Patents by Inventor Albert Johannes Jansen

Albert Johannes Jansen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method
    Publication number: 20050170296
    Abstract: A lithographic apparatus has a mask table adapted to accommodate a mask in at least two positions so that a mask with a pattern area larger than the exposure field can be imaged by first performing an exposure with the mask in the first position and then performing a second exposure with the mask in the second position.
    Type: Application
    Filed: January 29, 2004
    Publication date: August 4, 2005
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Albert Johannes Jansen, Jan Kuit, Erik Loopstra, Raymond Laurentius Schrijver
  • Lithographic apparatus, device manufacturing methods, mask and method of characterizing a mask and/or pellicle
    Publication number: 20050140949
    Abstract: A thick pellicle is allowed to have a non-flat shape and its shape is characterized to calculate corrections to be applied in exposures to compensate for the optical effects of the pellicle. The pellicle may be mounted so as to adopt a one-dimensional shape under the influence of gravity to make the compensation easier.
    Type: Application
    Filed: April 30, 2004
    Publication date: June 30, 2005
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Johannes Jasper, Marcel Baggen, Richard Bruls, Orlando Cicilia, Hendrikus Alphonsus Van Dijck, Gerardus Carolus Hofmans, Albert Johannes Jansen, Carlo Cornelis Luijten, Willem Pongers, Martijn Dominique Wehrens, Tammo Uitterdijk, Herman Boom, Marcel Johannes Louis Demarteau