generic Power PTD LTD
    Inventors: Kok Weng WONG, Albert ARCHWAMETY, Han Cheng GE, Ruini CAO
  • Patent number: 8885918
    Abstract: A method for inspecting a wafer. The method comprises a training process for creating reference images. The training process comprises capturing a number of images of a first wafer of unknown quality, each of the number of images of the first wafer being captured at a predetermined contrast illumination and each of the number of images of the first wafer comprising a plurality of pixels. The training process also comprises determining a plurality of reference intensities for each of the plurality of pixels of each of the number of images of the first wafer, calculating a plurality of statistical parameters for the plurality of reference intensities of each of the plurality of pixels of each of the number of images of the first wafer, and selecting a plurality of reference images from the plurality of images of the first wafer based on the calculated plurality of statistical parameters.
    Type: Grant
    Filed: January 13, 2010
    Date of Patent: November 11, 2014
    Assignee: Semiconductor Technologies & Instruments Pte Ltd
    Inventors: Ajharali Amanullah, Albert Archwamety, Hongtu Guo
  • Publication number: 20100189339
    Abstract: A method for inspecting a wafer. The method comprises a training process for creating reference images. The training process comprises capturing a number of images of a first wafer of unknown quality, each of the number of images of the first wafer being captured at a predetermined contrast illumination and each of the number of images of the first wafer comprising a plurality of pixels. The training process also comprises determining a plurality of reference intensities for each of the plurality of pixels of each of the number of images of the first wafer, calculating a plurality of statistical parameters for the plurality of reference intensities of each of the plurality of pixels of each of the number of images of the first wafer, and selecting a plurality of reference images from the plurality of images of the first wafer based on the calculated plurality of statistical parameters.
    Type: Application
    Filed: January 13, 2010
    Publication date: July 29, 2010
    Applicant: Semiconductor Technologies & Instruments Pte Ltd
    Inventors: Ajharali Amanullah, Albert Archwamety, Hongtu Guo